Search Results - "De Coster, Hanne"

Wet etching of TiN in 1-D and 2-D confined nano-spaces of FinFET transistors by Vereecke, Guy, De Coster, Hanne, Van Alphen, Senne, Carolan, Patrick, Bender, Hugo, Willems, Kherim, Ragnarsson, Lars-Åke, Van Dorpe, Pol, Horiguchi, Naoto, Holsteyns, Frank

“…In the manufacturing of multi-Vt FinFET transistors, the gate material deposited in the nano-spaces left by the removed dummy gate must be etched back in…”
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Using water structuring by ions to address pattern loading in wet HF-based oxide recess etch by Vereecke, Guy, De Coster, Hanne, Dochain, Denis, Nurekeyeva, Kunsulu, Conlan, Shona, Nsimba, Anthony, Wostyn, Kurt, Sanchez, Efrain Altamirano

“…In the FinFET fabrication flow, a gap fill oxide is used to fill the space between the Si fins that needs to be recessed to define the height of the fin…”
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