Search Results - "Haller, K L"
-
1
Rastered laser light scattering studies during plasma processing: Particle contamination trapping phenomena
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-09-1991)“…The distribution and transport of particles in materials processing plasmas has been studied with a rastered laser light scattering technique. Contrary to…”
Get full text
Journal Article -
2
Particle trapping phenomena in radio frequency plasmas
Published in Applied physics letters (29-10-1990)“…Particles generated in an argon plasma and suspended at the plasma/sheath boundary are localized by lateral trapping fields. In the commercial rf etching…”
Get full text
Journal Article -
3
Trapping and behavior of particulates in a radio frequency magnetron plasma etching tool
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01-07-1993)“…Particle contamination has been studied in a commercial, magnetron reactive ion etching tool using rastered laser light scattering. Particles present in the…”
Get full text
Conference Proceeding Journal Article -
4
Feedback gain for distributed frequency regulation in small-footprint power systems via parameter estimation
Published in 2013 IEEE Power and Energy Conference at Illinois (PECI) (01-02-2013)“…This paper discusses a method for determining the feedback gain for a distributed control algorithm suitable for regulating the frequency in small-footprint…”
Get full text
Conference Proceeding
-
5
-
6
Surface Raman spectroscopy as an in-situ probe of laser microchemical processes
Published in IEEE circuits and devices magazine (01-01-1986)“…Laser-induced chemical processes are now being used in a number of new semiconductor processing techniques. The authors briefly review the technique known as…”
Get full text
Journal Article