Search Results - "Dighe, Prasanna"
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Study of relationship between 300 mm Si wafer surface and annealing temperatures for advanced semiconductor-based applications
Published in 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01-07-2010)“…Surface morphology dependence on annealing conditions is one of the most important parameters that is being monitored in current manufacturing environments…”
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Conference Proceeding -
2
Evaluation of Post Ion-Implantation Resist Strip with the Background Signal of a Light Scattering Tool
Published in Japanese Journal of Applied Physics (01-05-2010)“…A new method for the fast evaluation of photoresist residue removal efficiency is discussed in this paper. In this method "haze" which is the low frequency…”
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Journal Article -
3
Use of Surface Haze for Evaluation of Photoresist Residue Removal Efficiency
Published in IEEE transactions on semiconductor manufacturing (01-11-2009)“…A new method for the fast evaluation of photoresist residue removal efficiency is discussed in this paper. In this method ldquohazerdquo which is the…”
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Journal Article