Search Results - "Elminyawi, I."

The Cramer–Rao accuracy bound for optimum processing of the edge registration mark signal in electron beam lithography by McDonald, J., Elminyawi, I., Yemc, D., Haslam, M.

“…Experimental data from the IBM direct‐write electron beam lithography machine EL‐3 are used to evaluate a lower bound on the estimation error resulting from…”
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Alpha particle photoeffect by Elminyawi, I., Levinger, J. S.

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The flip‐and‐shift signal enhancement application for a predictive electron‐beam pattern registration model by King, D. C., Steckl, A. J., Morgenstern, J. L., McDonald, J. F., Bourgeois, M. A., Yemc, D. J., Elminyawi, I.

“…A simple physical model based on an absorption‐like mechanism has been developed for the backscattering of electrons from registration marks used in e‐beam…”
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