Search Results - "Hahn, Herwig"

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  1. 1

    Self-Aligned Process for Selectively Etched p-GaN-Gated AlGaN/GaN-on-Si HFETs by Lukens, Gerrit, Hahn, Herwig, Kalisch, Holger, Vescan, Andrei

    Published in IEEE transactions on electron devices (01-09-2018)
    “…A process for an enhancement-mode p-GaN-gated heterostructure field-effect transistor with self-aligned structuring of the p-GaN is proposed. A gate-first…”
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    Development and analysis of thick GaN drift layers on 200 mm CTE-matched substrate for vertical device processing by Gonçalez Filho, Walter, Borga, Matteo, Geens, Karen, Cingu, Deepthi, Chatterjee, Urmimala, Banerjee, Sourish, Vohra, Anurag, Han, Han, Minj, Albert, Hahn, Herwig, Marx, Matthias, Fahle, Dirk, Bakeroot, Benoit, Decoutere, Stefaan

    Published in Scientific reports (23-09-2023)
    “…This work reports the epitaxial growth of 8.5 µm-thick GaN layers on 200 mm engineered substrates with a polycrystalline AlN core (QST by QROMIS) for CMOS…”
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  3. 3

    Impact of Floating Body Effect, Back-Gate Traps, and Trap-Assisted Tunneling on Scaled In0.53Ga0.47As Ultrathin-Body MOSFETs and Mitigation Measures by Sant, Saurabh, Aguirre, Paulina, Hahn, Herwig, Deshpande, Veeresh, Czornomaz, Lukas, Schenk, Andreas

    Published in IEEE transactions on electron devices (01-06-2018)
    “…Ultrathin-body (UTB) III-V channel MOSFETs are known to suffer from the floating body effect which turns on a parasitic bipolar junction transistor (BJT) and…”
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    Physical Modeling of Charge Trapping Effects in GaN/Si Devices and Incorporation in the ASM-HEMT Model by Pradhan, Mamta, Alomari, Mohammed, Moser, Matthias, Fahle, Dirk, Hahn, Herwig, Heuken, Michael, Burghartz, Joachim N.

    “…In this work, the dynamic behavior of gallium nitride on silicon high electron mobility transistors (GaN/Si HEMT) with carbon doped buffer is modeled using a…”
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  5. 5

    First Small-Signal Data of GaN-Based p-Channel Heterostructure Field Effect Transistors by Hahn, Herwig, Reuters, Benjamin, Pooth, Alexander, Noculak, Achim, Kalisch, Holger, Vescan, Andrei

    Published in Japanese Journal of Applied Physics (01-12-2013)
    “…p-Channel heterostructure field effect transistors (HFETs) have recently attracted increasing interest. They open up the possibility of fabricating…”
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    Gallium Phosphide-on-Silicon Dioxide Photonic Devices by Schneider, Katharina, Welter, Pol, Baumgartner, Yannick, Hahn, Herwig, Czornomaz, Lukas, Seidler, Paul

    Published in Journal of lightwave technology (15-07-2018)
    “…The development of integrated photonic circuits utilizing gallium phosphide requires a robust, scalable process for fabrication of GaP-on-insulator devices…”
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  7. 7

    p-Channel Enhancement and Depletion Mode GaN-Based HFETs With Quaternary Backbarriers by Hahn, Herwig, Reuters, Benjamin, Pooth, Alexander, Hollander, Bernd, Heuken, Michael, Kalisch, Holger, Vescan, Andrei

    Published in IEEE transactions on electron devices (01-10-2013)
    “…Within the last years, III-nitride-based devices have been demonstrated with exceptional performance. There is, however, a severe lack of knowledge when it…”
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  8. 8

    The III-Nitride Double Heterostructure Revisited: Benefits for Threshold Voltage Engineering of MIS Devices by Hahn, Herwig, Funck, Carsten, Geipel, Sascha, Kalisch, Holger, Vescan, Andrei

    Published in IEEE transactions on electron devices (01-02-2016)
    “…GaN-based devices are seen as ideal candidates for power-switching applications. For the acceptance of GaN-based devices by module designers, obtaining…”
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    Epitaxial buffer structures grown on 200 mm engineering substrates for 1200 V E-mode HEMT application by Vohra, Anurag, Geens, Karen, Zhao, Ming, Syshchyk, Olga, Hahn, Herwig, Fahle, Dirk, Bakeroot, Benoit, Wellekens, Dirk, Vanhove, Benjamin, Langer, Robert, Decoutere, Stefaan

    Published in Applied physics letters (27-06-2022)
    “…In this work, we demonstrate the epitaxial growth of a gallium-nitride (GaN) buffer structure qualified for 1200 V applications on 200 mm engineered poly-AlN…”
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  12. 12

    Monolithically Integrated CMOS-Compatible III-V on Silicon Lasers by Seifried, Marc, Villares, Gustavo, Baumgartner, Yannick, Hahn, Herwig, Halter, Mattia, Horst, Folkert, Caimi, Daniele, Caer, Charles, Sousa, Marilyne, Dangel, Roger Franz, Czornomaz, Lukas, Offrein, Bert Jan

    “…CMOS-compatible III-V lasers integrated on silicon are a crucial step to reduce power consumption and cost for next-generation optical transceivers. Here, we…”
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  13. 13

    AlN/Si interface engineering to mitigate RF losses in MOCVD-grown GaN-on-Si substrates by Cardinael, Pieter, Yadav, Sachin, Hahn, Herwig, Zhao, Ming, Banerjee, Sourish, Kazemi Esfeh, Babak, Mauder, Christof, O'Sullivan, Barry, Peralagu, Uthayasankaran, Vohra, Anurag, Langer, Robert, Collaert, Nadine, Parvais, Bertrand, Raskin, Jean-Pierre

    Published in Applied physics letters (12-08-2024)
    “…Fabrication of low-RF loss GaN-on-Si high electron mobility transistor stacks is critical to enable competitive front-end-modules for 5G and 6G applications…”
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  14. 14

    Threshold Voltage Engineering in GaN-Based HFETs: A Systematic Study With the Threshold Voltage Reaching More Than 2 V by Hahn, Herwig, Benkhelifa, Fouad, Ambacher, Oliver, Brunner, Frank, Noculak, Achim, Kalisch, Holger, Vescan, Andrei

    Published in IEEE transactions on electron devices (01-02-2015)
    “…One of the key challenges for the adoption of gallium nitride (GaN)-based heterostructure field effect transistors (HFETs) in power-switching applications is…”
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    Vertical GaN devices: Process and reliability by You, Shuzhen, Geens, Karen, Borga, Matteo, Liang, Hu, Hahn, Herwig, Fahle, Dirk, Heuken, Michael, Mukherjee, Kalparupa, De Santi, Carlo, Meneghini, Matteo, Zanoni, Enrico, Berg, Martin, Ramvall, Peter, Kumar, Ashutosh, Björk, Mikael T., Ohlsson, B. Jonas, Decoutere, Stefaan

    Published in Microelectronics and reliability (01-11-2021)
    “…This paper reviews recent progress and key challenges in process and reliability for high-performance vertical GaN transistors and diodes, focusing on the…”
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  18. 18

    Influence of mask material and process parameters on etch angle in a chlorine-based GaN dry etch by Hahn, Herwig, Gruis, Jan Berend, Ketteniss, Nico, Urbain, Felix, Kalisch, Holger, Vescan, Andrei

    “…The vertical structuring of GaN layers for power application purposes is a key step for successful device operation. Thus, the dry etching of GaN becomes a…”
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    GaN-on-Si Enhancement Mode Metal Insulator Semiconductor Heterostructure Field Effect Transistor with On-Current of 1.35 A/mm by Hahn, Herwig, Benkhelifa, Fouad, Ambacher, Oliver, Alam, Assadullah, Heuken, Michael, Yacoub, Hady, Noculak, Achim, Kalisch, Holger, Vescan, Andrei

    Published in Japanese Journal of Applied Physics (01-09-2013)
    “…GaN-on-Si transistors are regarded as a candidate for future power-switching applications. Beside the necessity to achieve enhancement mode behavior,…”
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