Detection methods of intense areas and identification of the reasons of HEMT transistors failure
The article presents the options combination of etching and atomic force microscopy for research work and the failed high electron mobility transistors, as well as in the conduct of the capacitance-voltage profiling.
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Published in: | 2017 11th International Workshop on the Electromagnetic Compatibility of Integrated Circuits (EMCCompo) pp. 112 - 114 |
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Main Authors: | , , , , , |
Format: | Conference Proceeding |
Language: | English |
Published: |
IEEE
01-07-2017
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Subjects: | |
Online Access: | Get full text |
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Summary: | The article presents the options combination of etching and atomic force microscopy for research work and the failed high electron mobility transistors, as well as in the conduct of the capacitance-voltage profiling. |
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DOI: | 10.1109/EMCCompo.2017.7998093 |