Search Results - "HEIKKILA, Mikko"

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  1. 1

    Representation transfer for differentially private drug sensitivity prediction by Niinimäki, Teppo, Heikkilä, Mikko A, Honkela, Antti, Kaski, Samuel

    Published in Bioinformatics (15-07-2019)
    “…Abstract Motivation Human genomic datasets often contain sensitive information that limits use and sharing of the data. In particular, simple anonymization…”
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  2. 2

    Evaluation and Comparison of Novel Precursors for Atomic Layer Deposition of Nb2O5 Thin Films by Blanquart, Timothee, Niinistö, Jaakko, Heikkilä, Mikko, Sajavaara, Timo, Kukli, Kaupo, Puukilainen, Esa, Xu, Chongying, Hunks, William, Ritala, Mikko, Leskelä, Markku

    Published in Chemistry of materials (27-03-2012)
    “…Atomic layer deposition (ALD) of Nb2O5 thin films was studied using three novel precursors, namely, tBuNNb­(NEt2)3, tBuNNb­(NMeEt)3, and tamylNNb­(OtBu)3…”
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  3. 3

    Atomic Layer Deposition of ScF3 and Sc x Al y F z Thin Films by Atosuo, Elisa, Heikkilä, Mikko J., Majlund, Johanna, Pesonen, Leevi, Mäntymäki, Miia, Mizohata, Kenichiro, Leskelä, Markku, Ritala, Mikko

    Published in ACS omega (12-03-2024)
    “…In this paper, we present an ALD process for ScF3 using Sc­(thd)3 and NH4F as precursors. This is the first material made by ALD that has a negative thermal…”
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  4. 4

    Solid-State Conversion of Scandium Phosphate into Scandium Oxide with Sodium Compounds by Yagmurlu, Bengi, Zhang, Wenzhong, Heikkilä, Mikko J, Koivula, Risto T, Friedrich, Bernd

    “…The application of scandium (Sc) is hindered by insufficient supply. The majority of the world Sc supply is sourced from industrial byproducts, where Sc needs…”
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  5. 5

    Red Y2O3:Eu-Based Electroluminescent Device Prepared by Atomic Layer Deposition for Transparent Display Applications by Rosa, José, Heikkilä, Mikko J., Sirkiä, Mika, Merdes, Saoussen

    Published in Materials (19-03-2021)
    “…Y2O3:Eu is a promising red-emitting phosphor owing to its high luminance efficiency, chemical stability, and non-toxicity. Although Y2O3:Eu thin films can be…”
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  6. 6

    Ethical dilemmas and well-being in teachers’ work: A three-wave, two-year longitudinal study by Heikkilä, Mikko, Mauno, Saija, Herttalampi, Mari, Minkkinen, Jaana, Muotka, Joona, Feldt, Taru

    Published in Teaching and teacher education (01-04-2023)
    “…The aim of the present longitudinal study was two-fold: First, to explore what kinds of ethical dilemma groups can be identified among Finnish teachers…”
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  7. 7

    Studies on atomic layer deposition of MOF-5 thin films by Salmi, Leo D., Heikkilä, Mikko J., Puukilainen, Esa, Sajavaara, Timo, Grosso, David, Ritala, Mikko

    Published in Microporous and mesoporous materials (01-12-2013)
    “…•Continuous MOF-5 thin films were deposited using atomic layer deposition (ALD) and a two-step crystallization procedure.•For the first time MOF films were…”
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  8. 8

    Intensified job demands, stress of conscience and nurses' experiences during organizational change by Heikkilä, Mikko, Huhtala, Mari, Mauno, Saija, Feldt, Taru

    Published in Nursing ethics (01-02-2022)
    “…Background: Nurses frequently face ethically demanding situations in their work, and these may lead to stress of conscience. Working life is currently…”
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  9. 9
  10. 10

    Comparing modelled and measured exhaust gas components from two LNG-powered ships by Heikkilä, Mikko, Kuittinen, Niina, Grönholm, Tiia

    Published in Atmospheric Environment: X (01-08-2024)
    “…Bottom-up modelling is used frequently to estimate emissions produced by seagoing vessels, and the accuracy of modelling is dependent on the data the model is…”
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  11. 11

    Zeolitic imidazole Framework-8 (ZIF-8) fibers by gas-phase conversion of electroblown zinc oxide and aluminum doped zinc oxide fibers by Holopainen, Jani, Heikkilä, Mikko J., Salmi, Leo D., Ainassaari, Kaisu, Ritala, Mikko

    Published in Microporous and mesoporous materials (01-09-2018)
    “…Electroblowing was used to prepare ZnO and aluminum doped zinc oxide (AZO, 1–3 cation-% of Al) fibers. The as-blown fibers were calcined at 500 °C to obtain…”
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  12. 12

    The local ship speed reduction effect on black carbon emissions measured at a remote marine station by Heikkilä, Mikko, Luoma, Krista, Mäkelä, Timo, Grönholm, Tiia

    Published in Atmospheric chemistry and physics (15-08-2024)
    “…Speed restrictions for ships have been introduced locally to reduce the waves and turbulence causing erosion, and safety hazards, and to mitigate the air and…”
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  13. 13

    Displacement control of a mobile crane using a digital hydraulic power management system by Heikkilä, Mikko, Linjama, Matti

    Published in Mechatronics (Oxford) (01-06-2013)
    “…•New concept for a displacement controlled mobile crane is presented.•Control principle of a digital hydraulic power management system is proposed.•Possibility…”
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  14. 14

    High‐temperature X‐ray scattering studies of atomic layer deposited IrO2 by Heikkilä, Mikko J., Hämäläinen, Jani, Puukilainen, Esa, Leskelä, Markku, Ritala, Mikko

    Published in Journal of applied crystallography (01-04-2020)
    “…IrO2 is an important material in numerous applications ranging from catalysis to the microelectronics industry, but despite this its behaviour upon annealing…”
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  15. 15

    Effect of ice class to vessel fuel consumption based on real-life MRV data by Heikkilä, Mikko, Grönholm, Tiia, Majamäki, Elisa, Jalkanen, Jukka-Pekka

    Published in Transport policy (01-03-2024)
    “…Ice classed ships have specially designed, reinforced hulls and large engines, which may influence open-water fuel efficiency. Ice classification typically…”
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  16. 16

    Nickel Germanide Thin Films by Atomic Layer Deposition by Väyrynen, Katja, Vihervaara, Anton, Hatanpää, Timo, Mattinen, Miika, Heikkilä, Mikko J, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

    Published in Chemistry of materials (23-07-2019)
    “…This work presents preparation of nickel germanide (Ni2Ge) thin films by atomic layer deposition (ALD). The films were grown using NiCl2(tmpda) (tmpda =…”
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  17. 17

    Al2O3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications by Zhu, Zhen, Merdes, Saoussen, Ylivaara, Oili M. E., Mizohata, Kenichiro, Heikkilä, Mikko J., Savin, Hele

    “…In this article, a combined H2O thermal atomic layer deposition of Al2O3 with in situ N2 plasma treatment process at 90 °C for encapsulation applications is…”
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  18. 18

    Sequential Selective Dissolution of Coinage Metals in Recyclable Ionic Media by Zupanc, Anže, Install, Joseph, Weckman, Timo, Melander, Marko M, Heikkilä, Mikko J, Kemell, Marianna, Honkala, Karoliina, Repo, Timo

    Published in Angewandte Chemie International Edition (29-07-2024)
    “…Coinage metals Cu, Ag, and Au are essential for modern electronics and their recycling from waste materials is becoming increasingly important to guarantee the…”
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  19. 19

    Atomic Layer Deposition of Photoconductive Cu2O Thin Films by Iivonen, Tomi, Heikkilä, Mikko J, Popov, Georgi, Nieminen, Heta-Elisa, Kaipio, Mikko, Kemell, Marianna, Mattinen, Miika, Meinander, Kristoffer, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

    Published in ACS omega (30-06-2019)
    “…Herein, we report an atomic layer deposition (ALD) process for Cu2O thin films using copper­(II) acetate [Cu­(OAc)2] and water vapor as precursors. This…”
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  20. 20

    Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulses by Mattinen, Miika, Hämäläinen, Jani, Vehkamäki, Marko, Heikkilä, Mikko J, Mizohata, Kenichiro, Jalkanen, Pasi, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

    Published in Journal of physical chemistry. C (21-07-2016)
    “…Atomic layer deposition (ALD) is an advanced thin-film deposition method based on self-limiting surface reactions that allows for the controlled deposition of…”
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