Search Results - "Gierałtowska, Sylwia"

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  1. 1

    Regularly arranged ZnO/TiO2, HfO2, and ZrO2 core/shell hybrid nanostructures - towards selection of the optimal shell material for efficient ZnO-based UV light emitters by Gierałtowska, Sylwia, Zaleszczyk, Wojciech, Putkonen, Matti, Zasada, Dariusz, Korona, Krzysztof P., Norek, Małgorzata

    Published in Ceramics international (01-10-2023)
    “…Luminescent properties of ZnO/TiO2, ZnO/HfO2, and ZnO/ZrO2 core/shell hybrid nanotubes (NTs) with the shell thickness varying between 9 and 40 nm were studied…”
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    Journal Article
  2. 2

    Electrical properties of isotype and anisotype ZnO/4H-SiC heterojunction diodes by Taube, Andrzej, Sochacki, Mariusz, Kwietniewski, Norbert, Werbowy, Aleksander, Gierałtowska, Sylwia, Wachnicki, Łukasz, Godlewski, Marek, Szmidt, Jan

    Published in Applied physics letters (03-04-2017)
    “…Electrical properties of isotype n-ZnO/n-4H-SiC and anisotype n-ZnO/p-4H-SiC heterojunction diodes have been investigated and compared. The influence of the…”
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    Journal Article
  3. 3

    Characterization of dielectric layers grown at low temperature by atomic layer deposition by Gieraltowska, Sylwia, Wachnicki, Lukasz, Witkowski, Bartlomiej S., Mroczynski, Robert, Dluzewski, Piotr, Godlewski, Marek

    Published in Thin solid films (27-02-2015)
    “…Dielectric films, such as hafnium dioxide (HfO2), aluminum oxide (Al2O3), zirconium dioxide (ZrO2), titanium dioxide (TiO2) and their composite layers are…”
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    Journal Article
  4. 4

    Investigations of Structural and Electrical Properties of ALD Films Formed with the Ozone Precursor by Seweryn, Aleksandra, Lawniczak-Jablonska, Krystyna, Kuzmiuk, Piotr, Gieraltowska, Sylwia, Godlewski, Marek, Mroczynski, Robert

    Published in Materials (18-09-2021)
    “…The continuous development of ALD thin films demands ongoing improvements and changes toward fabricating materials with tailored properties that are suitable…”
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    Journal Article
  5. 5

    Atomic Layer Deposition of HfO2 Films Using TDMAH and Water or Ammonia Water by Gieraltowska, Sylwia, Wachnicki, Lukasz, Dluzewski, Piotr, Witkowski, Bartlomiej S., Godlewski, Marek, Guziewicz, Elzbieta

    Published in Materials (30-05-2023)
    “…Atomic layer deposition of HfO2 from TDMAH and water or ammonia water at different temperatures below 400 °C is studied. Growth per cycle (GPC) has been…”
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    Journal Article
  6. 6

    Crystal Lattice Recovery and Optical Activation of Yb Implanted into β-Ga2O3 by Sarwar, Mahwish, Ratajczak, Renata, Ivanov, Vitalii Yu, Gieraltowska, Sylwia, Wierzbicka, Aleksandra, Wozniak, Wojciech, Heller, René, Eisenwinder, Stefan, Guziewicz, Elżbieta

    Published in Materials (10-08-2024)
    “…β-Ga2O3 is an ultra-wide bandgap semiconductor (Eg~4.8 eV) of interest for many applications, including optoelectronics. Undoped Ga2O3 emits light in the UV…”
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    Journal Article
  7. 7

    Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films by Szymańska, Magdalena, Gierałtowska, Sylwia, Wachnicki, Łukasz, Grobelny, Marcin, Makowska, Katarzyna, Mroczyński, Robert

    Published in Applied surface science (15-05-2014)
    “…•Structural and electrical characterization of HfOx and HfOxNy thin films.•Analysis of the influence of deposition process parameters on properties of…”
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    Journal Article Conference Proceeding
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    High-k oxides by atomic layer deposition—Applications in biology and medicine by Godlewski, Marek, Gierałtowska, Sylwia, Wachnicki, Łukasz, Pietuszka, Rafał, Witkowski, Bartłomiej S., Słońska, Anna, Gajewski, Zdzisław, Godlewski, Michał M.

    “…Wide band gap oxides grown by atomic layer deposition (ALD) are intensively studied for applications as insulators (gate oxides in field effect transistors)…”
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    Journal Article
  11. 11

    Application of deposited by ALD HfO2 and Al2O3 layers in double-gate dielectric stacks for non-volatile semiconductor memory (NVSM) devices by Mroczyński, Robert, Taube, Andrzej, Gierałtowska, Sylwia, Guziewicz, Elżbieta, Godlewski, Marek

    Published in Applied surface science (15-08-2012)
    “…► Feasibility of application of double-gate dielectric stacks with ALD layers in NVSM was investigated. ► Significant improvement in retention at elevated…”
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    Journal Article Conference Proceeding
  12. 12

    Electrical characterization of ZnO/4H-SiC n-p heterojunction diode by Kwietniewski, Norbert, Masłyk, Monika, Werbowy, Aleksander, Taube, Andrzej, Gierałtowska, Sylwia, Wachnicki, Łukasz, Sochacki, Mariusz

    “…The structure and electrical properties of zinc oxide (ZnO) thin films fabricated by atomic layer deposition (ALD) as well as electrical properties of…”
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    Journal Article
  13. 13

    Effect of the post-deposition annealing on electrical characteristics of MIS structures with HfO2/SiO2 gate dielectric stacks by Taube, Andrzej, Mroczyński, Robert, Korwin-Mikke, Katarzyna, Gierałtowska, Sylwia, Szmidt, Jan, Piotrowska, Anna

    “…In this work, we report on effects of post-deposition annealing on electrical characteristics of metal–insulator–semiconductor (MIS) structures with HfO2/SiO2…”
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    Journal Article
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  15. 15

    Photovoltaic properties of ZnO nanorods/p-type Si heterojunction structures by Pietruszka, Rafal, Witkowski, Bartlomiej Slawomir, Luka, Grzegorz, Wachnicki, Lukasz, Gieraltowska, Sylwia, Kopalko, Krzysztof, Zielony, Eunika, Bieganski, Piotr, Placzek-Popko, Ewa, Godlewski, Marek

    Published in Beilstein journal of nanotechnology (14-02-2014)
    “…Selected properties of photovoltaic (PV) structures based on n-type zinc oxide nanorods grown by a low temperature hydrothermal method on p-type silicon…”
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    Journal Article
  16. 16

    Enhancing GaN Nanowires Performance Through Partial Coverage with Oxide Shells (Small 44/2024) by Szymon, Radoslaw, Zielony, Eunika, Sobanska, Marta, Stachurski, Tomasz, Reszka, Anna, Wierzbicka, Aleksandra, Gieraltowska, Sylwia, Zytkiewicz, Zbigniew R.

    “…UV Optoelectronics In article number 2401139, Radoslaw Szymon and co‐workers report on the performance enhancement of GaN nanowires achieved through partial…”
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    Journal Article
  17. 17

    Enhancing GaN Nanowires Performance Through Partial Coverage with Oxide Shells by Szymon, Radoslaw, Zielony, Eunika, Sobanska, Marta, Stachurski, Tomasz, Reszka, Anna, Wierzbicka, Aleksandra, Gieraltowska, Sylwia, Zytkiewicz, Zbigniew R.

    “…Core‐shell gallium nitride (GaN)‐based nanowires offer noteworthy opportunities for innovation in high‐frequency opto‐ and microelectronics. This work delves…”
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    Journal Article
  18. 18

    Defect accumulation in β-Ga2O3 implanted with Yb by Sarwar, Mahwish, Ratajczak, Renata, Mieszczynski, Cyprian, Wierzbicka, Aleksandra, Gieraltowska, Sylwia, Heller, René, Eisenwinder, Stefan, Wozniak, Wojciech, Guziewicz, Elżbieta

    Published in Acta materialia (15-04-2024)
    “…Radiation-induced crystal lattice damage and its recovery in wide bandgap oxides, in particular beta-gallium oxide (β-Ga2O3), is a complex process. This paper…”
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    Journal Article
  19. 19

    Atomic Layer Deposition of HfO 2 Films Using TDMAH and Water or Ammonia Water by Gieraltowska, Sylwia, Wachnicki, Lukasz, Dluzewski, Piotr, Witkowski, Bartlomiej S, Godlewski, Marek, Guziewicz, Elzbieta

    Published in Materials (30-05-2023)
    “…Atomic layer deposition of HfO from TDMAH and water or ammonia water at different temperatures below 400 °C is studied. Growth per cycle (GPC) has been…”
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    Journal Article
  20. 20

    Crystal Lattice Recovery and Optical Activation of Yb Implanted into β-Ga 2 O 3 by Sarwar, Mahwish, Ratajczak, Renata, Ivanov, Vitalii Yu, Gieraltowska, Sylwia, Wierzbicka, Aleksandra, Wozniak, Wojciech, Heller, René, Eisenwinder, Stefan, Guziewicz, Elżbieta

    Published in Materials (10-08-2024)
    “…β-Ga O is an ultra-wide bandgap semiconductor (E ~4.8 eV) of interest for many applications, including optoelectronics. Undoped Ga O emits light in the UV…”
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    Journal Article