Search Results - "Falta, J"

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  1. 1

    Growth and Morphology of Ceria on Ruthenium (0001) by Kaemena, B, Senanayake, S. D, Meyer, A, Sadowski, J. T, Falta, J, Flege, J. I

    Published in Journal of physical chemistry. C (10-01-2013)
    “…Cerium oxide plays an important role in catalysis due to its prominent ability to store, transport, and release oxygen. Inverse model catalysts have attracted…”
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    Journal Article
  2. 2

    Growth mode and oxidation state analysis of individual cerium oxide islands on Ru(0001) by Flege, J.I., Kaemena, B., Senanayake, S.D., Höcker, J., Sadowski, J.T., Falta, J.

    Published in Ultramicroscopy (01-07-2013)
    “…The growth of cerium oxide on Ru(0001) by reactive molecular beam epitaxy has been investigated using low-energy electron microscopy (LEEM) and diffraction as…”
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    Journal Article
  3. 3

    Nanoscale analysis of the oxidation state and surface termination of praseodymium oxide ultrathin films on ruthenium(0001) by Flege, J.I., Krisponeit, J.-O., Höcker, J., Hoppe, M., Niu, Y., Zakharov, A., Schaefer, A., Falta, J., Krasovskii, E.E.

    Published in Ultramicroscopy (01-12-2017)
    “…•The local structure and chemistry of praseodymium oxide ultrathin films grown epitaxially on ruthenium(0001) are analyzed by intensity-voltage low-energy…”
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    Journal Article
  4. 4

    Ultra-thin high-quality silicon nitride films on Si(111) by Falta, J, Schmidt, Th, Gangopadhyay, S, Clausen, T, Brunke, O, Flege, J. I, Heun, S, Bernstorff, S, Gregoratti, L, Kiskinova, M

    Published in Europhysics letters (01-04-2011)
    “…Ultra-thin silicon nitride films grown by exposure of Si(111) substrates to a flux of atomic nitrogen at temperatures between 700 °C and 1050 °C have been…”
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    Journal Article
  5. 5

    Alignment of Ge nanoislands on Si(111) by Ga-induced substrate self-patterning by Schmidt, Th, Flege, J I, Gangopadhyay, S, Clausen, T, Locatelli, A, Heun, S, Falta, J

    Published in Physical review letters (09-02-2007)
    “…A novel mechanism is described which enables the selective formation of three-dimensional Ge islands. Submonolayer adsorption of Ga on Si(111) at high…”
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    Journal Article
  6. 6

    Complementary information on CdSe/ZnSe quantum dot local structure from extended X-ray absorption fine structure and diffraction anomalous fine structure measurements by Piskorska-Hommel, E., Holý, V., Caha, O., Wolska, A., Gust, A., Kruse, C., Kröncke, H., Falta, J., Hommel, D.

    Published in Journal of alloys and compounds (15-05-2012)
    “…The extended X-ray absorption fine structure (EXAFS) and diffraction anomalous fine structure (DAFS) have been applied to investigate a local structure for the…”
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    Journal Article
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  8. 8

    Surfactant-mediated epitaxy of Ge on Si(111): Beyond the surface by Schmidt, Th, Kröger, R., Clausen, T., Falta, J., Janzen, A., Kammler, M., Kury, P., Zahl, P., Horn-von Hoegen, M.

    Published in Applied physics letters (14-03-2005)
    “…For a characterization of interface and "bulk" properties of Ge films grown on Si(111) by Sb surfactant-mediated epitaxy, grazing incidence x-ray diffraction…”
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    Journal Article
  9. 9

    Cleaning and growth morphology of GaN and InGaN surfaces by Falta, J., Schmidt, Th, Gangopadhyay, S., Schulz, Chr, Kuhr, S., Berner, N., Flege, J. I., Pretorius, A., Rosenauer, A., Sebald, K., Lohmeyer, H., Gutowski, J., Figge, S., Yamaguchi, T., Hommel, D.

    Published in Physica Status Solidi (b) (01-08-2011)
    “…The structure and chemistry of clean GaN surfaces and InGaN thin films and nanostructures grown by metal organic vapour pressure epitaxy (MOVPE) has been…”
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    Journal Article
  10. 10

    Growth of praseodymium oxide on Si(111) under oxygen-deficient conditions by Schaefer, A., Zielasek, V., Schmidt, Th, Sandell, A., Schowalter, M., Seifarth, O., Walle, L. E., Schulz, Ch, Wollschläger, J., Schroeder, T., Rosenauer, A., Falta, J., Bäumer, M.

    “…Surface science studies of thin praseodymium oxide films grown on silicon substrates are of high interest in view of applications in such different fields as…”
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    Journal Article
  11. 11

    Mg and Si dopant incorporation and segregation in GaN by Schmidt, Th, Siebert, M., Flege, J. I., Figge, S., Gangopadhyay, S., Pretorius, A., Lee, T.-L., Zegenhagen, J., Gregoratti, L., Barinov, A., Rosenauer, A., Hommel, D., Falta, J.

    Published in Physica Status Solidi (b) (01-08-2011)
    “…The surface segregation of Mg and Si dopant species and their atomic incorporation sites in GaN films grown by metal‐organic vapour phase epitaxy (MOVPE) on…”
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    Journal Article
  12. 12

    Ordering of copper phthalocyanine films on functionalized Si(111) by Schmidt, Th, Wilkens, T., Falta, J.

    Published in Surface science (01-11-2022)
    “…•Well-ordered CuPc films can be grown on Ag passivated Si(111) surfaces.•Smooth morphology is achieved already for room temperature deposition.•High-resolution…”
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    Journal Article
  13. 13

    Silver: a novel growth catalyst for Ge nanoislands on Si(113) by Speckmann, M., Schmidt, Th, Locatelli, A., Menteş, T. O., Niño, M. Á., Falta, J.

    “…The impact of silver pre‐adsorption on germanium growth on Si(113) was investigated using in‐situ low‐energy electron microscopy (LEEM) as well as low‐energy…”
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    Journal Article
  14. 14

    Less strain energy despite fewer misfit dislocations: the impact of ordering by Schmidt, Th, Kröger, R, Flege, J I, Clausen, T, Falta, J, Janzen, A, Zahl, P, Kury, P, Kammler, M, Horn-von Hoegen, M

    Published in Physical review letters (17-02-2006)
    “…The average strain state of Ge films grown on Si(111) by surfactant mediated epitaxy has been compared to the ordering of the interfacial misfit dislocation…”
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    Journal Article
  15. 15

    From nanoislands to nanowires: Growth of germanium on gallium-terminated silicon surfaces by Schmidt, Th, Flege, J. I., Speckmann, M., Clausen, T., Gangopadhyay, S., Locatelli, A., Mentes, T. O., Heun, S., Guo, F. Z., Sutter, P., Falta, J.

    “…The influence of Ga pre‐adsorption on Si(111), Si(113) and Si(112) surfaces on Ge growth has been investigated by low‐energy electron diffraction and…”
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    Journal Article Conference Proceeding
  16. 16

    Local structure of uncapped and capped InGaN/GaN quantum dots by Piskorska-Hommel, E., Schmidt, Th, Siebert, M., Yamaguchi, T., Hommel, D., Falta, J., Cross, J. O.

    Published in Journal of synchrotron radiation (01-07-2009)
    “…The local structure around the indium atoms in uncapped and capped InxGa1−xN quantum dots has been studied by In K‐edge extended X‐ray absorption fine…”
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    Journal Article
  17. 17

    Ordering and shape of self-assembled InAs quantum dots on GaAs(001) by Zhang, K., Heyn, Ch, Hansen, W., Schmidt, Th, Falta, J.

    Published in Applied physics letters (17-04-2000)
    “…Quantitative grazing-incidence small-angle x-ray scattering experiments have been performed on self-assembled InAs quantum dots (QDs) grown by molecular-beam…”
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    Journal Article
  18. 18

    Bi: Perfect surfactant for Ge growth on Si(111)? by Schmidt, T., Falta, J., Materlik, G., Zeysing, J., Falkenberg, G., Johnson, R. L.

    Published in Applied physics letters (08-03-1999)
    “…We have investigated the growth of Ge on Bi-terminated Bi:Si(111)-∛×∛. In-situ measurements of x-ray standing waves, crystal truncation rods and scanning…”
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    Journal Article
  19. 19

    Strain as driving force for interface roughening of δ-doping layers by Falta, J.

    Published in Applied surface science (01-06-1998)
    “…The growth of smooth and abrupt heteroepitaxial semiconductor interfaces is limited by strain originating from the lattice mismatch of the different materials…”
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    Journal Article
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