Search Results - "Gösele, Ulrich M"

Causes and prevention of temperature-dependent bubbles in silicon wafer bonding by MITANI, K, LEHMANN, V, STENGL, R, FEIJOO, D, GOSELE, U. M, MASSOUD, H. Z

“…Unbonded areas or bubbles generated at the interface of bonded silicon wafers in the temperature range of 200-800°C have been investigated. Experiments…”
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Co-precipitation of carbon and oxygen in silicon : the dominant flux criterion by TAYLOR, W. J, GÖSELE, U. M, TAN, T. Y

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A new evaluation method of silicon wafer bonding interfaces and bonding strength by KOH etching by MITANI, K, FEIJOO, D, CHA, G, GÖSELE, U. M

“…KOH anisotropic etching is used to study the interfaces of bonded silicon wafers. This method has been developed to detect the presence of bubbles or unbonded…”
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Wafer bonding technology for silicon-on-lnsulator applications: A review by Mitani, Kiyoshi, Gösele, Ulrich M.

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Wafer Bonding and Layer Splitting for Microsystems by Tong, Q.-Y., Gösele, U. M.

“…In advanced microsystems various types of devices (metal‐oxide semiconductor field‐effect transistors, bipolar transistors, sensors, actuators,…”
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Extended high temperature Al gettering for improvement and homogenization of minority carrier diffusion lengths in multicrystalline Si by Joshi, Subhash M, Gösele, Ulrich M, Tan, Teh Y

“…Multicrystalline Si for photovoltaic applications is a very inhomogeneous material with localized regions of high dislocation density and large impurity and…”
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Sulfur diffusion and the interstitial contribution to arsenic self-diffusion in GaAs by Uematsu, Masashi, Werner, Peter, Schultz, Matthias, Tan, Teh Y., Gösele, Ulrich M.

“…A quantitative determination of the contribution of As self-interstitials to the As self-diffusion coefficient in GaAs has been carried out. Values of the As…”
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European Materials Research Society 1995 Spring Meeting, Symposium N: Carbon, Hydrogen, and Oxygen in Silicon and in Other Elemental Semiconductors by BORGHESI, Alessandro, GÖSELE, Ulrich M, VANHELLEMONT, Jan

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Wafer bonding technology for silicon-on-insulator applications: a review by Mitani, , Kiyoshi, Gosele, Ulrich M

“…Article abstract not available…”
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