Search Results - "Gierałtowska, Sylwia"
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Regularly arranged ZnO/TiO2, HfO2, and ZrO2 core/shell hybrid nanostructures - towards selection of the optimal shell material for efficient ZnO-based UV light emitters
Published in Ceramics international (01-10-2023)“…Luminescent properties of ZnO/TiO2, ZnO/HfO2, and ZnO/ZrO2 core/shell hybrid nanotubes (NTs) with the shell thickness varying between 9 and 40 nm were studied…”
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Electrical properties of isotype and anisotype ZnO/4H-SiC heterojunction diodes
Published in Applied physics letters (03-04-2017)“…Electrical properties of isotype n-ZnO/n-4H-SiC and anisotype n-ZnO/p-4H-SiC heterojunction diodes have been investigated and compared. The influence of the…”
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Characterization of dielectric layers grown at low temperature by atomic layer deposition
Published in Thin solid films (27-02-2015)“…Dielectric films, such as hafnium dioxide (HfO2), aluminum oxide (Al2O3), zirconium dioxide (ZrO2), titanium dioxide (TiO2) and their composite layers are…”
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Investigations of Structural and Electrical Properties of ALD Films Formed with the Ozone Precursor
Published in Materials (18-09-2021)“…The continuous development of ALD thin films demands ongoing improvements and changes toward fabricating materials with tailored properties that are suitable…”
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Atomic Layer Deposition of HfO2 Films Using TDMAH and Water or Ammonia Water
Published in Materials (30-05-2023)“…Atomic layer deposition of HfO2 from TDMAH and water or ammonia water at different temperatures below 400 °C is studied. Growth per cycle (GPC) has been…”
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Crystal Lattice Recovery and Optical Activation of Yb Implanted into β-Ga2O3
Published in Materials (10-08-2024)“…β-Ga2O3 is an ultra-wide bandgap semiconductor (Eg~4.8 eV) of interest for many applications, including optoelectronics. Undoped Ga2O3 emits light in the UV…”
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Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films
Published in Applied surface science (15-05-2014)“…•Structural and electrical characterization of HfOx and HfOxNy thin films.•Analysis of the influence of deposition process parameters on properties of…”
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Journal Article Conference Proceeding -
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Enhanced Luminescence of Yb3+ Ions Implanted to ZnO through the Selection of Optimal Implantation and Annealing Conditions
Published in Materials (21-02-2023)“…Rare earth-doped zinc oxide (ZnO:RE) systems are attractive for future optoelectronic devices such as phosphors, displays, and LEDs with emission in the…”
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Influence of Atomic Layer Deposition Temperature on the Electrical Properties of Al/ZrO2/SiO2/4H‐SiC Metal‐Oxide Semiconductor Structures
Published in Physica status solidi. A, Applications and materials science (11-07-2018)“…In this paper a ZrO2/SiO2/4H‐SiC dielectric system for potential application as gate dielectric for SiC MOSFETs is investigated. An enhanced breakdown…”
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High-k oxides by atomic layer deposition—Applications in biology and medicine
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-03-2017)“…Wide band gap oxides grown by atomic layer deposition (ALD) are intensively studied for applications as insulators (gate oxides in field effect transistors)…”
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Application of deposited by ALD HfO2 and Al2O3 layers in double-gate dielectric stacks for non-volatile semiconductor memory (NVSM) devices
Published in Applied surface science (15-08-2012)“…► Feasibility of application of double-gate dielectric stacks with ALD layers in NVSM was investigated. ► Significant improvement in retention at elevated…”
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Journal Article Conference Proceeding -
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Electrical characterization of ZnO/4H-SiC n-p heterojunction diode
Published in Physica status solidi. A, Applications and materials science (01-05-2016)“…The structure and electrical properties of zinc oxide (ZnO) thin films fabricated by atomic layer deposition (ALD) as well as electrical properties of…”
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Effect of the post-deposition annealing on electrical characteristics of MIS structures with HfO2/SiO2 gate dielectric stacks
Published in Materials science & engineering. B, Solid-state materials for advanced technology (01-09-2012)“…In this work, we report on effects of post-deposition annealing on electrical characteristics of metal–insulator–semiconductor (MIS) structures with HfO2/SiO2…”
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Photovoltaic properties of ZnO nanorods/p-type Si heterojunction structures
Published in Beilstein journal of nanotechnology (14-02-2014)“…Selected properties of photovoltaic (PV) structures based on n-type zinc oxide nanorods grown by a low temperature hydrothermal method on p-type silicon…”
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Enhancing GaN Nanowires Performance Through Partial Coverage with Oxide Shells (Small 44/2024)
Published in Small (Weinheim an der Bergstrasse, Germany) (01-11-2024)“…UV Optoelectronics In article number 2401139, Radoslaw Szymon and co‐workers report on the performance enhancement of GaN nanowires achieved through partial…”
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Enhancing GaN Nanowires Performance Through Partial Coverage with Oxide Shells
Published in Small (Weinheim an der Bergstrasse, Germany) (01-11-2024)“…Core‐shell gallium nitride (GaN)‐based nanowires offer noteworthy opportunities for innovation in high‐frequency opto‐ and microelectronics. This work delves…”
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Defect accumulation in β-Ga2O3 implanted with Yb
Published in Acta materialia (15-04-2024)“…Radiation-induced crystal lattice damage and its recovery in wide bandgap oxides, in particular beta-gallium oxide (β-Ga2O3), is a complex process. This paper…”
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Atomic Layer Deposition of HfO 2 Films Using TDMAH and Water or Ammonia Water
Published in Materials (30-05-2023)“…Atomic layer deposition of HfO from TDMAH and water or ammonia water at different temperatures below 400 °C is studied. Growth per cycle (GPC) has been…”
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Journal Article -
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Crystal Lattice Recovery and Optical Activation of Yb Implanted into β-Ga 2 O 3
Published in Materials (10-08-2024)“…β-Ga O is an ultra-wide bandgap semiconductor (E ~4.8 eV) of interest for many applications, including optoelectronics. Undoped Ga O emits light in the UV…”
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