Search Results - "Gokhale, Maheshwar R."
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Inductively coupled plasma–reactive ion etching of c- and a-plane AlGaN over the entire Al composition range: Effect of BCl3 pretreatment in Cl2/Ar plasma chemistry
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-11-2013)“…Inductively coupled plasma (ICP)–reactive ion etching (RIE) patterning is a standard processing step for UV and optical photonic devices based on III-nitride…”
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Journal Article -
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Inductively coupled plasma–reactive ion etching of c- and a-plane AlGaN over the entire Al composition range: Effect of BCl{sub 3} pretreatment in Cl{sub 2}/Ar plasma chemistry
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (15-11-2013)“…Inductively coupled plasma (ICP)–reactive ion etching (RIE) patterning is a standard processing step for UV and optical photonic devices based on III-nitride…”
Get full text
Journal Article