Search Results - "Gibbons, James F."
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Preferential Growth of Semiconducting Single-Walled Carbon Nanotubes by a Plasma Enhanced CVD Method
Published in Nano letters (01-02-2004)“…Single-walled carbon nanotubes (SWNT) are grown by a plasma enhanced chemical vapor deposition (PECVD) method at 600 °C. The nanotubes are of high quality as…”
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Molecular characterization of blaESBL-producing Escherichia coli cultured from pig farms in Ireland
Published in Journal of antimicrobial chemotherapy (01-11-2016)“…To characterize ESBL-encoding Escherichia coli cultured from pigs and their plasmids carrying these genes following conjugation into recipient strains. Six…”
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Patterns of antimicrobial resistance in pathogenic Escherichia coli isolates from cases of calf enteritis during the spring-calving season
Published in Veterinary microbiology (14-05-2014)“…Neonatal enteritis is a common condition of young calves and can be caused by pathogenic strains of Escherichia coli. We hypothesised that on-farm…”
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Fabrication and analysis of deep submicron strained-Si n-MOSFET's
Published in IEEE transactions on electron devices (01-07-2000)“…Deep submicron strained-Si n-MOSFETs were fabricated on strained Si/relaxed Si/sub 0.8/Ge/sub 0.2/ heterostructures. Epitaxial layer structures were designed…”
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Growth and Processing of Relaxed-Si 1-x Ge x /Strained-Si Structures for Metal-Oxide Semiconductor Applications
Published in Japanese Journal of Applied Physics (01-04-1994)“…Epitaxial growth and processing issues related to strained-Si metal-oxide semiconductor field effect transistor (MOSFET) fabrication are discussed. The…”
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Molecular characterization of bla ESBL -producing Escherichia coli cultured from pig farms in Ireland
Published in Journal of antimicrobial chemotherapy (01-11-2016)Get full text
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Diffusion of silicon in gallium arsenide using rapid thermal processing: experiment and model
Published in Applied physics letters (15-04-1984)“…Rapid thermal processing was used to diffuse Si into GaAs from a thin elemental source. Several encapsulants were applied. The diffusion was found to be…”
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Off-Campus Higher Education Engineering Instruction Using Videotape. Final Report
Published 01-06-1976“…This document presents the final report of a project to evaluate the effectiveness of using videotape television to present graduate level engineering courses…”
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A 14% efficient nonaqueous semiconductor/liquid junction solar cell
Published in Applied physics letters (15-11-1984)“…We describe the most efficient semiconductor/liquid junction solar cell reported to date. Under W-halogen (ELH) illumination, the device is a 14% efficient…”
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Range-Energy Relations for Protons in Heavy Substrates
Published in Japanese Journal of Applied Physics (01-01-1973)Get full text
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Effect of band alignment and density of states on the collector current in p-Si/n-Si1-yCy/p-Si HBTs
Published in IEEE transactions on electron devices (01-02-2003)“…p-Si/n-Si1-yCy/p-Si heterojunction bipolar transistors with varying carbon fractions in the base were grown by rapid thermal chemical vapor deposition (RTCVD),…”
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CONDUCTIVITY AND HALL MOBILITY OF ION-IMPLANTED SILICON IN SEMI-INSULATING GALLIUM ARSENIDE
Published in Applied physics letters (01-01-1969)“…Chromium-doped semi-insulating gallium arsenide has been successfully doped n-type by ion implantation of silicon. Annealing studies are presented which show…”
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Bandgap and transport properties of Si1-xGex by analysis of nearly ideal Si/Si1-xGex/Si heterojunction bipolar transistors
Published in IEEE transactions on electron devices (01-10-1989)Get full text
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Periodic Dependence of the Electronic Stopping Cross Section for Energetic Heavy Ions in Solids
Published in Physical review (01-01-1968)Get full text
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Si/Si1-xGex heterojunction bipolar transistors produced by limited reaction processing
Published in IEEE electron device letters (01-02-1989)Get full text
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Application of limited reaction processing to atomic layer epitaxy: Growth of cadmium telluride using diisopropyl telluride and dimethyl cadmium
Published in Applied physics letters (29-08-1994)“…A new thin film growth technique is introduced which combines the advantages of atomic layer epitaxy and limited reaction processing. Using this technique, the…”
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MA-3 applications of scanning CW laser and electron beams for silicon device processing
Published in IEEE transactions on electron devices (01-11-1979)Get full text
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Ion implantation in semiconductors-Part I: Range distribution theory and experiments
Published in Proceedings of the IEEE (1968)“…Ion implantation in semiconductors provides a doping technique with several potential advantages over more conventional doping methods. Among the most…”
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Transconductance enhancement in deep submicron strained Si n-MOSFETs
Published in International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217) (1998)“…We report the first measurements on deep submicron strained-Si n-MOSFETs. In spite of the high channel doping and vertical effective fields, electron mobility…”
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Conference Proceeding -
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Electrical and material quality of Si1-xGex/Si p-N heterojunctions produced by limited reaction processing
Published in IEEE electron device letters (01-04-1989)“…Si1-xGex/Si p-N heterojunctions prepared by a chemical vapor deposition technique, limited reaction processing (LRP) were characterized using DC electrical…”
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