Search Results - "HARADA, Ryosuke"

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    Atomic Layer Deposition of Pt Thin Films Using Dimethyl (N,N‑Dimethyl-3-Butene-1-Amine‑N) Platinum and O2 Reactant by Lee, Woo-Jae, Wan, Zhixin, Kim, Chang-Min, Oh, Il-Kwon, Harada, Ryosuke, Suzuki, Kazuharu, Choi, Eun-Ae, Kwon, Se-Hun

    Published in Chemistry of materials (23-07-2019)
    “…Pt thin films, using the Pt precursor, dimethyl­(N,N-dimethyl-3-butene-1-amine-N)­platinum (DDAP, C8H19NPt), were deposited by atomic layer deposition (ALD)…”
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    A dinuclear Ni(μ-H)Ru complex derived from H2 by OGO, Seiji, KABE, Ryota, TAMADA, Taro, KUROKI, Ryota, UEHARA, Keiji, KURE, Bunsho, NISHIMURA, Takashi, MENON, Saija C, HARADA, Ryosuke, FUKUZUMI, Shunichi, HIGUCHI, Yoshiki, OHHARA, Takashi

    “…Models of the active site in [NiFe]hydrogenase enzymes have proven challenging to prepare. We isolated a paramagnetic dinuclear nickel-ruthenium complex with a…”
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    Long-term safety and effectiveness of a continuous erythropoietin receptor activator (CERA) in patients with renal anemia: a prospective, observational, multicenter study by Tabata, Hidehiro, Kanno, Hiroyuki, Murayama, Ayako, Ishii, Tadashi, Harada, Ryosuke, Udagawa, Yukio

    Published in Renal replacement therapy (06-06-2019)
    “…BackgroundThis observational study investigated the safety and effectiveness of continuous erythropoietin receptor activator in patients with renal anemia in…”
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    A porphyrin nanochannel: formation of cationic channels by a protonated saddle-distorted porphyrin and its inclusion behavior by Harada, Ryosuke, Kojima, Takahiko

    “…A highly saddle-distorted dodecaphenylporphyrin dication (H4DPP2+) was revealed by X-ray crystallography to form positively charged porphyrin nanochannels…”
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    A Porphyrin Nanotube: Size-Selective Inclusion of Tetranuclear Molybdenum-Oxo Clusters by Harada, Ryosuke, Matsuda, Yoshihisa, Ōkawa, Hisashi, Kojima, Takahiko

    Published in Angewandte Chemie International Edition (26-03-2004)
    “…Mo takes the tube: A saddle‐distorted MoV–porphyrin complex forms a tubular assembly through intermolecular π–π interactions, which has an internal diameter of…”
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    Synthesis, characterization, and distortion properties of vanadyl complexes of octaphenylporphyrin and dodecaphenylporphyrin by Harada, Ryosuke, Ōkawa, Hisashi, Kojima, Takahiko

    Published in Inorganica Chimica Acta (01-02-2005)
    “…Vanadyl porphyrin complexes, VO(OPP) (OPP = 2,3,5,10,12,13,15,20-octaphenylporphinato; 1) and VO(DPP) (DPP =…”
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    Reversible and stable redox behavior of a Pt(II) bis(dithiobenzoate)-type complex attributed to rotaxane-based stabilization by Harada, Ryosuke, Hosomi, Takuro, Masai, Hiroshi, Terao, Jun

    Published in Tetrahedron letters (25-07-2018)
    “…[Display omitted] •A π-extended Pt(II) bis(dithiobenzoate) complex was prepared and characterized.•Macrocyclic insulation was essential for the efficient…”
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    Sustained Area-Selectivity in Atomic Layer Deposition of Ir Films: Utilization of Dual Effects of O 3 in Deposition and Etching by Kim, Han, Kim, Taeseok, Chung, Hong Keun, Jeon, Jihoon, Kim, Sung-Chul, Won, Sung Ok, Harada, Ryosuke, Tsugawa, Tomohiro, Kim, Sangtae, Kim, Seong Keun

    “…Area-selective deposition (ASD) based on self-aligned technology has emerged as a promising solution for resolving misalignment issues during ultrafine…”
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    Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H2O as a Reactant by Kim, Hye-Mi, Lee, Jung-Hoon, Lee, Seung-Hwan, Harada, Ryosuke, Shigetomi, Toshiyuki, Lee, Seungjoon, Tsugawa, Tomohiro, Shong, Bonggeun, Park, Jin-Seong

    Published in Chemistry of materials (22-06-2021)
    “…Ruthenium (Ru) has drawn attention in the field of future semiconductor processing as a diffusion barrier layer and an electrode material. Here, ruthenium…”
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    Atomic Layer Deposition of Ru for Replacing Cu-Interconnects by Kotsugi, Yohei, Han, Seung-Min, Kim, Youn-Hye, Cheon, Taehoon, Nandi, Dip K, Ramesh, Rahul, Yu, Neung-Kyung, Son, Kirak, Tsugawa, Tomohiro, Ohtake, Shigeyuki, Harada, Ryosuke, Park, Young-Bae, Shong, Bonggeun, Kim, Soo-Hyun

    Published in Chemistry of materials (27-07-2021)
    “…The atomic layer deposition (ALD) of Ru using a metal–organic precursor, tricarbonyl­(trimethylenemethane)ruthenium [Ru­(TMM)­(CO)3] and O2 as a reactant is…”
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    Sustained Area‐Selectivity in Atomic Layer Deposition of Ir Films: Utilization of Dual Effects of O3 in Deposition and Etching by Kim, Han, Kim, Taeseok, Chung, Hong Keun, Jeon, Jihoon, Kim, Sung‐Chul, Won, Sung Ok, Harada, Ryosuke, Tsugawa, Tomohiro, Kim, Sangtae, Kim, Seong Keun

    “…Area‐selective deposition (ASD) based on self‐aligned technology has emerged as a promising solution for resolving misalignment issues during ultrafine…”
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    Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition by Chung, Hong Keun, Kim, Han, Jeon, Jihoon, Kim, Sung-Chul, Won, Sung Ok, Harada, Ryosuke, Tsugawa, Tomohiro, Chung, Yoon Jang, Baek, Seung-Hyub, Park, Tae Joo, Kim, Seong Keun

    Published in The journal of physical chemistry letters (20-07-2023)
    “…Understanding the initial growth process during atomic layer deposition (ALD) is essential for various applications employing ultrathin films. This study…”
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    A Dinuclear Ni(µ-H)Ru Complex Derived from H 2 by Ogo, Seiji, Kabe, Ryota, Uehara, Keiji, Kure, Bunsho, Nishimura, Takashi, Menon, Saija C., Harada, Ryosuke, Fukuzumi, Shunichi, Higuchi, Yoshiki, Ohhara, Takashi, Tamada, Taro, Kuroki, Ryota

    “…Models of the active site in [NiFe]hydrogenase enzymes have proven challenging to prepare. We isolated a paramagnetic dinuclear nickel-ruthenium complex with a…”
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    Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen by Park, Na-Yeon, Kim, Minsu, Kim, Youn-Hye, Ramesh, Rahul, Nandi, Dip K, Tsugawa, Tomohiro, Shigetomi, Toshiyuki, Suzuki, Kazuharu, Harada, Ryosuke, Kim, Miso, An, Ki-Seok, Shong, Bonggeun, Kim, Soo-Hyun

    Published in Chemistry of materials (22-02-2022)
    “…Atomic layer deposition (ALD) is an advanced technology that can be used to deposit extremely thin and conformal films of iridium (Ir). However, ALD techniques…”
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    Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu by Han, Seung-Min, Nandi, Dip K., Joo, Yong-Hwan, Shigetomi, Toshiyuki, Suzuki, Kazuharu, Nabeya, Shunichi, Harada, Ryosuke, Kim, Soo-Hyun

    “…High-quality Pt thin films are prepared by atomic layer deposition (ALD) using metal-organic precursors dimethyl-(N,N-dimethyl-3-butene-1-amine-N) platinum…”
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    A Porphyrin Nanotube: Size-Selective Inclusion of Tetranuclear Molybdenum-Oxo Clusters by Harada, Ryosuke, Matsuda, Yoshihisa, Ōkawa, Hisashi, Kojima, Takahiko

    Published in Angewandte Chemie (26-03-2004)
    “…Mo schaut in die Röhre: Ein sattelförmig verzerrter MoV‐Porphyrin‐Komplex bildet über intermolekulare π‐π‐Wechselwirkungen Röhren mit einem Innendurchmesser…”
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