Search Results - "Farrow, R.C"

A high performance VME-based detector system for subsecond energy dispersive EXAFS by Salvini, G., Bogg, D., Dent, A.J., Derbyshire, G.E., Farrow, R.C., Felton, A., Ramsdale, C.

“…New detector instrumentation developed at Daresbury Laboratory enables high quality Energy Dispersive EXAFS (EDE) data to be collected in timescales of less…”
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First experimental data from XH, a fine pitch germanium microstrip detector for energy dispersive EXAFS (EDE) by Headspith, J., Groves, J., Luke, P.N., Kogimtzis, M., Salvini, G., Thomas, S.L., Farrow, R.C., Evans, J., Rayment, T., Lee, J.S., Goward, W.D., Amman, M., Mathon, O., Diaz-Moreno, S.

“…Extended X-ray absorption fine structure (EXAFS) is an experimental technique to determine the chemical structure of a sample by analysing modulations within…”
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A gas microstrip wide angle X-ray detector for application in synchrotron radiation experiments by Bateman, J.E, Connolly, J.F, Derbyshire, G.E, Duxbury, D.M, Lipp, J, Mir, J.A, Simmons, J.E, Spill, E.J, Stephenson, R, Dobson, B.R, Farrow, R.C, Helsby, W.I, Mutikainen, R, Suni, I

“…The Gas Microstrip Detector has counting rate capabilities several orders of magnitude higher than conventional wire proportional counters while providing the…”
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Characterisation of Reticon and Hamamatsu Photodiode array and the subsequent development of high performance VME-based detector systems optimised for Energy Dispersive EXAFS by Bogg, D, Dent, A.J, Derbyshire, G.E, Farrow, R.C, Ramsdale, C.A, Salvini, G

“…Energy Dispersive EXAFS is an established and successful technique employed at Daresbury Laboratory for the study of dynamic experiments. At the heart of this…”
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Global space charge effect in SCALPEL by Mkrtchyan, M., Munro, E., Liddle, J.A., Stanton, S.T., Waskiewicz, W.K., Farrow, R.C., Katsap, V.

“…The global space charge (SC) effect in SCALPEL electron beam lithography system is investigated. First order properties of the SC lensing action (defocus and…”
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Marks for SCALPEL ® tool optics optimization by Farrow, R.C., Gallatin, G.M., Waskiewicz, W.K., Liddle, J.A., Kizilyalli, I., Kornblit, A., Biddick, C., Blakey, M., Klemens, F., Felker, J., Kraus, J., Mkrtchyan, M., Orphanos, P.A., Layadi, N., Merchant, S.

“…A method for optimizing the electron optics of the SCALPEL exposure tool is described. The method uses the SCALPEL mark detection method with a grating mark as…”
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CMOS compatible alignment marks for the SCALPEL proof of lithography tool by Farrow, R.C., Waskiewicz, W.K., Kizilyalli, I., Ocola, L., Felker, J., Biddick, C., Gallatin, G., Mkrtchyan, M., Blakey, M., Kraus, J., Novembre, A., Orphanos, P., Peabody, M., Kasica, R., Kornblit, A., Klemens, F.

“…SCALPEL alignment marks have been fabricated in a SiO 2/WSi 2 structure using SCALPEL lithography and plasma processing. The positions of the marks were…”
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Pattern processing results and characteristics for SCALPEL masks by Novembre, A.E., Blakey, M.I., Farrow, R.C., Kasica, R.J., Knurek, C.S., Liddle, J.A., Peabody, M.L.

“…SCALPEL ( SCattering with Angular Limitation in Projection Electron Beam Lithography) masks consisting of a 150 nm thick SiN x membrane layer and 25–27.5 nm…”
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Optimization of a SCALPEL ® exposure tool using a diffractive image quality technique by Eichner, L., Blakey, M.I., Farrow, R.C., Liddle, J.A., Orphanos, P.A., Waskiewicz, W.K.

“…Determining and maintaining the best exposure parameters, such as dose, focus, or illumination uniformity, is a primary concern in operating a modern day…”
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The SCALPEL proof of concept system by Harriott, L.R., Berger, S.D., Biddick, C., Blakey, M.I., Bowler, S.W., Brady, K., Camarda, R.M., Connelly, W.F., Crorken, A., Custy, J., DeMarco, R., Farrow, R.C., Felker, J.A., Fetter, L., Freeman, R., Hopkins, L., Huggins, H.A., Knurek, C.S., Kraus, J.S., Liddle, J.A., Mkrtychan, M., Novembre, A.E., Peabody, M.L., Tarascon, R.G., Wade, H.H., Waskiewicz, W.K., Watson, G.P., Werder, K.S., Windt, D.

“…We have designed and constructed a projection electron beam lithography system based on the SCALPEL (SCattering with Angular Limitation in Projection Electron…”
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High Temperature Vibrating Reed Measurements on Vibralloy (Fe.49Ni.415Mo.095) by Farrow, R.C., Testardi, L.R.

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Scanning electron microscope identification of weak links in superconducting thin films by MONROE, D, BROCKLESBY, W. S, FARROW, R. C, HONG, M, LIOU, S. H

“…We have used a pulsed electron beam in a scanning electron microscope to produce highly localized (∼1 μm) changes in the electrical properties of a…”
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Large Elastic Softening in the Semimetal TiSe2 by Barmatz, M., Farrow, R.C., Disalvo, F.J.

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4GLS: a new type of fourth generation light source facility by Poole, M.W., Bennett, S.L., Bowler, M.A., Bliss, N., Clarke, J.A., Dykes, D.M., Farrow, R.C., Gerth, C., Holder, D.J., MacDonald, M.A., Muratori, B., Owen, H.L., Quinn, F.M., Seddon, E.A., Smith, S.L., Suller, V.P., Thompson, N.R., Ross, I.N., McNeil, B.

“…Consideration is now being given in the UK to the provision of an advanced facility at lower energy to complement the DIAMOND x-ray light source. The proposed…”
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