Search Results - "Cushen, Julia"
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Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains
Published in Science (American Association for the Advancement of Science) (09-11-2012)“…Block copolymers (BCPs) must necessarily have high interaction parameters (χ), a fundamental measure of block incompatibility, to self-assemble into…”
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Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications
Published in ACS nano (24-04-2012)“…Block copolymers demonstrate potential for use in next-generation lithography due to their ability to self-assemble into well-ordered periodic arrays on the…”
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Self-Assembly and Directed Assembly of Polymer Grafted Nanocrystals via Solvent Annealing
Published in Macromolecules (26-12-2017)“…Polymer grafted nanocrystals (PGNCs) incarnate a duality of powerful attributes: their inorganic crystal cores hold promise to design nanocrystal solids from…”
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Interfacial Design for Block Copolymer Thin Films
Published in Chemistry of materials (11-02-2014)“…Top coat design, coating, and optimization methodologies are introduced that facilitate the synthesis, application, and identification of neutral top coats for…”
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5
Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance
Published in IEEE transactions on magnetics (01-05-2015)“…Bit-patterned media (BPM) for magnetic recording provides a route to thermally stable data recording at >1 Tb/in 2 and circumvents many of the challenges…”
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Thin Film Self-Assembly of Poly(trimethylsilylstyrene‑b‑d,l‑lactide) with Sub-10 nm Domains
Published in Macromolecules (13-11-2012)“…Integrating block copolymer self-assembly with existing lithography processes to enhance their patterning capability is a promising approach for manufacturing…”
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Consequences of Surface Neutralization in Diblock Copolymer Thin Films
Published in ACS nano (26-11-2013)“…Two high-χ block copolymers, lamella-forming poly(styrene-block-[isoprene-random-epoxyisoprene]) (PS-PEI78, with 78 mol % epoxidation) and lamella-forming…”
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Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS‑b‑PMOST
Published in ACS applied materials & interfaces (24-06-2015)“…The directed self-assembly (DSA) of two sub-20 nm pitch silicon-containing block copolymers (BCPs) was accomplished using a double-patterned sidewall scheme in…”
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Ordering poly(trimethylsilyl styrene-block-D,L-lactide) block copolymers in thin films by solvent annealing using a mixture of domain-selective solvents
Published in Journal of polymer science. Part B, Polymer physics (01-01-2014)“…ABSTRACT Controlling the morphology, domain orientation, and domain size of block copolymer (BCP) thin films is desirable for many applications in…”
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10
Patterning by Photochemically Directing the Marangoni Effect
Published in ACS macro letters (16-10-2012)“…Polystyrene (PS) that has been exposed to ultraviolet light (UV) undergoes partial dehydrogenation of the alkane polymer backbone which increases its surface…”
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Synthesis of Amphiphilic Naturally-Derived Oligosaccharide-block-Wax Oligomers and Their Self-Assembly
Published in ACS macro letters (16-09-2014)“…Self-assembly characteristics of amphiphilic macromolecules into micelles, nanoparticles and vesicles has been of fundamental interest for many applications…”
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Bit Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance
Published 19-03-2015“…Bit Patterned Media (BPM) for magnetic recording provide a route to densities $>1 Tb/in^2$ and circumvents many of the challenges associated with conventional…”
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