Search Results - "Em. Vamvakas, V."

FTIR characterization of light emitting Si-rich nitride films prepared by low pressure chemical vapor deposition by Vamvakas, V. Em, Gardelis, S.

“…We report on the infrared transmission and light emission of Si-rich nitride (SRN) films prepared by low pressure chemical vapor deposition (LPCVD) from…”
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Optical and structural properties of copper oxide thin films grown by oxidation of metal layers by Papadimitropoulos, G., Vourdas, N., Vamvakas, V. Em, Davazoglou, D.

“…Copper oxide films were grown by oxidation of vacuum evaporated copper layers on silicon substrates. Oxidations were performed at atmospheric pressure, in a…”
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Thermally activated conduction mechanisms in Silicon Nitride MIS structures by Kanapitsas, A., Tsonos, C., Triantis, D., Stavrakas, I., Anastasiadis, C., Photopoulos, P., Pissis, P., Em. Vamvakas, V.

“…This publication reports on thermally activated currents in n-silicon/Si 3N 4/Al structures. The samples prepared were examined by means of I–V, C–V, ac…”
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Efficient infrared emission from periodically patterned thin metal films on a Si photonic crystal by Theodoni, P., Bayiati, P., Chatzichristidi, M., Speliotis, Th, Vamvakas, V. Em, Raptis, I., Papanikolaou, N.

“…We have fabricated a periodic array of holes with diameters of a few microns on thin metal films on a Si substrate by using lithographic techniques, and…”
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Efficient infrared emission from patterned thin metal films on a Si photonic crystal by Theodoni, P., Vamvakas, V. Em, Speliotis, Th, Chatzichristidi, M., Bayiati, P., Raptis, I., Papanikolaou, N.

“…We study the infrared optical response of periodically patterned thin metal films on a Si photonic crystal using Fourier‐transform infrared spectroscopy and…”
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High-density plasma silicon oxide thin films grown at room-temperature by Vlachopoulou, M.E., Dimitrakis, P., Tserepi, A., Vamvakas, V.Em, Koliopoulou, S., Normand, P., Gogolides, E., Tsoukalas, D.

“…The fabrication at room-temperature of thin (<8nm) silicon oxide films has been achieved, in a high-density helicon plasma source reactor using Ar/O2 mixture,…”
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Oxide-nitride-oxide memory stacks formed by low-energy Si ion implantation into nitride and wet oxidation by Ioannou-Sougleridis, V., Dimitrakis, P., Vamvakas, V.Em, Normand, P., Bonafos, C., Schamm, S., Cherkashin, N., Ben Assayag, G., Perego, M., Fanciulli, M.

“…This work presents an alternative method for the formation of the top oxide in oxide-nitride-oxide structures. The method utilizes low-energy (1 keV) Si ion…”
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Probing the electrical properties of the Si nitride/Si interface by Tsonos, C, Kanapitsas, A, Karagounis, A, Stavrakas, I, Triantis, D, Anastasiadis, C, Photopoulos, P, Vamvakas, V Em, Pissis, P

“…The present publication employs Dielectric Relaxation Spectroscopy for the examination of the relaxation mechanisms in silicon nitride MIS structures. These…”
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Optical characterization of Si-rich silicon nitride films prepared by low pressure chemical vapor deposition by Vamvakas, V.Em, Vourdas, N., Gardelis, S.

“…An investigation of the optical properties of Si-rich silicon nitride films prepared by low pressure chemical vapor deposition (LPCVD) from dichlorosilane (SiH…”
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Wet oxidation of nitride layer implanted with low-energy Si ionsfor improved oxide-nitride-oxide memory stacks by Ioannou-Sougleridis, V., Dimitrakis, P., Vamvakas, V. Em, Normand, P., Bonafos, C., Schamm, S., Cherkashin, N., Ben Assayag, G., Perego, M., Fanciulli, M.

“…An alternative method for the formation of the top oxide in oxide-nitride-oxide dielectric stacks is proposed. This method combines low-energy ( 1 keV )…”
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Wet oxidation of nitride layer implanted with low-energy Si ions for improved oxide-nitride-oxide memory stacks by Ioannou-Sougleridis, V., Dimitrakis, P., Vamvakas, V. Em, Normand, P., Bonafos, C., Schamm, S., Cherkashin, N., Ben Assayag, G., Perego, M., Fanciulli, M.

“…An alternative method for the formation of the top oxide in oxide-nitride-oxide dielectric stacks is proposed. This method combines low-energy (1keV) silicon…”
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Influence of the annealing temperature on the IR properties of SiO2 films grown from SiH4 + O2 by VAMVAKAS, V. Em, DAVAZOGLOU, D

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Correlation between infrared transmission spectra and the interface trap density of SiO2 films by VAMVAKAS, V. Em, THEODOROPOULOU, M, GEORGA, S. N, KRONTIRAS, C. A, PISANIAS, M. N

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Efficient infrared emission from applications and patterned thin metal films on a Si photonic crystal by THEODONI, P, VAMVAKAS, V. Em, SPELIOTIS, Th, CHATZICHRISTIDI, M, BAYIATI, P, RAPTIS, I, PAPANIKOLAOU, N

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Low pressure chemical vapor deposition from TEOS-NH sub(3) mixtures: Thermochemical study of the process considering kinetic data by Vahlas, C, Vamvakas, V Em, Davazoglou, D

“…A calculational thermodynamic investigation of the chemical vapor deposition (CVD) of SiO sub(2) films from TEOS/NH sub(3) mixtures has been performed, by…”
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Thermodynamic study and characterization of low pressure chemically vapor deposited silicon oxynitride films from tetraethylorthosilicate, dichlorosilane and ammonia gas mixtures by Vamvakas, V.Em, Davazoglou, D., Berjoan, R., Schamm, S., Vahlas, C.

“…This work describes the thermodynamic simulation and the experimental investigation of the chemical vapor deposition of silicon oxide and silicon oxynitride…”
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Thermodynamic study, compositional and electrical characterization of LPCVD SiO2 films grown from TEOS/N2O mixtures by VAMVAKAS, V. E, DAVAZOGLOU, D, VAHLAS, C

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Low pressure chemical vapor deposition from TEOS-NH3 mixtures : thermochemical study of the process considering kinetic data by VAHLAS, C, VAMVAKAS, V. E, DAVAZOGLOU, D

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