Search Results - "Galloway, K.F"
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Nanodiamond Lateral VFEM Technology for Harsh Environments
Published in IEEE transactions on nuclear science (01-08-2007)“…This paper reports the first total dose tests on a nanocrystalline diamond lateral vacuum field emission microelectronics (VFEM) technology. This technology…”
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2
Diamond Vacuum Electronic Device Behavior After High Neutron Fluence Exposure
Published in IEEE transactions on nuclear science (01-08-2009)“…This paper reports the first neutron exposure on diamond electronic test structures for their possible application in very high fluence neutron conditions. The…”
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3
Characterization and CMRR Modeling of a Carbon-Nanotube Field-Emission Differential Amplifier
Published in IEEE transactions on electron devices (01-05-2009)“…A novel vacuum field-emission differential amplifier (diff-amp) based on carbon-nanotube (CNT) emitters has been developed, modeled, and its ac performance…”
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4
Total dose effects in a linear Voltage regulator
Published in IEEE transactions on nuclear science (01-12-2004)“…Experiments and simulations are used to analyze the total-dose response of a linear voltage regulator. Degradation of the dynamic output range of the error…”
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5
Total Dose and Bias Temperature Stress Effects for HfSiON on Si MOS Capacitors
Published in IEEE transactions on nuclear science (01-12-2007)“…We have performed an experimental study of the effects of ionizing radiation and bias-temperature stress on Si MOS devices with HfSiON gate dielectrics. We…”
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Heavy-ion-induced breakdown in ultra-thin gate oxides and high-k dielectrics
Published in IEEE transactions on nuclear science (01-12-2001)“…Presents experimental results on single-event-induced breakdown in sub-5-nm plasma-enhanced SiO/sub 2/, nitrided SiO/sub 2/, Al/sub 2/O/sub 3/, HfO/sub 2/, and…”
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7
Test Circuit for Measuring Pulse Widths of Single-Event Transients Causing Soft Errors
Published in IEEE transactions on semiconductor manufacturing (01-02-2009)“…A novel on-chip test circuit to measure single-event transient (SET) pulse widths has been developed and implemented in IBM 130-nm and 90-nm processes for…”
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Total-dose and single-event effects in DC/DC converter control circuitry
Published in IEEE transactions on nuclear science (01-12-2003)“…Total-dose and single-event effects in the linear control circuitry of DC/DC power converters are examined. Catastrophic failure, induced by error-amplifier…”
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Total-dose and single-event effects in switching DC/DC power converters
Published in IEEE transactions on nuclear science (01-12-2002)“…Total-dose and single-event effects in discrete switching DC/DC power converters are examined using a combination of circuit measurements and simulations. The…”
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10
Long-term reliability degradation of ultrathin dielectric films due to heavy-ion irradiation
Published in IEEE transactions on nuclear science (01-12-2002)“…High-energy ion-irradiated 3.3-nm oxynitride film and 2.2-nm SiO/sub 2/-film MOS capacitors show premature breakdown during subsequent electrical stress. This…”
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High-impact papers presented at the IEEE Nuclear and Space Radiation Effects Conference: the view in 2003
Published in IEEE transactions on nuclear science (01-06-2003)“…This paper identifies a selection of papers presented at the NSREC and published in the IEEE TRANSACTIONS ON NUCLEAR SCIENCE that have had measurable impact on…”
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12
Radiation-enhanced short channel effects due to multi-dimensional influence from charge at trench isolation oxides
Published in IEEE transactions on nuclear science (01-12-1999)“…Radiation enhanced drain induced barrier lowering (DIBL) was experimentally observed and verified by 3D simulations for submicron devices with trench isolation…”
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13
A review of the techniques used for modeling single-event effects in power MOSFETs
Published in IEEE transactions on nuclear science (01-04-1996)“…Heavy ions can trigger catastrophic failure modes in power metal-oxide-semiconductor field-effect transistors (MOSFETs). Single-event effects (SEE), namely,…”
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14
A hydrogen-transport-based interface-trap-generation model for hot-carrier reliability prediction
Published in IEEE electron device letters (01-06-2001)“…Hot-carrier-induced interface-trap generation in n-channel MOSFETs is known to be related to hydrogen-mediated processes. We present a model for interface-trap…”
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15
Model for high-temperature radiation effects in n-p-n bipolar-junction transistors
Published in IEEE transactions on nuclear science (01-12-2002)“…A model is proposed to evaluate both the optimum temperature (leading to the maximum degradation of the device) and the degradation induced by high-temperature…”
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16
The impact of mechanical stress on the total-dose response of linear bipolar transistors with various passivation layers
Published in IEEE transactions on nuclear science (01-10-2005)“…In this work, we investigate how externally applied mechanical stress impacts the total dose hardness and enhanced low-dose-rate sensitivity of linear bipolar…”
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Dose and dose-rate effects on NPN bipolar junction transistors irradiated at high temperature
Published in IEEE transactions on nuclear science (01-06-2002)“…The effect of high-temperature irradiation on commercial bipolar junction transistors has been studied for four dose rates. The experimental data presented in…”
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18
Test structures for analyzing proton radiation effects in bipolar technologies
Published in IEEE transactions on semiconductor manufacturing (01-05-2003)“…Structures integrated onto a BiCMOS test chip are specially designed to characterize the complex mechanisms related to proton radiation response in bipolar…”
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Journal Article Conference Proceeding -
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Evaluation of MOS devices' total dose response using the isochronal annealing method
Published in IEEE transactions on nuclear science (01-12-2001)“…We irradiated and then annealed 4049 CMOS inverters from four different manufacturers using the isochronal annealing method. From one manufacturer to another,…”
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Total dose effects in composite nitride-oxide films
Published in IEEE transactions on nuclear science (01-12-2000)“…Total dose effects in composite nitride-oxide (NO) films with nitride thicknesses from 58 nm to 183 nm and oxide thicknesses from 5 nm to 30 nm are studied. A…”
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