Search Results - "Gundlach, Heiko"

Experimental determination of the hafnium L-subshell fundamental parameters using the holistic approach by Wauschkuhn, Nils, Gundlach, Heiko, Hönicke, Philipp

“…Abstract By employing the recently demonstrated new holistic approach, the atomic fundamental parameters (FPs) of the three Hf-L subshells were experimentally…”
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Skin tolerant inactivation of multiresistant pathogens using far-UVC LEDs by Glaab, Johannes, Lobo-Ploch, Neysha, Cho, Hyun Kyong, Filler, Thomas, Gundlach, Heiko, Guttmann, Martin, Hagedorn, Sylvia, Lohan, Silke B., Mehnke, Frank, Schleusener, Johannes, Sicher, Claudia, Sulmoni, Luca, Wernicke, Tim, Wittenbecher, Lucas, Woggon, Ulrike, Zwicker, Paula, Kramer, Axel, Meinke, Martina C., Kneissl, Michael, Weyers, Markus, Winterwerber, Ulrike, Einfeldt, Sven

“…Multiresistant pathogens such as methicillin-resistant Staphylococcus aureus (MRSA) cause serious postoperative infections. A skin tolerant far-UVC (< 240 nm)…”
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Author Correction: Skin tolerant inactivation of multiresistant pathogens using far-UVC LEDs by Glaab, Johannes, Lobo‑Ploch, Neysha, Cho, Hyun Kyong, Filler, Thomas, Gundlach, Heiko, Guttmann, Martin, Hagedorn, Sylvia, Lohan, Silke B., Mehnke, Frank, Schleusener, Johannes, Sicher, Claudia, Sulmoni, Luca, Wernicke, Tim, Wittenbecher, Lucas, Woggon, Ulrike, Zwicker, Paula, Kramer, Axel, Meinke, Martina C., Kneissl, Michael, Weyers, Markus, Winterwerber, Ulrike, Einfeldt, Sven

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Photoluminescence and Stability of Sputtered SiO x Layers by Hosseini-Saber, Seyed Mohammad Ali, Muydinov, Ruslan, Ahmadi, Najme, Ibaceta-Jaña, Josefa, Kazemi, Zainab, Seeger, Stefan, Gundlach, Heiko, Gernert, Ulrich, Szyszka, Bernd, Eichler, Hans Joachim

“…SiO x layers with thicknesses of about 300–1000 nm are produced by sputtering silicon onto glass and quartz substrates. Silicon is oxidized during deposition,…”
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Photoluminescence and Stability of Sputtered SiOx Layers by Hosseini-Saber, Seyed Mohammad Ali, Muydinov, Ruslan, Ahmadi, Najme, Ibaceta-Jaña, Josefa, Kazemi, Zainab, Seeger, Stefan, Gundlach, Heiko, Gernert, Ulrich, Szyszka, Bernd, Eichler, Hans Joachim

“…SiOx layers with thicknesses of about 300–1000 nm are produced by sputtering silicon onto glass and quartz substrates. Silicon is oxidized during deposition,…”
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