Search Results - "Dingyou Zhang"
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1
Process Development and Optimization for 3 \mu \text High Aspect Ratio Via-Middle Through-Silicon Vias at Wafer Level
Published in IEEE transactions on semiconductor manufacturing (01-11-2015)“…This paper presents challenges encountered in the fabrication of high aspect ratio (AR) via middle, through-silicon vias (TSVs), of 3 μm top entrant critical…”
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Journal Article -
2
Process development and optimization for high-aspect ratio through-silicon via (TSV) etch
Published in 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01-05-2016)“…Etch is one of the most critical processes for high-aspect ratio TSV as it defines the profile and wafer level depth uniformity of TSV, thus having a great…”
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Conference Proceeding Journal Article -
3
A novel chip-to-wafer (C2W) three-dimensional (3D) integration approach using a template for precise alignment
Published in Microelectronic engineering (01-04-2012)“…This paper reports a novel chip-to-wafer (C2W) three-dimensional (3D) integration approach using a template for precise alignment. The key unit process steps,…”
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Journal Article Conference Proceeding -
4
Leaf Potential Productivity at Different Canopy Levels in Densely-planted and Intermediately-thinned Apple Orchards
Published in Horticultural plant journal (01-07-2016)“…Most apple orchards in the apple production districts in China were densely planted with vigorous rootstocks during the 1980s. These orchards have suffered…”
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Journal Article -
5
Methodology to estimate TSV film thickness using a novel inline "adaptive pattern registration" method
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01-05-2015)“…A novel "adaptive pattern registration" method is developed which gives a reliable estimate of various film thickness in a wafer level TSV. The film thickness…”
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Conference Proceeding -
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Evaluation of fabrication process for a novel Chip-to-Wafer (C2W) 3D integration approach using an alignment template
Published in 2012 SEMI Advanced Semiconductor Manufacturing Conference (01-05-2012)“…We proposed a novel Chip-to-Wafer (C2W) 3D integration approach using an alignment template and well-controlled wafer-level bonding. With an alignment template…”
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Conference Proceeding -
7
New interferometric measurement technique for small diameter TSV
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01-05-2014)“…High aspect ratio through silicon vias (TSV) present a challenge for measurement of bottom critical dimension (BCD) and depth. TSVs smaller than 5 micron…”
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Conference Proceeding -
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TSV residual Cu step height analysis by white light interferometry for 3D integration
Published in 2015 IEEE 65th Electronic Components and Technology Conference (ECTC) (01-05-2015)“…Cu pumping, or the extrusion of Cu out of a TSV after being subjected to high temperature conditions, is one of the highest risk failure modes to be overcome…”
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Conference Proceeding -
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Backside TSV protrusion induced by thermal shock and thermal cycling
Published in 2013 IEEE 63rd Electronic Components and Technology Conference (01-05-2013)“…This paper reports on thermal-mechanical failures of through-silicon-vias (TSVs), in particular, for the first time, the protrusions at the TSV backside, which…”
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Conference Proceeding -
10
Room temperature ALD oxide liner for TSV applications
Published in 2015 IEEE 65th Electronic Components and Technology Conference (ECTC) (01-05-2015)“…To date, Plasma Enhanced Chemical Vapor Deposition (PECVD) O3/TEOS has been the prevalent dielectric liner for TSV applications. This process typically results…”
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Conference Proceeding -
11
Crosstalk evaluation, suppression and modeling in 3D through-strata-via (TSV) network
Published in 2010 IEEE International 3D Systems Integration Conference (3DIC) (01-11-2010)“…Through-strata-via (TSV) is regarded as a critical component in 3D integration that extends Moore's Law. This paper reports on TSV crosstalk performance under…”
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Conference Proceeding -
12
Chip-to-wafer (C2W) 3D integration with well-controlled template alignment and wafer-level bonding
Published in 2011 IEEE 61st Electronic Components and Technology Conference (ECTC) (01-05-2011)“…This paper presents on a novel chip-to-wafer (C2W) three-dimensional (3D) integration technology with well-controlled template alignment and wafer-level…”
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Conference Proceeding -
13
Characterization and modeling of solder balls and through-strata-vias (TSVs) in 3D architecture
Published in 19th Topical Meeting on Electrical Performance of Electronic Packaging and Systems (01-10-2010)“…3D integration is expected to lead to a semiconductor industry paradigm shift due to its tremendous benefits to performance, data bandwidth, functionality,…”
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Conference Proceeding -
14
Processing material evaluation and ultra-wideband modeling of through-strata-via (TSV) in 3D integrated circuits and systems
Published in 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology (01-11-2010)“…Since the conventional planar ICs encountered many physical, technological and economic bottlenecks, 3D integration by stacking and connecting function blocks…”
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Conference Proceeding -
15
Process Development and Optimization for 3 [Formula Omitted] High Aspect Ratio Via-Middle Through-Silicon Vias at Wafer Level
Published in IEEE transactions on semiconductor manufacturing (01-11-2015)“…This paper presents challenges encountered in the fabrication of high aspect ratio (AR) via middle, through-silicon vias (TSVs), of 3 [Formula Omitted] top…”
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Journal Article -
16
Challenges to via middle TSV integration at sub-28nm nodes
Published in IEEE International Interconnect Technology Conference (01-05-2014)“…This work presents the via middle TSV integration at sub-28 nm nodes using a new local interconnect scheme involving V0 vias. Various V0 schemes are presented…”
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Conference Proceeding -
17
A Novel Chip-to-Wafer 3D Integration Technology
Published 01-01-2013“…Three-dimensional (3D) integration, which can stack different materials, technologies and functional components vertically, is a promising technology to…”
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Dissertation -
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A Novel Chip-to-Wafer 3D Integration Technology
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Dissertation -
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Study of Polyimide in Chip Package Interaction for Flip-Chip Cu-Pillar Packages
Published in 2018 IEEE 68th Electronic Components and Technology Conference (ECTC) (01-05-2018)“…Chip-package interaction (CPI) is a key area for achieving robust copper bump interconnection in flip-chip packages. Polyimide (PI) has been widely used in…”
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Conference Proceeding