Search Results - "GRAVE, D. B"

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    Feature evolution simulations of copper seed layer deposition using atomic-level particle scattering information by Vyvoda, M.A., Abrams, C.F., Grave, D.B.

    Published in IEEE transactions on plasma science (01-10-1999)
    “…One of the most important processing steps during copper metallization is the deposition of a thin yet conformal copper seed layer, often using ionized…”
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    Journal Article
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