Search Results - "Donohue, Tom"
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X-ray lithography for ⩽ 100 nm ground rules in complex patterns
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-1997)“…Complex patterns with 75–125 nm feature sizes exposed with x-ray lithography are shown. Lithographic results for 75–125 nm lines with varying pitch are…”
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Conference Proceeding -
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Trade abroad, investment at home
Published in The Hill (Washington, D.C.) (20-01-2010)Get full text
Newspaper Article