Search Results - "HATANPÄÄ, Timo"

Precursors as enablers of ALD technology: Contributions from University of Helsinki by Hatanpää, Timo, Ritala, Mikko, Leskelä, Markku

“…•ALD chemistries studied for over two decades at University of Helsinki are reviewed.•Processes were developed for group 2 and 4 elements, Bi, Pt group metals…”
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Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium by Pore, Viljami, Hatanpää, Timo, Ritala, Mikko, Leskelä, Markku

“…Atomic layer deposition (ALD) of metal selenide and telluride thin films has been limited because of a lack of precursors that would at the same time be safe…”
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Intralanthanide Separation on Layered Titanium(IV) Organophosphate Materials via a Selective Transmetalation Process by Zhang, Wenzhong, Hietala, Sami, Khriachtchev, Leonid, Hatanpää, Timo, Doshi, Bhairavi, Koivula, Risto

“…The lanthanides (Ln) are an essential part of many advanced technologies. Our societal transformation toward renewable energy drives their ever-growing demand…”
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3D-printed sensor electric circuits using atomic layer deposition by Kestilä, Antti, Vehkamäki, Marko, Nyman, Leo, Salmi, Mika, Lohilahti, Jarkko, Hatanpää, Timo, Lafont, Ugo, Ritala, Mikko

“…3D-printing, also known as additive manufacturing, has enabled the production of dynamically shaped objects often customized for specific applications. Many…”
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Reductive Thermal Atomic Layer Deposition Process for Gold by Vihervaara, Anton, Hatanpää, Timo, Nieminen, Heta-Elisa, Mizohata, Kenichiro, Chundak, Mykhailo, Ritala, Mikko

“…In this work, we developed an atomic layer deposition (ALD) process for gold metal thin films from chloro­(triethylphosphine)­gold­(I) [AuCl­(PEt3)] and…”
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Submicron fibers as a morphological improvement of amorphous zirconium oxide particles and their utilization in antimonate (Sb()) removal by Lönnrot, Satu, Suorsa, Valtteri, Paajanen, Johanna, Hatanpää, Timo, Ritala, Mikko, Koivula, Risto

“…Mesoporous and large surface area zirconium oxide aggregate granules with good adsorption properties were synthesized using a simple precipitation method…”
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Highly Material Selective and Self‐Aligned Photo‐assisted Atomic Layer Deposition of Copper on Oxide Materials by Miikkulainen, Ville, Vehkamäki, Marko, Mizohata, Kenichiro, Hatanpää, Timo, Ritala, Mikko

“…There is a growing need for bottom‐up fabrication methods in microelectronic industry as top‐down, lithography‐based methods face increasing challenges. In…”
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Polyelectrolyte stabilized nanodiamond dispersions by Tiainen, Tony, Myllymäki, Teemu T.T., Hatanpää, Timo, Tenhu, Heikki, Hietala, Sami

“…Colloidal stability of negatively charged nanodiamonds (ND) has been realized with the help of double hydrophilic block copolymers poly(ethylene…”
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Atomic Layer Deposition of Antimony and its Compounds Using Dechlorosilylation Reactions of Tris(triethylsilyl)antimony by Pore, Viljami, Knapas, Kjell, Hatanpää, Timo, Sarnet, Tiina, Kemell, Marianna, Ritala, Mikko, Leskelä, Markku, Mizohata, Kenichiro

“…For the first time an element other than a metal was deposited by atomic layer deposition (ALD). Pure and conformal thin films of elemental antimony were…”
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Molecular Layer Deposition of Thermally Stable Polybenzimidazole‐Like Thin Films and Nanostructures by Ghafourisaleh, Saba, Hatanpää, Timo, Vihervaara, Anton, Mizohata, Kenichiro, Vehkamäki, Marko, Leskelä, Markku, Putkonen, Matti, Ritala, Mikko

“…The deposition of polybenzimidazole (PBI)‐like thin films by molecular layer deposition is reported here for the first time using isophthalic acid (IPA) and…”
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Electroblown titanium dioxide and titanium dioxide/silicon dioxide submicron fibers with and without titania nanorod layer for strontium(II) uptake by Paajanen, Johanna, Pettilä, Lauri, Lönnrot, Satu, Heikkilä, Mikko, Hatanpää, Timo, Ritala, Mikko, Koivula, Risto

“…•Submicron titania and titania/silica composite fibers were prepared by electroblowing.•Rutile titania nanorods were hydrothermally synthesized on the…”
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Use of Disaccharides in Inhibiting Enzymatic Activity Loss and Secondary Structure Changes in Freeze-Dried β-Galactosidase during Storage by Heljo, Ville Petteri, Jouppila, Kirsi, Hatanpää, Timo, Juppo, Anne M

“…Purpose The purpose of this study is to show how disaccharides differ in their ability to protect lyophilized β-galactosidase from enzymatic activity loss and…”
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Bismuth(III) Alkoxide Catalysts for Ring-Opening Polymerization of Lactides and ϵ-Caprolactone by Vuorinen, Sirpa, Lahcini, Mohammed, Hatanpää, Timo, Sundberg, Markku, Leskelä, Markku, Repo, Timo

“…Homoleptic bismuth alkoxide complexes, Bi(OR)3 [R = iPr (1), tBu (2), and CMe2iPr (3)], are used as catalysts in the ring‐opening polymerization (ROP) of…”
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Cycloheptatrienyl-Cyclopentadienyl Heteroleptic Precursors for Atomic Layer Deposition of Group 4 Oxide Thin Films by Niinistö, Jaakko, Hatanpää, Timo, Kariniemi, Maarit, Mäntymäki, Miia, Costelle, Leila, Mizohata, Kenichiro, Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku

“…Atomic layer deposition (ALD) processes for the growth of ZrO2 and TiO2 were developed using novel precursors. The novel processes were based on…”
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Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Films by Mäkelä, Maarit, Hatanpää, Timo, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

“…Five Au­(III) compounds were synthesized and evaluated for atomic layer deposition of Au thin films. One of the compounds, Me2Au­(S2CNEt2), showed optimal…”
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Crystal structures and thermal properties of some rare earth alkoxides with tertiary alcohols: Possible precursors for atomic layer deposition of rare earth oxides by Hatanpää, Timo, Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku

“…Rare earth (RE) alkoxides of Y, La, Pr, and Gd were synthesized using three tertiary alcohols namely 2,3-dimethyl-2-butanol, 2,2-dimethyl-3-ethyl-3-pentanol,…”
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Atomic Layer Deposition of PbI2 Thin Films by Popov, Georgi, Mattinen, Miika, Hatanpää, Timo, Vehkamäki, Marko, Kemell, Marianna, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

“…Atomic layer deposition (ALD) enables the deposition of numerous materials in thin film form, yet there are no ALD processes for metal iodides. Herein, we…”
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Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films by Kariniemi, Maarit, Niinistö, Jaakko, Hatanpää, Timo, Kemell, Marianna, Sajavaara, Timo, Ritala, Mikko, Leskelä, Markku

“…Thermal properties of various silver precursors known in the literature were evaluated in order to discover which precursor is the most suitable one for…”
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Studies on Thermal Atomic Layer Deposition of Silver Thin Films by Mäkelä, Maarit, Hatanpää, Timo, Mizohata, Kenichiro, Meinander, Kristoffer, Niinistö, Jaakko, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

“…The growth of Ag thin films by thermal atomic layer deposition (ALD) was studied. A commercial Ag compound, Ag­(fod) (PEt3), was applied with a reducing agent,…”
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Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films by Väyrynen, Katja, Hatanpää, Timo, Mattinen, Miika, Heikkilä, Mikko, Mizohata, Kenichiro, Meinander, Kristoffer, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

“…In this paper, we introduce a new Co precursor for the atomic layer deposition (ALD) of Co metal and other Co containing materials. CoCl2(TMEDA) (TMEDA =…”
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