Search Results - "DEPLA, D"

The measurement and impact of negative oxygen ions during reactive sputter deposition by Depla, D.

“…Many thin film applications are based on oxides. The optimization of the oxide properties is an on-going process and requires a deep understanding of the…”
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Sputter yield measurements to evaluate the target state during reactive magnetron sputtering by Schelfhout, R., Strijckmans, K., Depla, D.

“…The sputter yield and discharge voltage of fourteen target materials (Al, Cr, Cu, Mg, Mo, Nb, Pb, Ta, Ti, V, W, Y, Zn, and Zr) have been measured during…”
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High entropy alloy thin films deposited by magnetron sputtering of powder targets by Braeckman, B.R., Boydens, F., Hidalgo, H., Dutheil, P., Jullien, M., Thomann, A.-L., Depla, D.

“…High entropy alloys (HEA) contain at least five principal elements in equimolar or near-equimolar ratios. These materials crystallize typically as a…”
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On the amorphous nature of sputtered thin film alloys by Braeckman, B.R., Depla, D.

“…The power-law scaling behavior between the average interatomic distance and the atomic volume of sputter deposited Zr–Cu thin films has been compared with…”
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Magnetron sputter deposition: Linking discharge voltage with target properties by Depla, D., Mahieu, S., De Gryse, R.

“…The discharge voltage is perhaps the most accessible parameter of the magnetron sputter deposition process. As its value can be easily monitored, research…”
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Magnetron sputter deposition as visualized by Monte Carlo modeling by Depla, D., Leroy, W.P.

“…The Monte Carlo code SIMTRA, simulating the transport of atoms from the source to the substrate during physical vapor deposition (PVD), is used in several case…”
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Biaxial alignment in sputter deposited thin films by Mahieu, S., Ghekiere, P., Depla, D., De Gryse, R.

“…Biaxially aligned thin films have not only a preferential crystallographic out-of-plane orientation, but also have an alignment along a certain reference…”
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Influence of deposition conditions on the composition, texture and microstructure of RF-magnetron sputter-deposited hydroxyapatite thin films by Ivanova, A.A., Surmeneva, M.A., Surmenev, R.A., Depla, D.

“…In this study, nanostructured hydroxyapatite (HA) coatings were deposited at a constant power via radio frequency magnetron sputtering. Substrate rotation was…”
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Sputter deposition of porous thin films from metal/NaCl powder targets by Dedoncker, R., Rijckaert, H., Depla, D.

“…A method to deposit porous thin films is elucidated. For this purpose, NaCl powder was mixed with a metal powder, cold pressed, and used as a target material…”
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Modeling target erosion during reactive sputtering by Strijckmans, K., Depla, D.

“…•The erosion of a target is simulated with the RSD2013 software during reactive magnetron sputtering.•The influence of redeposition on the target state and on…”
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The influence of Ge and In addition on the phase formation of CoCrCuFeNi high-entropy alloy thin films by Braeckman, B.R., Misják, F., Radnóczi, G., Depla, D.

“…The influence of two solute elements (Ge and In) on the phase formation of CoCrCuFeNi thin films was studied. In both cases, a crystalline-to-amorphous phase…”
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Impurity dominated thin film growth by Cougnon, F. G., Dulmaa, A., Dedoncker, R., Galbadrakh, R., Depla, D.

“…Magnetron sputter deposition was applied to grow thin metal films in the presence of impurities. These impurities are ambient gas molecules and/or atoms from…”
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Quantitative correlation between intrinsic stress and microstructure of thin films by Depla, D., Braeckman, B.R.

“…A critical review of the available literature on thin film intrinsic stress has generated a database with 111 entries representing 19 different metals…”
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An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering by Schelfhout, R., Strijckmans, K., Depla, D.

“…The target surface stoichiometry after reactive DC magnetron sputtering has been studied by X-ray Photoelectron Spectroscopy (XPS). The target was transferred…”
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Reactive sputter deposition of CoCrCuFeNi in nitrogen/argon mixtures by Dedoncker, R., Djemia, Ph, Radnóczi, G., Tétard, F., Belliard, L., Abadias, G., Martin, N., Depla, D.

“…Thin films of (CoCrCuFeNi)Nx were deposited by direct current reactive magnetron sputtering. Two different targets were used. Thin films deposited from a solid…”
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The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering by Boydens, F., Leroy, W.P., Persoons, R., Depla, D.

“…The effect of the target surface morphology on the sputter deposition flux and the energy flux is investigated by comparing solid targets to pressed powder…”
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The existence of a double S-shaped process curve during reactive magnetron sputtering by Schelfhout, R., Strijckmans, K., Depla, D.

“…The four dimensional parameter space (discharge voltage and current and reactive gas flow and pressure) related to a reactive Ar/O2 DC magnetron discharge with…”
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Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures by Dedoncker, R., Radnóczi, G., Abadias, G., Depla, D.

“…Thin films of (CoCrCuFeNi)Ox were deposited by direct current magnetron sputtering in a mixed O2/Ar atmosphere. Stoichiometric films with a rock-salt (B1)…”
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On the target surface cleanness during magnetron sputtering by Schelfhout, R., Strijckmans, K., Boydens, F., Depla, D.

“…•The thickness of a chemisorbed oxide layer on a Ta sputtering target is investigated by a simple sputter cleaning experiment.•A clear logarithmic growth…”
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Mechanical properties of CoCrCuFeNi multi-principal element alloy thin films on Kapton substrates by Li, C.H., Dedoncker, R., Li, L.W., Sedghgooya, F., Zighem, F., Ji, V., Depla, D., Djemia, P., Faurie, D.

“…The mechanical properties of CoCrCuFeNi thin films deposited by magnetron sputtering on Kapton substrates are studied in this paper. Measurements by confocal…”
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