Search Results - "Gwang Jeong, Yu"
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Reactive ion etching of indium gallium zinc oxide (IGZO) and chamber cleaning using low global warming potential gas
Published in Applied surface science (30-10-2024)“…[Display omitted] •When etching IGZO with CxHyFz/Ar, compared to CxFy/Ar and CxHy/Ar gases, the selectivity of PR and etching rate also increased.•As the gases…”
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Indium tin oxide etch characteristics using CxH2x+2(x=1,2,3)/Ar
Published in Materials science in semiconductor processing (15-06-2023)“…For the next generation display devices, dry etching technique for indium tin oxide (ITO) used as a transparent electrode is required to obtain a highly…”
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33.3: A 14.1-Inch WXGA+ LCD Panel Using Hybrid Silicon Thin Film Transistors
Published in SID International Symposium Digest of technical papers (01-06-2009)“…A hybrid silicon technology (HyST) thin film transistor (TFT) process using a diode‐pumped solid state (DPSS) laser has been developed by implementing…”
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Development of a new hybrid silicon thin-film transistor fabrication process
Published in Journal of Information Display (01-03-2009)“…A new hybrid silicon thin-film transistor (TFT) fabrication process using the DPSS laser crystallization technique was developed in this study to realize…”
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