Search Results - "Haddara, Y M"
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Dependence of InGaP nanowire morphology and structure on molecular beam epitaxy growth conditions
Published in Nanotechnology (23-04-2010)“…InGaP nanowires (NWs) were grown by the Au-assisted method in a gas source molecular beam epitaxy system. The dependence of InGaP composition, morphology and…”
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The response of open-volume defects in Si0.92Ge0.08 to annealing in nitrogen or oxygen ambient
Published in Journal of materials science. Materials in electronics (01-07-2007)“…While the dynamics of thermal oxidation of Si has been adequately described for over three decades, details of SiGe oxidation are not entirely clear. In…”
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3
A Fully Integrated CMOS Power Amplifier Using Superharmonic Injection-Locking for Short-Range Applications
Published in IEEE sensors journal (01-09-2011)“…This work demonstrates the feasibility of using a superharmonic injection-locked oscillator as a power amplifier for short-range, low-power applications. This…”
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The Impact of On-Chip Interconnections on CMOS RF Integrated Circuits
Published in IEEE transactions on electron devices (01-09-2009)“…Achieving power- and area-efficient fully integrated transceivers is one of the major challenges faced when designing high-frequency electronic circuits…”
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5
Electrical characterization of polymer-based FETs fabricated by spin-coating poly(3-alkylthiophene)s
Published in IEEE transactions on electron devices (01-11-2004)“…The current-voltage (I-V) characteristics of two different polymer thin-film transistors (TFTs), based on spin-coating of poly(3-hexylthiophene)-P3HT and…”
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6
Modeling vacancy injection from the silicon/silicon-nitride interface
Published in Journal of materials science. Materials in electronics (01-04-2008)“…Vacancy injection is known to occur from the silicon/silicon-nitride interface under conditions of thermal nitridation and during anneal in inert or oxidizing…”
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7
The response of open-volume defects in Si sub(0.92)Ge sub(0.08) to annealing in nitrogen or oxygen ambient
Published in Journal of materials science. Materials in electronics (01-07-2007)“…While the dynamics of thermal oxidation of Si has been adequately described for over three decades, details of SiGe oxidation are not entirely clear. In…”
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Journal Article -
8
The response of open-volume defects in Si0.92Ge0.08to annealing in nitrogen or oxygen ambient
Published in Journal of materials science. Materials in electronics (2007)Get full text
Conference Proceeding -
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TRANSIENT DIFFUSION OF BERYLLIUM AND SILICON IN GALLIUM ARSENIDE
Published in Annual review of materials science (01-08-1998)“…Transient diffusion is an increasingly important phenomenon as thermal budgets for real processes decrease and diffusion during sample growth becomes more…”
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10
Accurate measurements of the intrinsic diffusivities of boron and phosphorus in silicon
Published in Applied physics letters (25-09-2000)“…All activity in modeling transient diffusion behavior relies on knowledge of the inert intrinsic diffusivities of dopants in Si. The measurements upon which…”
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11
Impact of growth conditions on vacancy-type defects in silicon-germanium structures grown by molecular-beam epitaxy
Published in Applied physics letters (28-03-2005)“…Silicon-germanium layers of either 200 nm or 250 nm have been grown via molecular-beam epitaxy (MBE) on p -type (001) silicon substrates. Each sample was…”
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12
Effect of encapsulant material on the diffusion of beryllium in molecular beam epitaxy gallium arsenide
Published in Applied physics letters (01-04-1996)“…Experiments were done that illustrate the role of the wafer surface in the transient diffusion of Be in GaAs. Samples were doped during molecular beam…”
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