Search Results - "Demidovich, S. A."

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    Mechanical Stress in SiNx Films Grown by High Density Plasma Enhanced Chemical Vapor Deposition by Koval’chuk, N. S., Demidovich, S. A., Vlasukova, L. A., Parkhomenko, I. N., Komarov, F. F.

    Published in Inorganic materials (01-09-2022)
    “…— SiN x films with low mechanical stress have been grown in an inductively coupled plasma (ICP) reactor using a SiH 4 + N 2 + Ar gas mixture. Nitrogen-enriched…”
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    Journal Article
  2. 2

    Deposition of SiNx Films with Controlled Residual Stress from SiH4-NH3-He Gaseous Mixture in Inductively Coupled Plasma by Koval’chuk, N. S., Demidovich, S. A., Vlasukova, L. A., Parkhomenko, I. N.

    “…We have studied residual mechanical stresses of SiN x films deposited on silicon substrates from a SiH 4 -NH 3 -He gaseous mixture in an inductively coupled…”
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    Journal Article