Search Results - "Gaire, Churamani"

Tunable Bandgap in Graphene by the Controlled Adsorption of Water Molecules by Yavari, Fazel, Kritzinger, Christo, Gaire, Churamani, Song, Li, Gulapalli, Hemtej, Borca-Tasciuc, Theodorian, Ajayan, Pulickel M., Koratkar, Nikhil

“…Lack of a bandgap limits the utilization of graphene in nanoelectronic and nanophotonic devices. It is shown that a tunable bandgap of up to ≈0.2 eV can be…”
Get full text

A Novel Approach to Control Source/Drain Cavity Profile for Device Performance Improvement by Lo, Hsien-Ching, Peng, Jianwei, Reis, Edward, Zhu, Baofu, Ma, Wei, Mun, Seong Yeol, Shintri, Shashidhar, Bazizi, El Mehdi, Gaire, Churamani, Qi, Yi, Chen, James, Ting, Seng Nguon, Hu, Owen, Samavedam, Srikanth

“…We present a novel method to form the source/ drain (S/D) cavity for pFET performance improvement-we named this cavity as doping-assisted cavity as its profile…”
Get full text

Epitaxial SiGe seed layer thickness for PFET performance tuning by Shao, Dali, Briggs, Kyle, Kenney, Crystal, Chadwick, Aaron, Gaire, Churamani, Holt, Judson, Peng, Hongying, Hovhannisyan, Anahit, Chen, James, Tong, Weihua

“…SiGe alloys have been widely used as stressors in source/drain (S/D) regions for advanced complementary metal-oxide-semiconductor (CMOS) technologies to…”
Get full text

Advanced Process Control (APC) for Selective EPI process in 300mm Fab by Peng, Hongying, Caruso, Jonathan, Manian, Dinesh Balasubra, Chakravorty, Shiladitya, Mickelson, Ryan, Tay, Jensen, Cabral, Stephen, Lu, Lixin, Gaire, Churamani, Holt, Judson, Braithwaite, Glyn, Shao, Dali, Tong, Wei Hua

“…An advanced in-line process controller, which combines 4 new features with the traditional statistical process control (SPC) feedback control, has been…”
Get full text

Deformation behavior of amorphous silicon nanostructures under monotonic and cyclic loading by Gaire, Churamani

“…An atomic force microscope was used to characterize the deformation behavior of amorphous silicon nanostructures subjected to monotonic and cyclic loading. The…”
Get full text

Effect of Si precursors on micro-loading, morphology and throughput of selective epitaxial growth of si and Si sub(1-x)Ge sub(x) by Gaire, Churamani, Krishnan, Bharat, Liu, Jinping

“…In this paper, we report the effect of two Si precursors, SiH sub(4) and SiCl sub(2)H sub(2) on the micro-loading, morphology and throughput for selective…”
Get full text

Deformation behavior of amorphous silicon nanostructures under monotonic and cyclic loading by Gaire, Churamani

“…An atomic force microscope was used to characterize the deformation behavior of amorphous silicon nanostructures subjected to monotonic and cyclic loading. The…”
Get full text

Effect of Si precursors on micro-loading, morphology and throughput of selective epitaxial growth of si and Si1−xGex by Gaire, Churamani, Krishnan, Bharat, Jinping Liu

“…In this paper, we report the effect of two Si precursors, SiH 4 and SiCl 2 H 2 on the micro-loading, morphology and throughput for selective epitaxial growth…”
Get full text