A new formula for sputtering yield as function of ion energies at normal incidence

The statistical ellipsoidal construction has been reconstructed into the statistical conicoidal construction, to describe the sputtering yield, at normal incidence, for various ion energies. The most important advantage of the new volume is the developing of a simple-single equation to describe the...

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Bibliographic Details
Published in:	Physica. B, Condensed matter Vol. 405; no. 7; pp. 1775 - 1781
Main Authors:	Grais, Kh. I., Shaltout, A.A., Ali, S.S., Boutros, R.M., El-behery, K.M., El-Sayed, Z.A.
Format:	Journal Article
Language:	English
Published:	Kidlington Elsevier B.V 01-04-2010 Elsevier
Subjects:	Atomic, molecular, and ion beam impact and interactions with surfaces Condensed matter Condensed matter: electronic structure, electrical, magnetic, and optical properties Conicoidal model Construction Electron and ion emission by liquids and solids; impact phenomena Exact sciences and technology Experimental data Impact phenomena (including electron spectra and sputtering) Incidence Ion beams Mathematical analysis Mathematical models Physics Sputtering Sputtering yield Theoretical data Thresholds Conicoidal model Experimental data Sputtering yield Theoretical data Yields Heavy ions Ion beam sputtering Analytical method Radiation doses Modelling Threshold energy
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Summary:	The statistical ellipsoidal construction has been reconstructed into the statistical conicoidal construction, to describe the sputtering yield, at normal incidence, for various ion energies. The most important advantage of the new volume is the developing of a simple-single equation to describe the sputtering–energy relationship. Its parameters have been pictorially predicted from the conicoidal representation. A correction term [1–( E th/E i ) 1/ Ω ] was added to the present new equation to describe the threshold energy ( E th ) of sputtering. The developed equation could be applied to all available ion/target combinations, over a broadened range of energy for low and heavy ion-masses. The new equation has been differentiated with respect to energy giving rise to a relation between the threshold energy and maximum energy, at which the maximum sputtering yield occurs. It was found that, the obtained theoretical sputtering data for low and heavy ions satisfactorily approaches the available experimental data and works well at the threshold regime. It should be mentioned that the conicoidal model is not only of interest for analytical glow discharge method but also for ion beam method for the sputtering process, where low and high sputtering values could occur.
Bibliography:	ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23
ISSN:	0921-4526 1873-2135
DOI:	10.1016/j.physb.2010.01.038