Search Results - "DURAND, William J"

Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains by Bates, Christopher M., Seshimo, Takehiro, Maher, Michael J., Durand, William J., Cushen, Julia D., Dean, Leon M., Blachut, Gregory, Ellison, Christopher J., Willson, C. Grant

“…Block copolymers (BCPs) must necessarily have high interaction parameters (χ), a fundamental measure of block incompatibility, to self-assemble into…”
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Structure effects on the energetics of the electrochemical reduction of CO2 by copper surfaces by DURAND, William J, PETERSON, Andrew A, STUDT, Felix, ABILD-PEDERSEN, Frank, NØRSKOV, Jens K

“…Polycrystalline copper electrocatalysts have been experimentally shown to be capable of reducing CO{sub 2} into CH{sub 4} and C{sub 2}H{sub 4} with relatively…”
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Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films by Maher, Michael J, Rettner, Charles T, Bates, Christopher M, Blachut, Gregory, Carlson, Matthew C, Durand, William J, Ellison, Christopher J, Sanders, Daniel P, Cheng, Joy Y, Willson, C. Grant

“…The directed self-assembly (DSA) of lamella-forming poly­(styrene-block-trimethylsilylstyrene) (PS–PTMSS, L 0 = 22 nm) was achieved using a combination of…”
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Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymers by Maher, Michael J, Mori, Kazunori, Sirard, Stephen M, Dinhobl, Andrew M, Bates, Christopher M, Gurer, Emir, Blachut, Gregory, Lane, Austin P, Durand, William J, Carlson, Matthew C, Strahan, Jeffrey R, Ellison, Christopher J, Willson, C. Grant

“…Tin-containing block copolymers were investigated as materials for nanolithographic applications. Poly­(4-trimethylstannylstyrene-block-styrene) (PSnS-PS) and…”
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Interfacial Design for Block Copolymer Thin Films by Maher, Michael J, Bates, Christopher M, Blachut, Gregory, Sirard, Stephen, Self, Jeffrey L, Carlson, Matthew C, Dean, Leon M, Cushen, Julia D, Durand, William J, Hayes, Colin O, Ellison, Christopher J, Willson, C. Grant

“…Top coat design, coating, and optimization methodologies are introduced that facilitate the synthesis, application, and identification of neutral top coats for…”
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Experimental and Modeling Study of Domain Orientation in Confined Block Copolymer Thin Films by Durand, William J, Carlson, Matthew C, Maher, Michael J, Blachut, Gregory, Santos, Logan J, Tein, Summer, Ganesan, Venkat, Ellison, Christopher J, Willson, C. Grant

“…Use of block copolymer thin films in lithographic applications requires orientation of domains perpendicular to a substrate. Algebraic models were used to…”
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A Hybrid Chemo-/Grapho-Epitaxial Alignment Strategy for Defect Reduction in Sub-10 nm Directed Self-Assembly of Silicon-Containing Block Copolymers by Blachut, Gregory, Sirard, Stephen M, Maher, Michael J, Asano, Yusuke, Someya, Yasunobu, Lane, Austin P, Durand, William J, Bates, Christopher M, Dinhobl, Andrew M, Gronheid, Roel, Hymes, Diane, Ellison, Christopher J, Willson, C. Grant

“…The directed self-assembly (DSA) of a 20 nm full-pitch silicon-containing block copolymer (BCP), poly­(4-methoxystyrene-b-4-trimethylsilylstyrene), was…”
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Design of high‐χ block copolymers for lithography by Durand, William J, Blachut, Gregory, Maher, Michael J, Sirard, Stephen, Tein, Summer, Carlson, Matthew C, Asano, Yusuke, Zhou, Sunshine X, Lane, Austin P, Bates, Christopher M, Ellison, Christopher J, Willson, C. Grant

“…This report describes the design and synthesis of a series of lamella‐forming, silicon‐containing block copolymers (Si‐BCPs) and evaluation of these materials…”
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Photopatternable Interfaces for Block Copolymer Lithography by Maher, Michael J, Bates, Christopher M, Blachut, Gregory, Carlson, Matthew C, Self, Jeffrey L, Janes, Dustin W, Durand, William J, Lane, Austin P, Ellison, Christopher J, Willson, C. Grant

“…Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films…”
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Structure effects on the energetics of the electrochemical reduction of CO2 by copper surfaces by Durand, William J., Peterson, Andrew A., Studt, Felix, Abild-Pedersen, Frank, Nørskov, Jens K.

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Structure effects on the energetics of the electrochemical reduction of CO sub(2 by copper surfaces) by Durand, William J, Peterson, Andrew A, Studt, Felix, Abild-Pedersen, Frank, Noerskov, Jens K

“…Polycrystalline copper electrocatalysts have been experimentally shown to be capable of reducing CO sub(2 into CH) sub(4) and C sub(2H) sub(4) with relatively…”
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Structure effects on the energetics of the electrochemical reduction of CO 2 by copper surfaces by Durand, William J., Peterson, Andrew A., Studt, Felix, Abild-Pedersen, Frank, Nørskov, Jens K.

“…Polycrystalline copper electrocatalysts have been experimentally shown to be capable of reducing CO 2 into CH 4 and C 2H 4 with relatively high selectivity,…”
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Design of high-[chi] block copolymers for lithography by Durand, William J, Blachut, Gregory, Maher, Michael J, Sirard, Stephen, Tein, Summer, Carlson, Matthew C, Asano, Yusuke, Zhou, Sunshine X, Lane, Austin P, Bates, Christopher M, Ellison, Christopher J, Willson, C Grant

“…This report describes the design and synthesis of a series of lamella-forming, silicon-containing block copolymers (Si-BCPs) and evaluation of these materials…”
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