Search Results - "Gu, Sipeng"
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Process monitoring using advanced inspection methodologies - a study with CVD
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01-05-2014)“…Defect free film deposition is one of the most challenging steps in CMOS manufacturing for 28nm process node and beyond. For precise control over surface,…”
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Conference Proceeding -
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Wafer Level Variability Improvement by Spatial Source/Drain Activation and Ion Implantation Super Scan for FinFET Technology
Published in IEEE transactions on semiconductor manufacturing (01-08-2018)“…In this paper, CMOS wafer level ring oscillator frequency variability improvement >40% is demonstrated by either spatial source/drain activation or ion…”
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Journal Article -
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Synthesis and characterization of atmospheric pressure chemically vapor deposited aluminum
Published 01-01-2008“…This study investigates the use of atmospheric pressure chemical vapor deposition (APCVD) to produce high quality aluminum coatings for corrosion protection of…”
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Dissertation -
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Synthesis and characterization of atmospheric pressure chemically vapor deposited aluminum
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Dissertation -
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Thermal phase change and activation energy of crystallization of Ge-Sb-Te-Sn thin films
Published in 中国光学快报(英文版) (01-12-2003)“…O4; To improve the optical storage performance, Sn was doped into Ge2Sb2Te5 phase change thin films. The optical and thermal properties of Sn-doped Ge2Sb2Te5…”
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Journal Article