Search Results - "Haller, Kurt L."

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  1. 1

    Particle trapping phenomena in radio frequency plasmas by SELWYN, G. S, HEIDENREICH, J. E, HALLER, K. L

    Published in Applied physics letters (29-10-1990)
    “…Particles generated in an argon plasma and suspended at the plasma/sheath boundary are localized by lateral trapping fields. In the commercial rf etching…”
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    Journal Article
  2. 2

    Rastered laser light scattering studies during plasma processing: Particle contamination trapping phenomena by Selwyn, Gary S., Heidenreich, John E., Haller, Kurt L.

    “…The distribution and transport of particles in materials processing plasmas has been studied with a rastered laser light scattering technique. Contrary to…”
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    Journal Article
  3. 3

    Trapping and behavior of particulates in a radio frequency magnetron plasma etching tool by Selwyn, Gary S., Haller, Kurt L., Patterson, Edward F.

    “…Particle contamination has been studied in a commercial, magnetron reactive ion etching tool using rastered laser light scattering. Particles present in the…”
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    Conference Proceeding Journal Article
  4. 4
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    I n s i t u plasma contamination measurements by HeNe laser light scattering: A case study by Selwyn, Gary S., McKillop, J. S., Haller, Kurt L., Wu, J. J.

    “…Using a simple, inexpensive HeNe laser and a video camera to measure light scattering intensity and location, particulate contamination in an SiO2 sputtering…”
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    Journal Article
  6. 6

    Surface Raman spectroscopy as an in-situ probe of laser micro chemical processes by Van Duyne, Richard P., Altkorn, Robert I., Haller, Kurt L.

    Published in IEEE circuits and devices magazine (01-01-1986)
    “…Laser-induced chemical processes are now being used in a number of new semiconductor processing techniques. The authors briefly review the technique known as…”
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    Journal Article
  7. 7

    Surface Raman spectroscopy as an in-situ probe of laser microchemical processes by Van Duyne, R P, Altkorn, R I, Haller, K L

    Published in IEEE circuits and devices magazine (01-01-1986)
    “…Laser-induced chemical processes are now being used in a number of new semiconductor processing techniques. The authors briefly review the technique known as…”
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    Journal Article