Search Results - "Haller, Kurt L."
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Particle trapping phenomena in radio frequency plasmas
Published in Applied physics letters (29-10-1990)“…Particles generated in an argon plasma and suspended at the plasma/sheath boundary are localized by lateral trapping fields. In the commercial rf etching…”
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Journal Article -
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Rastered laser light scattering studies during plasma processing: Particle contamination trapping phenomena
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-09-1991)“…The distribution and transport of particles in materials processing plasmas has been studied with a rastered laser light scattering technique. Contrary to…”
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Journal Article -
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Trapping and behavior of particulates in a radio frequency magnetron plasma etching tool
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01-07-1993)“…Particle contamination has been studied in a commercial, magnetron reactive ion etching tool using rastered laser light scattering. Particles present in the…”
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I n s i t u plasma contamination measurements by HeNe laser light scattering: A case study
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-05-1990)“…Using a simple, inexpensive HeNe laser and a video camera to measure light scattering intensity and location, particulate contamination in an SiO2 sputtering…”
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Journal Article -
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Surface Raman spectroscopy as an in-situ probe of laser micro chemical processes
Published in IEEE circuits and devices magazine (01-01-1986)“…Laser-induced chemical processes are now being used in a number of new semiconductor processing techniques. The authors briefly review the technique known as…”
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Journal Article -
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Surface Raman spectroscopy as an in-situ probe of laser microchemical processes
Published in IEEE circuits and devices magazine (01-01-1986)“…Laser-induced chemical processes are now being used in a number of new semiconductor processing techniques. The authors briefly review the technique known as…”
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Journal Article