Search Results - "Fuelling, Kalyn M."

Effect of Temperature on the Solubility of Metallic Magnesium in Molten MgCl2-KCl-NaCl by Fuelling, Kalyn M., Dale, Olivia R., Choi, Suhee, Simpson, Michael F.

“…Solubility experiments for magnesium metal in molten MgCl 2 -KCl-NaCl were run at 500°C, 600°C, and 650°C. This study is relevant for understanding how to…”
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Atomic Layer Deposition of Cu Electrocatalysts on Gas Diffusion Electrodes for CO2 Reduction by Lenef, Julia D., Lee, Si Young, Fuelling, Kalyn M., Rivera Cruz, Kevin E., Prajapati, Aditya, Delgado Cornejo, Daniel O., Cho, Tae H., Sun, Kai, Alvarado, Eugenio, Arthur, Timothy S., Roberts, Charles A., Hahn, Christopher, McCrory, Charles C. L., Dasgupta, Neil P.

“…Electrochemical reduction of CO2 using Cu catalysts enables the synthesis of C2+ products including C2H4 and C2H5OH. In this study, Cu catalysts were…”
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Atomic Layer Deposition of Cu Electrocatalysts on Gas Diffusion Electrodes for CO 2 Reduction by Lenef, Julia D, Lee, Si Young, Fuelling, Kalyn M, Rivera Cruz, Kevin E, Prajapati, Aditya, Delgado Cornejo, Daniel O, Cho, Tae H, Sun, Kai, Alvarado, Eugenio, Arthur, Timothy S, Roberts, Charles A, Hahn, Christopher, McCrory, Charles C L, Dasgupta, Neil P

“…Electrochemical reduction of CO using Cu catalysts enables the synthesis of C products including C H and C H OH. In this study, Cu catalysts were fabricated…”
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Tunable Growth of Layered Double Hydroxide Nanosheets through Hydrothermal Conversion of Atomic Layer Deposition Seed Layers by Ortiz-Ortiz, Alondra M., Delgado Cornejo, Daniel O., Fuelling, Kalyn M., Bielinski, Ashley R., Ma, Tao, Dasgupta, Neil P.

“…To enable the design and manufacturing of hierarchical nanomaterial architectures, there is a need for synthesis and processing methods that can enable tunable…”
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Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange by Lenef, Julia D., Gayle, Andrew J., Jo, Jaesung, Fuelling, Kalyn M., Yadavalli, Srinivas K., Ortiz-Ortiz, Alondra M., Sun, Kai, Peterson, Rebecca L., Dasgupta, Neil P.

“…Metal sulfide and oxysulfide thin films deposited by atomic layer deposition (ALD) are important functional materials for a range of applications including…”
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