Search Results - "Dauchot, P. J."

Titanium oxide thin films deposited by high-power impulse magnetron sputtering by Konstantinidis, S., Dauchot, J.P., Hecq, M.

“…Ionized physical vapor deposition processes are of great interest for surface modification because the flexibility of the thin film deposition process can be…”
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Preparation and characterization of gasochromic thin films by Vitry, V., Renaux, F., Gouttebaron, R., Dauchot, J.-P., Hecq, M.

“…Gasochromic devices consisting of tungsten oxide, covered by a platinum catalyst thin film were produced by reactive DC magnetron sputtering. The influence of…”
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Growth of ultrathin Ti films deposited on SnO2 by magnetron sputtering by GODFROID, T, GOUTTEBARON, R, DAUCHOT, J. P, LECLERE, Ph, LAZZARONI, R, HECQ, M

“…Low-e multilayers, such as dielectric/Ag/dielectric/glass, are systems extensively used in the field of architectural glass for thermal insulation. However,…”
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Study of ZrN layers deposited by reactive magnetron sputtering by Del Re, M., Gouttebaron, R., Dauchot, J.-P., Leclère, P., Terwagne, G., Hecq, M.

“…Zirconium nitride films are deposited onto borosilicate wafers by reactive magnetron sputtering. The films are analysed in situ by X-ray photoelectron…”
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Transport of ionized metal atoms in high-power pulsed magnetron discharges assisted by inductively coupled plasma by Konstantinidis, S., Dauchot, J. P., Ganciu, M., Hecq, M.

“…Transporting metallic ions from the magnetron cathode to the substrate is essential for an efficient thin-film deposition process. This letter examines how…”
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Study of the moisture and thermal resistance of AlN/ZrN/AlN multilayers coating by Del Re, M., Dauchot, J.-P., Hecq, M.

“…The moisture and thermal resistances of AlN/ZrN/AlN multilayers deposited by magnetron sputtering onto borosilicate glass wafers were investigated. This kind…”
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Density and temperature in an inductively amplified magnetron discharge for titanium deposition by Ricard, A., Nouvellon, C., Konstantinidis, S., Dauchot, J. P., Wautelet, M., Hecq, M.

“…In order to determine the titanium neutral density, a direct current (dc) plasma discharge, amplified by a radio-frequency (rf) coil, was studied by absorption…”
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Increasing the deposition rate of oxide films by increasing the plasma reactivity by Snyders, R., Gouttebaron, R., Dauchot, J.P., Hecq, M.

“…One of the major problems of reactive sputtering is the dramatically deposition rate decrease when the target surface is poisoned. For decades, numerous papers…”
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RF amplified magnetron source for efficient titanium nitride deposition by Konstantinidis, S., Nouvellon, C., Dauchot, J.-P., Wautelet, M., Hecq, M.

“…Amplified magnetron sources are used to increase the ionization ratio of the sputtered metallic species in a way to avoid shadowing effect during thin film…”
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Characterization of an Ar/N2 reactive amplified magnetron discharges by Atomic Absorption Spectroscopy and Glow Discharge Mass Spectrometry by Konstantinidis, S., Ricard, A., Snyders, R., Vandeparre, H., Dauchot, J.P., Hecq, M.

“…The aim of this paper is the characterization of an inductively amplified magnetron discharge running in reactive mode (Ar/N2 gas mixture with titanium target)…”
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Experimental and theoretical studies of the DC reactive magnetron sputtering deposition of silver oxide thin films by Snyders, R., Wautelet, M., Gouttebaron, R., Dauchot, J.P., Hecq, M.

“…In this work we have investigated the AgO X films deposition by DC magnetron reactive sputtering. We have studied the discharge parameters evolution during the…”
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Chromium reactive sputtering in argon–oxygen and argon–water vapor mixtures by Nouvellon, C., Dauchot, J.P., Hecq, M., Cornil, H.

“…Reactive magnetron sputtering is widely used for various protective coatings deposition. In order to control the mechanisms occurring during the sputtering, we…”
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Effect of plasma temperature and plasma pulsation frequency on atomic nitrogen production by Godfroid, T., Dauchot, J.P., Hecq, M.

“…An electromagnetic surface wave launched by a waveguide (type surfaguide [M. Moisan, Z. Zakrzewski, J. Phys., D., Appl. Phys. 24 (1991) 1025]) powered by a…”
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Deposition of titanium oxide films by reactive High Power Impulse Magnetron Sputtering (HiPIMS): Influence of the peak current value on the transition from metallic to poisoned regimes by Nouvellon, C., Michiels, M., Dauchot, J.P., Archambeau, C., Laffineur, F., Silberberg, E., Delvaux, S., Cloots, R., Konstantinidis, S., Snyders, R.

“…In this study, reactive High Power Impulse Magnetron Sputtering (HiPIMS) experiments were carried out to synthesize titanium oxide films, using a 45×15cm²…”
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Experimental and theoretical study of the role of the gas composition and plasma-surface interactions on the SnOx films stoichiometry prepared by DC magnetron reactive sputtering by SNYDERS, R, WAUTELET, M, GOUTTEBARON, R, DAUCHOT, J. P, HECQ, M

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On the migration of defects and impurities in microelectromechanical systems subject to a large number of light pulses by WAUTELET, M, DAUCHOT, J. P, HECQ, M

“…The migration of defects in light-irradiated microelectromechanical systems (MEMS) is treated theoretically. The effects of temperature gradients on atomic…”
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Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target by Vancoppenolle, V., Jouan, P.-Y., Wautelet, M., Dauchot, J.-P., Hecq, M.

“…The properties of titanium oxide thin films deposited by direct current magnetron sputtering of a Ti target are strongly dependent on the sputtering…”
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Diagnostics by optical absorption of sputtered atom density in magnetron discharges by Dony, M. F., Dauchot, J. P., Wautelet, M., Hecq, M., Ricard, A.

“…Densities of sputtered atoms in Ar rf magnetron discharges have been measured by optical absorption. The resonant and self-absorption methods have been used…”
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Synthesis of stoichiometric zirconium nitride by d.c. reactive magnetron sputtering pulsed at low frequency: characterization by ESCA, SIMS and electron microprobe by Dauchot, J. P., Gouttebaron, R., Cornelissen, D., Wautelet, M., Hecq, M.

“…In order to raise the deposition rate of ZrN during its synthesis by d.c. reactive magnetron sputtering, we have applied a technique of pulsed discharge…”
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Optical diagnostics of d.c. and r.f. argon magnetron discharges by Dony, M.F., Ricard, A., Dauchot, J.P., Hecq, M., Wautelet, M.

“…The plasmas of d.c. and r.f. magnetron discharges have been analysed by emission spectroscopy for argon and metal atom radiative states and by optical…”
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