Search Results - "Crowell, J. E"
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Porous Silicon as a Versatile Platform for Laser Desorption/Ionization Mass Spectrometry
Published in Analytical chemistry (Washington) (01-02-2001)“…Desorption/ionization on porous silicon mass spectrometry (DIOS-MS) is a novel method for generating and analyzing gas-phase ions that employs direct laser…”
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Desorption/Ionization on Silicon (DIOS): A Diverse Mass Spectrometry Platform for Protein Characterization
Published in Proceedings of the National Academy of Sciences - PNAS (24-04-2001)“…Since the advent of matrix-assisted laser desorption/ionization and electrospray ionization, mass spectrometry has played an increasingly important role in…”
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Reaction of atomically clean aluminum and chemically modified aluminum with alkyl halides
Published in Journal of the American Chemical Society (01-03-1987)Get full text
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Surface studies by optical second-harmonic generation: the adsorption of O2, CO, and sodium on the Rh(111) surface
Published in Physical review letters (1984)Get full text
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A high-resolution electron energy loss spectroscopy study of the surface structure of benzene adsorbed on the rhodium(111) crystal face
Published in Journal of physical chemistry (1952) (01-05-1984)“…Benzene adsorption on the Rh(111) crystal surface has been studied by HREELS, LEED and TPD. The vibrational spectra indicate that benzene adsorbs molecularly…”
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Thermal decomposition of benzene on the Rh(111) crystal surface
Published in Journal of physical chemistry (1952) (19-06-1986)Get full text
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Reaction of methyl chloride with alumina surfaces: a study of the methoxy surface species by transmission infrared spectroscopy
Published in Journal of physical chemistry (1952) (01-03-1988)Get full text
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Potassium coadsorption induced dissociation of CO on the Rh(111) crystal surface: an isotope mixing study
Published in Journal of physical chemistry (1952) (01-01-1985)Get full text
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Dissociative chemisorption of carbon monoxide on nickel films promoted by aluminum: detection of a precursor state to carbon monoxide dissociation by Electron Energy Loss Spectroscopy
Published in Journal of physical chemistry (1952) (01-05-1988)“…The adsorption and dissociation of carbon monoxide on Ni-dosed Al(111) surfaces have been investigated in the temperature range of 95-700K by use of…”
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Investigation on the growth rate enhancement by Ge during SiGe alloy deposition by chemical vapor deposition
Published in Applied physics letters (08-06-1992)“…The desorption of deuterium from clean and Ge-covered Si(100) surfaces has been studied using temperature-programmed desorption. The Ge/Si(100) surfaces were…”
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The strong influence of potassium on the adsorption of carbon monoxide on platinum surfaces: a TDS and HREELS study
Published in Journal of physical chemistry (1952) (01-02-1982)Get full text
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Bonding and thermal decomposition of propylene, propadiene, and methylacetylene on the rhodium(111) single-crystal surface
Published in Journal of physical chemistry (1952) (01-03-1987)Get full text
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Onset of oxidation of Al(111) at low temperatures: a study by electron-energy-loss spectroscopy and Auger electron spectroscopy
Published in Physical review. B, Condensed matter (15-01-1986)“…The early stages of oxygen adsorption and oxide formation on Al(111) have been studied at 135K using a combination of electron-energy-loss spectroscopy and…”
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Thermal decomposition of benzene on the rhodium(111) crystal surface
Published in Journal of physical chemistry (1952) (01-06-1986)Get full text
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Histochemical studies on nucleic acid phosphatase
Published in Bulletin of the Johns Hopkins Hospital (01-06-1949)Get more information
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Bonding and thermal decomposition of propylene, propadiene, and methylacetylene on the Rh(111) single-crystal surface
Published in Journal of physical chemistry (1952) (12-03-1987)Get full text
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Chemical methods of thin film deposition: Chemical vapor deposition, atomic layer deposition, and related technologies
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-09-2003)“…This article provides a brief overview of thin film growth utilizing the reactive processes of chemical vapor deposition (CVD) and atomic layer deposition…”
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Catalytic effect of phosphine on the deposition of phosphosilicate glass from tetraethoxysilane
Published in Applied physics letters (15-02-1993)“…The effect of phosphorous incorporation on the deposition rate of phosphosilicate glass from the reaction of PH3, O2, and tetraethoxysilane (TEOS) has been…”
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