Effect of substrate on the characteristics of the interface between diamond film and substrate

Diamond films were deposited on Si and Mo substrates by a microwave plasma-enhanced chemical vapor deposition method. The morphology and the chemical composition of the interfacial layer were investigated on the film side and the substrate side surfaces. In the Si substrate case, we found an island...

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Bibliographic Details
Published in:	Diamond and related materials Vol. 6; no. 8; pp. 959 - 963
Main Authors:	Francois, N., Kim, S.H., Park, Y.S., Lee, J.-W., Hahn, I.T., Yun, W.S.
Format:	Journal Article
Language:	English
Published:	Amsterdam Elsevier B.V 01-05-1997 Elsevier
Subjects:	Chemical vapour deposition Condensed matter: structure, mechanical and thermal properties Diamond films Exact sciences and technology Interface structure and roughness Interface/interfacial Physics Solid surfaces and solid-solid interfaces substrate Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) Chemical vapour deposition Interface/interfacial Diamond films substrate Synthetic mineral Microwave radiation Diamonds Roughness Solid-solid interfaces Experimental study Substrates Thick film Nonmetals Morphology Growth mechanism Heterojunctions PECVD
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Summary:	Diamond films were deposited on Si and Mo substrates by a microwave plasma-enhanced chemical vapor deposition method. The morphology and the chemical composition of the interfacial layer were investigated on the film side and the substrate side surfaces. In the Si substrate case, we found an island shape which could involve a rough surface as well as glassy carbon areas. On the contrary, in the Mo substrate case, no such island could be observed, and the film side detached from the Mo substrate presented a much smoother surface. From these results, we suggested the model for the initial step of diamond deposition in cases of Si and Mo substrates.
ISSN:	0925-9635 1879-0062
DOI:	10.1016/S0925-9635(96)00774-1