Search Results - "Cummins, Cian"
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Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application
Published in Advanced materials (Weinheim) (01-07-2016)“…Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a realizable complementary tool to aid optical patterning of device elements for…”
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Using block copolymers as infiltration sites for development of future nanoelectronic devices: Achievements, barriers, and opportunities
Published in Microelectronic engineering (05-08-2018)“…Creating inorganic nanostructures for development of nanoelectronic device components is a highly active research area. The ability for manipulation of the…”
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Precise Synthesis and Thin Film Self-Assembly of PLLA- b -PS Bottlebrush Block Copolymers
Published in Molecules (Basel, Switzerland) (05-03-2021)“…The ability of bottlebrush block copolymers (BBCPs) to self-assemble into ordered large periodic structures could greatly expand the scope of photonic and…”
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Optimization and Control of Large Block Copolymer Self-Assembly via Precision Solvent Vapor Annealing
Published in Macromolecules (09-02-2021)“…The self-assembly of ultra-high molecular weight (UHMW) block copolymers (BCPs) remains a complex and time-consuming endeavor owing to the high kinetic…”
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Defining Swelling Kinetics in Block Copolymer Thin Films: The Critical Role of Temperature and Vapour Pressure Ramp
Published in Polymers (03-12-2021)“…We studied the kinetics of swelling in high-χ lamellar-forming poly(styrene)- - poly(lactic acid) (PS- -PLA) block copolymer (BCP) by varying the heating rate…”
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Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography
Published in Nanomaterials (Basel, Switzerland) (30-09-2017)“…The prolonged and aggressive nature of scaling to augment the performance of silicon integrated circuits (ICs) and the technical challenges and costs…”
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Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography
Published in Nanomaterials (Basel, Switzerland) (09-01-2018)“…The self-assembly of a lamellar-forming polystyrene- -poly(dimethylsiloxane) (PS- -PDMS) diblock copolymer (DBCP) was studied herein for surface…”
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Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods
Published in ACS omega (31-08-2017)“…Achieving ultrasmall dimensions of materials and retaining high throughput are critical fabrication considerations for nanotechnology use. This article…”
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Enabling future nanomanufacturing through block copolymer self-assembly: A review
Published in Nano today (01-12-2020)“…[Display omitted] •Introduction covers criteria of nanomanufacturing and concepts of block copolymers in thin film and solution state.•Next, state-of-the-art…”
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Strategy for Enhancing Ultrahigh-Molecular-Weight Block Copolymer Chain Mobility to Access Large Period Sizes (>100 nm)
Published in Langmuir (24-11-2020)“…Assembling ultrahigh-molecular-weight (UHMW) block copolymers (BCPs) in rapid time scales is perceived as a grand challenge in polymer science due to slow…”
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Electrochemical Sensing of Hydrogen Peroxide Using Block Copolymer Templated Iron Oxide Nanopatterns
Published in Analytical chemistry (Washington) (16-01-2018)“…A new enzyme-free sensor based on iron oxide (Fe3O4) nanodots fabricated on an indium tin oxide (ITO) substrate via a block copolymer template was developed…”
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Enabling Large-Area Selective Deposition on Metal-Dielectric Patterns using Polymer Brush Deactivation
Published in Journal of physical chemistry. C (05-07-2018)“…Area-selective deposition could be an important self-aligning material-deposition technique to enable future nanoelectronics by accurately placing active…”
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Block Copolymer Directed Metamaterials and Metasurfaces for Novel Optical Devices
Published in Advanced optical materials (01-08-2021)“…Optical metamaterials are artificially engineered architectures that exhibit desired optical properties not found in nature. Bespoke design requires the…”
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Optimizing Polymer Brush Coverage To Develop Highly Coherent Sub‑5 nm Oxide Films by Ion Inclusion
Published in Chemistry of materials (26-11-2019)“…Area-selective deposition is a promising technique for positional self-alignment of materials at a prepatterned surface. Critical to this is the development of…”
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Rapid Self-Assembly and Sequential Infiltration Synthesis of High χ Fluorine-Containing Block Copolymers
Published in Macromolecules (11-08-2020)“…We leverage the attractive properties of a high χ–low N BCP, i.e., poly(styrene)-block-poly(2-fluoroethylmethyl acrylate) (PS-b-P2FEMA), and illustrate its…”
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Large Block Copolymer Self-Assembly for Fabrication of Subwavelength Nanostructures for Applications in Optics
Published in Nano letters (10-05-2017)“…Nanostructured surfaces are common in nature and exhibit properties such as antireflectivity (moth eyes), self-cleaning (lotus leaf), iridescent colors…”
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Non‐Native Block Copolymer Thin Film Nanostructures Derived from Iterative Self‐Assembly Processes
Published in Advanced materials interfaces (01-03-2020)“…Nanostructured block copolymer (BCP) thin films constitute an elegant tool to generate complex periodic patterns with periodicities ranging from a few…”
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Design and Morphological Investigation of High‑χ Catechol-Containing Styrenic Block Copolymers
Published in Macromolecules (09-08-2022)“…We report the synthesis of multifunctional block copolymers (BCPs) showing a high Flory–Huggins interaction parameter (χ), which enable sub-10 nm line-space…”
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An Ultra-Thin Near-Perfect Absorber via Block Copolymer Engineered Metasurfaces
Published in Journal of colloid and interface science (01-03-2022)“…[Display omitted] Producing ultrathin light absorber layers is attractive towards the integration of lightweight planar components in electronic, photonic, and…”
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Area Selective Polymer Brush Deposition
Published in Macromolecular rapid communications. (01-08-2017)“…Polymer brush films with chemical functionality to attach to site specific substrate areas are introduced for area selective deposition (ASD) application. It…”
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