Search Results - "Gao, Baohong"

Study on the synergistic effect and mechanism of inhibitors benzotriazole and pyrazole on copper surface by Wang, Jing, Gao, Baohong, Liu, Shitong, Liang, Bin, Liu, Mingyu

“…In the giant large-scale integrated circuits manufacturing process, chemical mechanical polishing (CMP) for Cu interconnection can lead to chemical corrosion…”
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Application of surfactant for facilitating benzotriazole removal and inhibiting copper corrosion during post-CMP cleaning by Tang, Jiying, Liu, Yuling, Wang, Chenwei, Niu, Xinhuan, Tan, Baimei, Gao, Baohong

“…Wafer surface is usually contaminated by organic residues, such as benzotriazole(BTA), after chemical mechanical planarization (CMP). Due to the reason that…”
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A study on the comparison of CMP performance between a novel alkaline slurry and a commercial slurry for barrier removal by Wang, Chenwei, Liu, Yuling, Tian, Jianying, Gao, Baohong, Niu, Xinhuan

“…[Display omitted] ► We have proposed a novel alkaline slurry without inhibitors for barrier CMP. ► The slurry provides lower surface roughness values and good…”
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Effect of slurry components on chemical mechanical polishing of copper at low down pressure and a chemical kinetics model by Liu, Xiaoyan, Liu, Yuling, Liang, Yan, Liu, Haixiao, Zhao, Zhiwen, Gao, Baohong

“…The practical use of low dielectric constant materials as inter-layer dielectrics is driving the demand for copper chemical mechanical polishing (CMP) at low…”
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Kinetics model incorporating both the chemical and mechanical effects on material removal for copper chemical mechanical polishing by Liu, Xiaoyan, Liu, Yuling, Liang, Yan, Zhao, Zhiwen, Gao, Baohong

“…A comprehensive model for the copper material removal in a chemical mechanical polishing (CMP) process is presented in which both chemical and mechanical…”
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Optimization of slurry components for a copper chemical mechanical polishing at low down pressure using response surface methodology by Liu, Xiaoyan, Liu, Yuling, Liang, Yan, Liu, Haixiao, Hu, Yi, Gao, Baohong

“…Copper replaced aluminium and the low-dielectric constant material (low- k dielectrics) served as a better isolator, which has become the inevitable developing…”
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Effect of arginine-based cleaning solution on BTA residue removal after Cu-CMP by Wang, Qi, Yin, Da, Gao, Baohong, Tian, Siyu, Sun, Xiaoqin, Liu, Mengrui, Zhang, Shihao, Tan, Baimei

“…[Display omitted] In chemical mechanical polishing (CMP) process, surface defects and contamination will be introduced on the wafer surface due to interfacial…”
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Analysis, identification, and application of distribution of relaxation times in CMP slurry by Li, Wenhaoyu, Gao, Baohong, Huo, Jinxiang, He, Bin, He, Yue, Wang, Jianshu

“…This study delves into the mechanistic roles of oxidants, complexing agents, and inhibitors in slurries through of Distribution of Relaxation Times (DRT)…”
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Theoretical and electrochemical analysis on inhibition effect of benzotriazole and 1,2,4-triazole on cobalt surface by Yin, Da, Yang, Liu, Niu, Xinhuan, Ma, Yingzhuo, Liu, Mengrui, Sun, Xiaoqin, Gao, Baohong, Tan, Baimei

“…The adsorption models of BTA and TAZ on Co (111) surface in aqueous phase were established by Mont Carlo simulation. Nyquist plots of cobalt inhibitors with…”
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A study of FTIR and XPS analysis of alkaline‐based cleaning agent for removing Cu‐BTA residue on Cu wafer by Gao, Baohong, Tan, Baimei, Liu, Yuling, Wang, Chenwei, He, Yangang, Huang, Yanyan

“…This study is to focus on the benzotriazole (BTA) residue problem in the postchemical mechanical planarization (post‐CMP) cleaning process. The adsorption of…”
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Theoretical and electrochemical analysis on inhibition effects of benzotriazole derivatives (un- and methyl) on copper surface by Yin, Da, Yang, Liu, Tan, Baimei, Ma, Tengda, Zhang, Shihao, Wang, Yazhen, Guo, Lei, Gao, Baohong, He, Yangang

“…•Quantum chemical parameters of BTA and M-BTA were evaluated by DFT theory.•N7 and N8 atoms of BTA and M-BTA are the coordination sites of the…”
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MicroRNA-432 is downregulated in cervical cancer and directly targets FN1 to inhibit cell proliferation and invasion by Wang, Shanzong, Gao, Baohong, Yang, Hailin, Liu, Xuejian, Wu, Xia, Wang, Weijuan

“…Numerous studies have identified the dysregulation of microRNAs (miRNAs) in cervical cancer, and dysregulated miRNAs are involved in regulating a number of…”
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Recent advances and future developments in PVA brush scrubbing cleaning: A review by Zhang, Shihao, Wang, Fangyuan, Tan, Baimei, Li, Wei, Gao, Baohong, He, Yangang

“…As semiconductor integrated circuits (SICs) have been developed to scale down to obtain higher integration and better performance, more chemical mechanical…”
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Application of an optimized alkaline cleaning solution for inhibitor removal during the post-CMP process: Performance evaluation and mechanism analysis by Li, Wei, Tan, Baimei, Zhang, Shihao, Gao, Baohong, Ma, Boao, Guo, Lei, Du, Haoyu, Wang, Fangyuan, Wang, Xiaolong

“…[Display omitted] •A novel post-CMP alkaline cleaning solution was developed for BTA residue removal.•This cleaning solution was proved also helps to achieve a…”
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Experimental and computational studies on TAD as an additive of copper chemical mechanical polishing by Huo, Jinxiang, Gao, Baohong, He, Bin, Li, Wenhaoyu, Liang, Bin, Liu, Mingyu, Chen, Xuhua

“…With its low resistivity and high mobility, copper (Cu) is widely used as a metallic material to interconnect processes in the fabrication of integrated…”
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Design of a Visual Detection Method for Prohibited Item Packages Detection Based on the YOLO Model by Zhu, Hanning, Gao, Baohong, Qiao, Langchao, Ma, Yanze, Feng, Wentao, Wu, Jiaji

“…In this paper, we introduce a prohibited item package detection system based on the YOLO model. Utilizing the state-of-the-art YOLO as its core object…”
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Study on Infrared Spectrum Detection and Analysis of BTA Residual after Copper CMP by Wang, Qi, Tan, Baimei, Tian, Siyu, Han, Chunyu, Yang, Liu, Gao, Baohong

“…During Cu CMP process BTA is widely used as a corrosion inhibitor, reacts with Cu and forms a strong hydrophobic Cu(II)-BTA complex, which causes severe device…”
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Study on Different Surfactants for Post CMP Cleaning of Novel Barrier by Tian, Siyu, Tan, Baimei, Wang, Qi, Han, Chunyu, Yang, Liu, Gao, Baohong

“…The effects of different concentration of chelating agent and different surfactants and concentration changes on the removal of BTA and particles on copper…”
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