Search Results - "Elliott, Simon"
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Atomistic kinetic Monte Carlo study of atomic layer deposition derived from density functional theory
Published in Journal of computational chemistry (30-01-2014)“…To describe the atomic layer deposition (ALD) reactions of HfO2 from Hf(N(CH3)2)4 and H2O, a three‐dimensional on‐lattice kinetic Monte‐Carlo model is…”
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Modeling the Chemical Mechanism of the Thermal Atomic Layer Etch of Aluminum Oxide: A Density Functional Theory Study of Reactions during HF Exposure
Published in Chemistry of materials (11-09-2018)“…Thermal atomic layer etch, the reverse of atomic layer deposition, uses a cyclic sequence of plasma-free and solvent-free gas surface reactions to remove…”
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Self-Limiting Temperature Window for Thermal Atomic Layer Etching of HfO2 and ZrO2 Based on the Atomic-Scale Mechanism
Published in Chemistry of materials (28-04-2020)“…HfO2 and ZrO2 are two high-k materials that are important in the downscaling of semiconductor devices. Atomic-level control of material processing is required…”
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Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition
Published in Advanced materials (Weinheim) (01-07-2016)“…Recent progress in the simulation of the chemistry of atomic layer deposition (ALD) is presented for technologically important materials such as alumina,…”
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Mechanism, Products, and Growth Rate of Atomic Layer Deposition of Noble Metals
Published in Langmuir (15-06-2010)“…We present mechanisms for atomic layer deposition of Ru, Rh, Pd, Os, Ir, or Pt metal from homoleptic precursors and oxygen. The novel mechanistic feature is…”
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Kinetics and Coverage Dependent Reaction Mechanisms of the Copper Atomic Layer Deposition from Copper Dimethylamino-2-propoxide and Diethylzinc
Published in Chemistry of materials (13-09-2016)“…Atomic layer deposition (ALD) has been recognized as a promising method to deposit conformal and uniform thin film of copper for future electronic devices…”
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Suppressing the Thermal and Ultraviolet Sensitivity of Kevlar by Infiltration and Hybridization with ZnO
Published in Chemistry of materials (12-12-2017)“…Polyaramides, such as Kevlar, are of great technological importance for their extraordinary mechanical performance. As fibers, they are used in personal…”
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Kinetic Monte Carlo Study of the Atomic Layer Deposition of Zinc Oxide
Published in Journal of physical chemistry. C (29-11-2018)“…Atomic layer deposition (ALD) has emerged as an important technique for thin-film deposition in the last two decades. Zinc oxide thin films, usually grown via…”
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Multiple Proton Diffusion and Film Densification in Atomic Layer Deposition Modeled by Density Functional Theory
Published in Chemistry of materials (26-03-2013)“…To investigate the atomic layer deposition (ALD) reactions for growth of HfO2 from Hf(NMe2)4 (TDMAHf) and H2O, a density functional theory (DFT) slab model was…”
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First-Principles Modeling of the “Clean-Up” of Native Oxides during Atomic Layer Deposition onto III–V Substrates
Published in Journal of physical chemistry. C (12-01-2012)“…The use of III–V materials as the channel in future transistor devices is dependent on removing the deleterious native oxides from their surface before…”
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Understanding the Mechanism of SiC Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Developing Routes toward SiC Atomic Layer Deposition (ALD) with Density Functional Theory
Published in ACS applied materials & interfaces (02-05-2018)“…Understanding the mechanism of SiC chemical vapor deposition (CVD) is an important step in investigating the routes toward future atomic layer deposition (ALD)…”
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Prodrugs of New Psychoactive Substances (NPS): A New Challenge
Published in Journal of forensic sciences (01-05-2020)“…The concept of a substance acting as a prodrug for an intended drug is not new and has been known and utilized with particular benefits within medicine for…”
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A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved In Situ Mass Spectrometry
Published in Journal of physical chemistry. C (03-12-2020)“…A method to obtain full mass over charge (m/z), time-resolved quadruple mass spectrometry (QMS) spectra of an atomic layer deposition (ALD) cycle is proposed…”
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Precursor Adsorption on Copper Surfaces as the First Step during the Deposition of Copper: A Density Functional Study with van der Waals Correction
Published in Journal of physical chemistry. C (30-04-2015)“…Copper dimethylamino-2-propoxide [Cu(dmap)2] is used as a precursor for low-temperature atomic layer deposition (ALD) of copper thin films. Chemisorption of…”
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Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism
Published in Chemistry of materials (27-04-2021)“…Thermal atomic layer etching (ALEt) of amorphous Al2O3 was performed by alternate exposures of niobium pentafluoride (NbF5) and carbon tetrachloride (CCl4)…”
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A Series of Deaths Involving Carfentanil in the UK and Associated Post-mortem Blood Concentrations
Published in Journal of analytical toxicology (01-05-2018)“…The potent opioid and veterinary drug, carfentanil has recently entered the illicit drug market, especially in relation to heroin and cocaine. Recent…”
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Further evidence for GHB naturally occurring in common non-alcoholic beverages
Published in Forensic science international (01-08-2017)“…Highlights • GHB has been implicated in cases of suspected surreptitious administration. • GHB has been implicated in cases of drug-facilitated sexual assault…”
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Assessment of Caatinga response to drought using Meteosat-SEVIRI Normalized Difference Vegetation Index (2008–2016)
Published in ISPRS journal of photogrammetry and remote sensing (01-02-2019)“…•The linear dependence of NDVI on rainfall is phase lagged in the Caatinga vegetation.•The NDVI-rainfall relationship at interannual timescale represents…”
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Mechanism for the Atomic Layer Deposition of Copper Using Diethylzinc as the Reducing Agent: A Density Functional Theory Study Using Gas-Phase Molecules as a Model
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (06-09-2012)“…We present theoretical studies based on first-principles density functional theory calculations for the possible gas-phase mechanism of the atomic layer…”
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