Search Results - "Galy, P."
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1
Trap Recovery by in-Situ Annealing in Fully-Depleted MOSFET With Active Silicide Resistor
Published in IEEE electron device letters (01-07-2021)“…This work reports first original results on the impact of active in-situ electro-thermal recovery, on the electrical and low-frequency noise characteristics of…”
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2
Cryogenic Subthreshold Swing Saturation in FD-SOI MOSFETs Described With Band Broadening
Published in IEEE electron device letters (01-05-2019)“…In the standard MOSFET description of the drain current <inline-formula> <tex-math notation="LaTeX"> {I}_{{D}} </tex-math></inline-formula> as a function of…”
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3
Cryogenic Temperature Characterization of a 28-nm FD-SOI Dedicated Structure for Advanced CMOS and Quantum Technologies Co-Integration
Published in IEEE journal of the Electron Devices Society (01-01-2018)“…Silicon co-integration offers compelling scale-up opportunities for quantum computing. In this framework, cryogenic temperature is required for the coherence…”
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4
Improved Retention Characteristics of Z2-FET Employing Half Back-Gate Control
Published in IEEE transactions on electron devices (01-03-2021)“…The structure of zero impact ionization, zero subthreshold swing field-effect transistor (Z 2 -FET) has been modified by stacking a half side of back-gate (BG)…”
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5
3-D TCAD Study of the Implications of Channel Width and Interface States on FD-SOI Z2-FETs
Published in IEEE transactions on electron devices (01-06-2019)“…3-D numerical technology computer-aided design simulations, based on experimental results, are performed to study the origin of the large Z 2 -FET dynamic…”
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6
Memory Operations of Zero Impact Ionization, Zero Subthreshold Swing FET Matrix Without Selectors
Published in IEEE electron device letters (01-03-2020)“…This work experimentally demonstrates the memory operations of a Z 2 -FET (Zero impact ionization, Zero subthreshold swing) matrix without the use of…”
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7
Cryogenic Characterization of 28-nm FD-SOI Ring Oscillators With Energy Efficiency Optimization
Published in IEEE transactions on electron devices (01-09-2018)“…Extensive electrical characterization of ring oscillators (ROs) made in high-<inline-formula> <tex-math notation="LaTeX">{k} </tex-math></inline-formula> metal…”
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8
Effects of Solanum tuberosum L. ointment on second-degree burns in mice
Published in Veterinary World (01-12-2023)“…Potato ( L.) is mainly characterized by its antioxidant and healing properties. Therefore, this study aimed to evaluate the effects of an ointment based on L…”
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9
Variability Evaluation of 28nm FD-SOI Technology at Cryogenic Temperatures down to 100mK for Quantum Computing
Published in 2020 IEEE Symposium on VLSI Technology (01-06-2020)“…Variability of28nm FD-SOI transistors is evaluated for the first time down to ultra low temperatures (UL T), at T= 1 00mK. High performance is achieved at UL T…”
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Conference Proceeding -
10
Temperature and Gate Leakage Influence on the Z2-FET Memory Operation
Published in ESSDERC 2019 - 49th European Solid-State Device Research Conference (ESSDERC) (01-09-2019)“…Advanced 28 nm node FD-SOI Z 2 -FETs with thin top-gate insulator are characterized as capacitor-less DRAM cells. Experimental and 2D-TCAD results demonstrate…”
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Conference Proceeding -
11
Novel tetra-acridine derivatives as dual inhibitors of topoisomerase II and the human proteasome
Published in Biochemical pharmacology (15-06-2007)“…Acridine derivatives, such as amsacrine, represent a well known class of multi-targeted anti-cancer agents that generally interfere with DNA synthesis and…”
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12
A full characterization of single pitch IO ESD protection based on silicon controlled rectifier and dynamic trigger circuit in CMOS 32 nm node
Published in Microelectronics and reliability (01-09-2011)“…The reliability of electronic devices against electrostatic discharge stresses is still a severe challenge, particularly for deep sub-micron technologies such…”
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13
Evaluation of the ESD performance of local protections based on SCR or bi-SCR with dynamic or static trigger circuit in 32 nm
Published in Microelectronics and reliability (01-09-2010)“…The reliability of electronic devices against electrostatic discharge stresses is still a severe challenge, particularly for deep sub-micron technologies such…”
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Journal Article Conference Proceeding -
14
Beta-Matrix ESD network: Throughout end of placement rules?
Published in 2011 IEEE International Conference on IC Design & Technology (01-05-2011)“…Electrostatic Discharge (ESD) protection for advanced CMOS technologies is based on efficient device Network. But these protection strategies imply some…”
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Conference Proceeding -
15
Comparison between isolated SCR & embedded dual isolated SCR power devices for ESD power clamp in C45nm CMOS technology
Published in 2010 IEEE International Conference on Integrated Circuit Design and Technology (01-06-2010)“…The Electrostatic Discharge (ESD) protection for advanced CMOS technologies is a challenge due to the technology scaling down. The main purpose of this paper…”
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Conference Proceeding -
16
In-situ heater for thermal assist recovery of MOS devices in 28 nm UTBB FD-SOI CMOS technology
Published in Solid-state electronics (01-06-2020)“…Preliminary results are reported on an in-situ heater for thermal assist recovery of MOS transistor and is demonstrated in 28 nm Fully Depleted…”
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17
Capacitance RF Characterization and Modeling of 28 FD-SOI CMOS Transistors down to Cryogenic Temperature
Published in 2023 18th European Microwave Integrated Circuits Conference (EuMIC) (18-09-2023)“…In this study we investigate the capacitance characterization and modeling of CMOS transistors integrated in 28nm Ultra Thin Body and Box (UTBB) Fully Depleted…”
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Conference Proceeding -
18
Extended investigation of a novel MOS device for in-situ heating in 28 nm UTBB FD-SOI CMOS technology
Published in 2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) (01-04-2019)“…This work aims to present an extended investigation of a new N-MOS device designed in 28 nm FD-SOIUTBB high-k metal gate technology for in-situ heating…”
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Conference Proceeding -
19
FDSOI for cryoCMOS electronics: device characterization towards compact model
Published in 2022 International Electron Devices Meeting (IEDM) (03-12-2022)“…We present a status of FDSOI transistors electrical characterization for very low temperature operation. We highlight in particular singular transport and…”
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Conference Proceeding -
20
Improved Retention Characteristics of Z 2 -FET Employing Half Back-Gate Control
Published in IEEE transactions on electron devices (01-03-2021)Get full text
Journal Article