Search Results - "Forsberg, Urban"
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Impact of residual carbon on two-dimensional electron gas properties in AlxGa1−xN/GaN heterostructure
Published in Applied physics letters (13-05-2013)“…High tuneability of residual carbon doping is developed in a hot-wall metalorganic chemical vapor deposition reactor. Two orders of temperature-tuned carbon…”
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2
Morphology Control of Hot-Wall MOCVD Selective Area Grown Hexagonal GaN Pyramids
Published in Crystal growth & design (07-11-2012)“…Morphological variations of gallium polar (0001)-oriented hexagonal GaN pyramids grown by hot-wall metal organic chemical vapor deposition under various growth…”
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3
Performance Enhancement of Microwave GaN HEMTs Without an AlN-Exclusion Layer Using an Optimized AlGaN/GaN Interface Growth Process
Published in IEEE transactions on electron devices (01-01-2016)“…The impact of the sharpness of the AlGaN/GaN interface in high-electron mobility transistors (HEMTs) is investigated. Two structures, one with an optimized…”
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4
Improved hot-wall MOCVD growth of highly uniform AlGaN/GaN/HEMT structures
Published in Journal of crystal growth (01-05-2009)“…The inherent advantages of the hot-wall metal organic chemical vapor deposition (MOCVD) reactor (low temperature gradients, less bowing of the wafer during…”
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5
Controlled CVD Growth of Highly ⟨111⟩-Oriented 3C-SiC
Published in Journal of physical chemistry. C (16-06-2022)“…Highly ⟨111⟩-oriented 3C-SiC coatings with a distinct surface morphology consisting of hexagonally shaped pyramidal crystals were prepared by chemical vapor…”
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6
Conformal and superconformal chemical vapor deposition of silicon carbide coatings
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-09-2022)“…The approaches to conformal and superconformal deposition developed by Abelson and Girolami for a low-temperature, low-pressure chemical vapor deposition (CVD)…”
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7
Growth of silicon carbide multilayers with varying preferred growth orientation
Published in Surface & coatings technology (15-10-2022)“…SiC multilayer coatings were deposited via thermal chemical vapor deposition (CVD) using silicon tetrachloride (SiCl 4 ) and various hydrocarbons under…”
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8
Optical properties of AlGaN/GaN epitaxial layers grown on different face GaN substrates
Published in Materials letters (15-03-2020)“…•The AlGaN/GaN epilayers were grown on both Ga-face and N-face GaN substrates.•TRPL technique was used to compare the optical properties of the samples.•A…”
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9
Superconformal silicon carbide coatings via precursor pulsed chemical vapor deposition
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-05-2023)“…In this work, silicon carbide (SiC) coatings were successfully grown by pulsed chemical vapor deposition (CVD). The precursors silicon tetrachloride (SiCl4)…”
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10
Dispersive Effects in Microwave AlGaN/AlN/GaN HEMTs With Carbon-Doped Buffer
Published in IEEE transactions on electron devices (01-07-2015)“…Aluminium gallium nitride (AlGaN)/GaN high-electron mobility transistor performance is to a large extent affected by the buffer design, which, in this paper,…”
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11
Stoichiometric, epitaxial ZrB2 thin films with low oxygen-content deposited by magnetron sputtering from a compound target: Effects of deposition temperature and sputtering power
Published in Journal of crystal growth (15-11-2015)“…Zirconium diboride (ZrB2) thin films have been deposited on 4H-SiC(0001) substrates by direct current magnetron sputtering from a compound target. The effect…”
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12
Room-temperature mobility above 2200 cm{sup 2}/V·s of two-dimensional electron gas in a sharp-interface AlGaN/GaN heterostructure
Published in Applied physics letters (22-06-2015)“…A high mobility of 2250 cm{sup 2}/V·s of a two-dimensional electron gas (2DEG) in a metalorganic chemical vapor deposition-grown AlGaN/GaN heterostructure was…”
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13
Impact of residual carbon on two-dimensional electron gas properties in Al x Ga 1−x N/GaN heterostructure
Published in Applied physics letters (2013)“…High tuneability of residual carbon doping is developed in a hot-wall metalorganic chemical vapor deposition reactor. Two orders of temperature-tuned carbon…”
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14
ZrB2 thin films deposited on GaN(0001) by magnetron sputtering from a ZrB2 target
Published in Journal of crystal growth (01-11-2016)“…ZrB2 films were deposited on 900°C-preheated or non-preheated GaN(0001) surfaces by direct current magnetron sputtering from a compound target. Analytical…”
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15
Direct current magnetron sputtered ZrB2 thin films on 4H-SiC(0001) and Si(100)
Published in Thin solid films (01-01-2014)“…ZrB2 thin films have been synthesized using direct current magnetron sputtering from a ZrB2 compound target onto 4H-SiC(0001) and Si(100) substrates kept at…”
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16
Carbon doped GaN buffer layer using propane for high electron mobility transistor applications: Growth and device results
Published in Applied physics letters (28-12-2015)“…The creation of a semi insulating (SI) buffer layer in AlGaN/GaN High Electron Mobility Transistor (HEMT) devices is crucial for preventing a current path…”
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17
Magnetron sputtering of epitaxial ZrB2 thin films on 4H-SiC(0001) and Si(111)
Published in Physica status solidi. A, Applications and materials science (01-03-2014)“…Epitaxial ZrB2 thin films were deposited at a temperature of 900 °C on 4H‐SiC(0001) and Si(111) substrates by magnetron sputtering from a ZrB2 source at a high…”
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18
Low thermal resistance of a GaN-on-SiC transistor structure with improved structural properties at the interface
Published in Journal of crystal growth (2015)“…The crystalline quality of AlGaN/GaN heterostructures was improved by optimization of surface pretreatment of the SiC substrate in a hot-wall metal-organic…”
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19
ZrB 2 thin films deposited on GaN(0001) by magnetron sputtering from a ZrB 2 target
Published in Journal of crystal growth (2016)“…ZrB 2 films were deposited on 900 °C-preheated or non-preheated GaN(0001) surfaces by direct current magnetron sputtering from a compound target. Analytical…”
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20
Properties of GaN layers grown on N-face free-standing GaN substrates
Published in Journal of crystal growth (01-03-2015)“…GaN layers were homoepitaxially grown on N-face free-standing GaN substrates using a hot-wall metalorganic chemical vapor deposition method. By using optimized…”
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