Search Results - "Gibbons, James F."

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    Preferential Growth of Semiconducting Single-Walled Carbon Nanotubes by a Plasma Enhanced CVD Method by Li, Yiming, Mann, David, Rolandi, Marco, Kim, Woong, Ural, Ant, Hung, Steven, Javey, Ali, Cao, Jien, Wang, Dunwei, Yenilmez, Erhan, Wang, Qian, Gibbons, James F, Nishi, Yoshio, Dai, Hongjie

    Published in Nano letters (01-02-2004)
    “…Single-walled carbon nanotubes (SWNT) are grown by a plasma enhanced chemical vapor deposition (PECVD) method at 600 °C. The nanotubes are of high quality as…”
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    Journal Article
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    Molecular characterization of blaESBL-producing Escherichia coli cultured from pig farms in Ireland by Wang, Juan, Gibbons, James F, McGrath, Kathleen, Bai, Li, Li, Fengqin, Leonard, Finola C, Stephan, Roger, Fanning, Séamus

    Published in Journal of antimicrobial chemotherapy (01-11-2016)
    “…To characterize ESBL-encoding Escherichia coli cultured from pigs and their plasmids carrying these genes following conjugation into recipient strains. Six…”
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    Journal Article
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    Patterns of antimicrobial resistance in pathogenic Escherichia coli isolates from cases of calf enteritis during the spring-calving season by Gibbons, James F., Boland, Fiona, Buckley, James F., Butler, Francis, Egan, John, Fanning, Séamus, Markey, Bryan K., Leonard, Finola C.

    Published in Veterinary microbiology (14-05-2014)
    “…Neonatal enteritis is a common condition of young calves and can be caused by pathogenic strains of Escherichia coli. We hypothesised that on-farm…”
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    Journal Article
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    Fabrication and analysis of deep submicron strained-Si n-MOSFET's by Rim, K., Hoyt, J.L., Gibbons, J.F.

    Published in IEEE transactions on electron devices (01-07-2000)
    “…Deep submicron strained-Si n-MOSFETs were fabricated on strained Si/relaxed Si/sub 0.8/Ge/sub 0.2/ heterostructures. Epitaxial layer structures were designed…”
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    Journal Article
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    Growth and Processing of Relaxed-Si 1-x Ge x /Strained-Si Structures for Metal-Oxide Semiconductor Applications by Welser, Jeffrey, Judy L. Hoyt, Judy L. Hoyt, James F. Gibbons, James F. Gibbons

    Published in Japanese Journal of Applied Physics (01-04-1994)
    “…Epitaxial growth and processing issues related to strained-Si metal-oxide semiconductor field effect transistor (MOSFET) fabrication are discussed. The…”
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    Journal Article
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    Diffusion of silicon in gallium arsenide using rapid thermal processing: experiment and model by GREINER, M. E, GIBBONS, J. F

    Published in Applied physics letters (15-04-1984)
    “…Rapid thermal processing was used to diffuse Si into GaAs from a thin elemental source. Several encapsulants were applied. The diffusion was found to be…”
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    Journal Article
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    Off-Campus Higher Education Engineering Instruction Using Videotape. Final Report by Gibbons, James F

    Published 01-06-1976
    “…This document presents the final report of a project to evaluate the effectiveness of using videotape television to present graduate level engineering courses…”
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  9. 9

    A 14% efficient nonaqueous semiconductor/liquid junction solar cell by GIBBONS, J. F, COGAN, G. W, GRONET, C. M, LEWIS, N. S

    Published in Applied physics letters (15-11-1984)
    “…We describe the most efficient semiconductor/liquid junction solar cell reported to date. Under W-halogen (ELH) illumination, the device is a 14% efficient…”
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    Journal Article
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    Effect of band alignment and density of states on the collector current in p-Si/n-Si1-yCy/p-Si HBTs by Singh, D.V, Hoyt, J.L, Gibbons, J.F

    Published in IEEE transactions on electron devices (01-02-2003)
    “…p-Si/n-Si1-yCy/p-Si heterojunction bipolar transistors with varying carbon fractions in the base were grown by rapid thermal chemical vapor deposition (RTCVD),…”
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    Journal Article
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    CONDUCTIVITY AND HALL MOBILITY OF ION-IMPLANTED SILICON IN SEMI-INSULATING GALLIUM ARSENIDE by Sansbury, James D., Gibbons, James F.

    Published in Applied physics letters (01-01-1969)
    “…Chromium-doped semi-insulating gallium arsenide has been successfully doped n-type by ion implantation of silicon. Annealing studies are presented which show…”
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    Application of limited reaction processing to atomic layer epitaxy: Growth of cadmium telluride using diisopropyl telluride and dimethyl cadmium by Emerson, Robert M., Hoyt, Judy L., Gibbons, James F.

    Published in Applied physics letters (29-08-1994)
    “…A new thin film growth technique is introduced which combines the advantages of atomic layer epitaxy and limited reaction processing. Using this technique, the…”
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    Journal Article
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    Ion implantation in semiconductors-Part I: Range distribution theory and experiments by Gibbons, J.F.

    Published in Proceedings of the IEEE (1968)
    “…Ion implantation in semiconductors provides a doping technique with several potential advantages over more conventional doping methods. Among the most…”
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    Journal Article
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    Transconductance enhancement in deep submicron strained Si n-MOSFETs by Rim, K., Hoyt, J.L., Gibbons, J.F.

    “…We report the first measurements on deep submicron strained-Si n-MOSFETs. In spite of the high channel doping and vertical effective fields, electron mobility…”
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    Conference Proceeding
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    Electrical and material quality of Si1-xGex/Si p-N heterojunctions produced by limited reaction processing by KING, C. A, HOYT, J. L, NOBLE, D. B, GRONET, C. M, GIBBONS, J. F, SCOTT, M. P, KAMINS, T. I, LADERMAN, S. S

    Published in IEEE electron device letters (01-04-1989)
    “…Si1-xGex/Si p-N heterojunctions prepared by a chemical vapor deposition technique, limited reaction processing (LRP) were characterized using DC electrical…”
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    Journal Article