Search Results - "Crowell, J. E"

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    Porous Silicon as a Versatile Platform for Laser Desorption/Ionization Mass Spectrometry by Shen, Zhouxin, Thomas, John J, Averbuj, Claudia, Broo, Klas M, Engelhard, Mark, Crowell, John E, Finn, M. G, Siuzdak, Gary

    Published in Analytical chemistry (Washington) (01-02-2001)
    “…Desorption/ionization on porous silicon mass spectrometry (DIOS-MS) is a novel method for generating and analyzing gas-phase ions that employs direct laser…”
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    Desorption/Ionization on Silicon (DIOS): A Diverse Mass Spectrometry Platform for Protein Characterization by Thomas, John J., Shen, Zhouxin, Crowell, John E., Finn, M. G., Siuzdak, Gary

    “…Since the advent of matrix-assisted laser desorption/ionization and electrospray ionization, mass spectrometry has played an increasingly important role in…”
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    A high-resolution electron energy loss spectroscopy study of the surface structure of benzene adsorbed on the rhodium(111) crystal face by Koel, B. E., Crowell, J. E., Mate, C. M., Somorjai, G. A.

    Published in Journal of physical chemistry (1952) (01-05-1984)
    “…Benzene adsorption on the Rh(111) crystal surface has been studied by HREELS, LEED and TPD. The vibrational spectra indicate that benzene adsorbs molecularly…”
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    Dissociative chemisorption of carbon monoxide on nickel films promoted by aluminum: detection of a precursor state to carbon monoxide dissociation by Electron Energy Loss Spectroscopy by Chen, J. G, Crowell, J. E, Ng, L, Basu, P, Yates, J. T

    Published in Journal of physical chemistry (1952) (01-05-1988)
    “…The adsorption and dissociation of carbon monoxide on Ni-dosed Al(111) surfaces have been investigated in the temperature range of 95-700K by use of…”
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    Investigation on the growth rate enhancement by Ge during SiGe alloy deposition by chemical vapor deposition by NING, B. M. H, CROWELL, J. E

    Published in Applied physics letters (08-06-1992)
    “…The desorption of deuterium from clean and Ge-covered Si(100) surfaces has been studied using temperature-programmed desorption. The Ge/Si(100) surfaces were…”
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    Onset of oxidation of Al(111) at low temperatures: a study by electron-energy-loss spectroscopy and Auger electron spectroscopy by CHEN, J. G, CROWELL, J. E, YATES, J. T. JR

    Published in Physical review. B, Condensed matter (15-01-1986)
    “…The early stages of oxygen adsorption and oxide formation on Al(111) have been studied at 135K using a combination of electron-energy-loss spectroscopy and…”
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    Chemical methods of thin film deposition: Chemical vapor deposition, atomic layer deposition, and related technologies by Crowell, John E.

    “…This article provides a brief overview of thin film growth utilizing the reactive processes of chemical vapor deposition (CVD) and atomic layer deposition…”
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    Catalytic effect of phosphine on the deposition of phosphosilicate glass from tetraethoxysilane by TEDDER, L. L, CROWELL, J. E, URAM, K. J, SHUGRUE, J. K, TRIBULA, D

    Published in Applied physics letters (15-02-1993)
    “…The effect of phosphorous incorporation on the deposition rate of phosphosilicate glass from the reaction of PH3, O2, and tetraethoxysilane (TEOS) has been…”
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