Charge Loss Mechanisms in a Localized Trapping Based Nonvolatile Memory Device
In this work, quantification of the theories and models attributed to the NROM cell V t decay and the dominant charge loss mechanism dictating this phenomenon are discussed. The main objective is to determine whether the transport of the localized trapped charge is mainly lateral within the nitride...
Saved in:
Published in: | 2006 IEEE 24th Convention of Electrical & Electronics Engineers in Israel pp. 364 - 365 |
---|---|
Main Authors: | , , , , |
Format: | Conference Proceeding |
Language: | English |
Published: |
IEEE
01-11-2006
|
Subjects: | |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | In this work, quantification of the theories and models attributed to the NROM cell V t decay and the dominant charge loss mechanism dictating this phenomenon are discussed. The main objective is to determine whether the transport of the localized trapped charge is mainly lateral within the nitride layer or vertical back to the silicon substrate. Electrical characterizations and analytic modeling are employed for comparison of theories. |
---|---|
ISBN: | 9781424402298 1424402298 |
DOI: | 10.1109/EEEI.2006.321104 |