Search Results - "González, Mireia Bargalló"
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Blistering of atomic layer deposition Al2O3 layers grown on silicon and its effect on metal–insulator–semiconductor structures
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-01-2013)“…In this work, a study of the influence of the processing conditions on the blistering of Al2O3 layers grown by atomic layer deposition (ALD) on silicon…”
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Exploring Conductance Quantization Effects in Electroformed Filaments for Their Potential Application to a Resistance Standard
Published in Advanced quantum technologies (Online) (01-07-2023)“…The ballistic conduction through narrow constrictions connecting charge reservoirs exhibits conductance quantization effects. Since the quantum of conductance…”
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Unpredictable Bits Generation Based on RRAM Parallel Configuration
Published in IEEE electron device letters (01-02-2019)“…In this letter, a cell with the parallel combination of two TiN/Ti/HfO 2 /W resistive random access memory (RRAM) devices is studied for the generation of…”
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Investigation of Filamentary Current Fluctuations Features in the High-Resistance State of Ni/HfO2-Based RRAM
Published in IEEE transactions on electron devices (01-08-2016)“…In this paper, the presence of filamentary current instabilities in the high resistance state of Ni/HfO 2 -based RRAM devices and their associated current…”
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True Random Number Generator based on the Variability of the High Resistance State of RRAMs
Published in IEEE access (01-01-2023)“…Hardware-based security primitives like True Random Number Generators (TRNG) have become a crucial part in protecting data over communication channels. With…”
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Cycle-to-cycle variability analysis of Ti/Al2O3-based memristors
Published in Solid-state electronics (01-12-2023)Get full text
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Resistive Switching with Self-Rectifying Tunability and Influence of the Oxide Layer Thickness in Ni/HfO2/n+-Si RRAM Devices
Published in IEEE transactions on electron devices (01-08-2017)“…The impact of the dielectric thickness, forming polarity, and current compliance on the self-rectifying current-voltage(I-V) characteristics of Ni/HfO 2 /n +…”
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Application of the Clustering Model to Time-Correlated Oxide Breakdown Events in Multilevel Antifuse Memory Cells
Published in IEEE electron device letters (01-12-2020)“…Time statistics for successive breakdown (BD) events in Al 2 O 3 /HfO 2 -based nanolaminates aimed to the development of multilevel one-time programmable (OTP)…”
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Germanium content dependence of the leakage current of recessed SiGe source/drain junctions
Published in Journal of materials science. Materials in electronics (01-07-2007)“…The impact of the Ge fraction (x), on the leakage current of recessed Si1−xGex p+-n source/drain junctions has been investigated, for a fixed recess depth of…”
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Conference Proceeding Journal Article -
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Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-01-2013)“…The electrical properties of HfO2-based metal–insulator–semiconductor capacitors have been systematically investigated by means of I–V and C–V characteristics,…”
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A Conductive AFM Nanoscale Analysis of NBTI and Channel Hot-Carrier Degradation in MOSFETs
Published in IEEE transactions on electron devices (01-09-2014)“…This paper addresses the impact of different electrical stresses on nanoscale electrical properties of the MOSFET gate dielectric. Using a conductive atomic…”
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SPICE model for the ramp rate effect in the reset characteristic of memristive devices
Published in 2017 32nd Conference on Design of Circuits and Integrated Systems (DCIS) (01-11-2017)“…This paper addresses the role played by the voltage ramp rate in the reset transient of resistive switching TiN/Ti/HfÜ2/W devices. The reset parameters…”
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Conference Proceeding -
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Impact of Ge Content and Recess Depth on the Leakage Current in Strained \hbox\hbox/\hbox Heterojunctions
Published in IEEE transactions on electron devices (01-08-2011)“…A study of the impact of the Ge content and the recess depth on the leakage current of strained Si 1- x Ge x /Si p + n heterojunctions is presented. A rise in…”
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Impact of Ge Content and Recess Depth on the Leakage Current in Strained Si1―xGex/Si Heterojunctions
Published in IEEE transactions on electron devices (01-08-2011)Get full text
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Stress Analysis and Junction Leakage of Sub-Melt Laser Annealed SiGe Epitaxial Layers
Published in IEEE transactions on semiconductor manufacturing (01-11-2010)“…The purpose of this paper is to study the impact of the different post-epi process steps on the stress behavior of epitaxially grown Si 1-x -Ge x layers on Si…”
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Factors Influencing the Leakage Current in Embedded SiGe Source/Drain Junctions
Published in IEEE transactions on electron devices (01-03-2008)“…This paper studies the leakage current components in embedded Si 1-x ,Ge x , source/drain (S/D) p + -n junctions, with different Ge contents, varying between…”
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Simulation of serial RRAM cell based on a Verilog-A compact model
Published in 2021 XXXVI Conference on Design of Circuits and Integrated Systems (DCIS) (24-11-2021)“…Model-based simulation is one of the effective methods of scientific research. The inherent variability of resistive switching mechanisms has been an obstacle…”
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Conference Proceeding -
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Investigation of Filamentary Current Fluctuations Features in the High-Resistance State of Ni/HfO 2 -Based RRAM
Published in IEEE transactions on electron devices (01-08-2016)Get full text
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Investigation of Filamentary Current Fluctuations Features in the High-Resistance State of Ni/HfO sub(2)-Based RRAM
Published in IEEE transactions on electron devices (01-08-2016)“…In this paper, the presence of filamentary current instabilities in the high resistance state of Ni/HfO sub(2)-based RRAM devices and their associated current…”
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