Search Results - "GADIYAK, G. V."
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Model and computer simulation results of defect transformation and decomposition of SiNx :H films during high temperature treatment
Published in Thin solid films (14-12-1998)Get full text
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A new theoretical model for the description of the degradation of silicon nitride films under high temperature annealing
Published in Applied surface science (01-04-1997)“…A macroscopic kinetic model of the defect transformation and decomposition of he SiN x :H films during high temperature annealing has been considered. The set…”
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Theoretical model for describing degradation of thin hydrogen-containing films
Published in Technical physics (01-08-1997)Get full text
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Model and computer simulation results of defect transformation and decomposition of SiN sub(x):H films during high temperature treatment
Published in Thin solid films (14-12-1998)“…A macroscopic kinetic model of the defect transformation and decomposition of a silicon nitride SiN sub(x):H film during high temperature annealing is proposed…”
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Physical model and numerical results of dissociation kinetics of hydrogen-passivated Si/SiO2 interface defects
Published in Thin solid films (15-08-1999)Get full text
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Theoretical model and computer simulation results of enhanced diffusion of high-temperature implanted aluminum in silicon carbide
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01-07-1998)“…The wide-spread use of silicon carbide (SiC) films in the production of microelectronic devices make predictions of the doping profiles during and/or after…”
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Calculation of the properties of small boron and aluminum clusters
Published in Journal of structural chemistry (01-09-1989)“…Previously abstracted from the original as item 9006-12-0801. Calculations were made of B sub n and Al sub n clusters where n = 2-7, 12 and 13. The most…”
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Modeling the hydrogen distribution accompanying electron injection in SiO2 films in strong electric fields
Published in Semiconductors (Woodbury, N.Y.) (01-03-1997)Get full text
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Dislocation formation and gettering mechanism of impurity atoms close to the active region
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01-05-1997)“…High-energy beams are starting to play an important role in silicon device technology. The most important potential use is the formation of CMOS profiled tubs…”
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Diffusion of boron and phosphorus in silicon during high-temperature ion implantation
Published in Semiconductors (Woodbury, N.Y.) (01-04-1997)Get full text
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Study of Convection in a Liquid with a Free Surface Using Exponential Fitting Discretization
Published in International journal of computational fluid dynamics (01-01-2000)“…The two-dimensional flow of viscous incompressible liquid in a square cavity with a Tree boundary and differentially heated vertical sides is considered in the…”
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A new theoretical model for the description of the degradation of silicon nitride films under high temperature annealing
Published in Applied surface science (1997)Get full text
Conference Proceeding -
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Physical model and results of numerical simulation of the degradation of a Si/SiO2 structure as a result of annealing in vacuum
Published in Semiconductors (Woodbury, N.Y.) (01-09-1998)Get full text
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Calculation of bulk and surface electronic properties of diamond-like semiconductors
Published in Collection of Czechoslovak chemical communications (1984)“…Local density of states (LDS) calculations have been performed by the recursion method for a model diamond-like semiconductor. LDS have been obtained for the…”
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Convective Flow in an Upright Enclosed Square Cavity: A Comparison Exercise
Published in International journal of computational fluid dynamics (01-08-1998)“…The problem concerning the convective flow of liquid in an upright enclosed square cavity with differentially heated vertical sides is considered in the…”
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Numerical simulation of the thermal oxidation of silicon in N2O ambient
Published in Solid-state electronics (01-05-1995)Get full text
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Physical model and numerical results of dissociation kinetics of hydrogen-passivated Si/SiO sub(2) interface defects
Published in Thin solid films (01-01-1999)“…A simple model of thermal dissociation and recovery of hydrogen-passivated silicon defects at the Si/SiO sub(2) interface, such as P sub(b) - centers, during…”
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THE DEVELOPMENT OF THE RADIATION ENHANCED DIFFUSION MODEL OF BORON IN SILICON
Published in Compel (01-04-1993)“…The radiation enhanced diffusion of implanted boron was modeled by considering the kinetic reaction between point defects, dislocations and boron atoms. The…”
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NUMERICAL SIMULATION OF THE THERMAL OXIDATION OF POLYCRYSTALLINE SILICON
Published in Compel (01-04-1993)“…The model of the thermal oxidation of polycrystalline silicon is described. It includes parabolic equation system for the diffusion process of oxidant in…”
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