Search Results - "Cooke, Mike"

Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask by Wu, Meiyi, de Marneffe, Jean-François, Opsomer, Karl, Detavernier, Christophe, Delabie, Annelies, Naujok, Philipp, Caner, Özge, Goodyear, Andy, Cooke, Mike, Saadeh, Qais, Soltwisch, Victor, Scholze, Frank, Philipsen, Vicky

“…Ru4-xTax (x = 1,2,3) alloys are studied as absorber candidates for EUV low-n mask. We report the morphology, surface roughness as well as the chemical…”
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Dispersion of silicone oil in water surfactant solution: Effect of impeller speed, oil viscosity and addition point on drop size distribution by EL-Hamouz, Amer, Cooke, Mike, Kowalski, Adam, Sharratt, Paul

“…The preparation of dilute aqueous silicone oil emulsions has been investigated with particular attention to the effect of oil viscosity (0.49–350 mPa s),…”
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Modelling the oxidation of seventeen volatile organic compounds to track yields of CO and CO2 by GRANT, Aoife, ARCHIBALD, Alexander T, COOKE, Mike C, SHALLCROSS, Dudley E

“…A box model simulating tropospheric conditions was used to trace the oxidation pathways of 17 volatile organic compounds (VOCs) covering saturated, olefinic,…”
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Advantages of the hollow (concave) turbine for multi-phase agitation under intense operating conditions by Cooke, Mike, Heggs, Peter J.

“…The mixing literature on hollow blade turbines (HBTS), for operation in fully turbulent flow, is reviewed and compared with the results of our own studies. The…”
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Is Technological Change Threatening the Very Existence of “Traditional” Survey Research and, if So, What should we do about it? by Cooke, Mike

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Atomic layer etching in close-to-conventional plasma etch tools by Goodyear, Andy, Cooke, Mike

“…Atomic layer etching using plasma is a cyclical etching process of gas dosing and surface bombardment that removes material layer by layer, and has the…”
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Viewpoint: 'Is technological change threatening the very existence of "traditional" survey research and, if so, what should we do about it?' by Cooke, Mike

“…In this viewpoint, the author explores the impact of technology on "traditional" survey research and whether technological change threatens the research's…”
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Web 2.0, Social Networks and the Future of Market Research by Cooke, Mike, Buckley, Nick

“…The paper identifies a number of trends that may well provide fertile ground for marketing researchers to develop new approaches. The open source movement will…”
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Inverted hollow spinning cone as a device for controlling foam and hold-up in pilot scale gassed agitated fermentation vessels by Stocks, Stuart M., Cooke, Mike, Heggs, Peter J.

“…The effectiveness of an inverted hollow spinning cone (IHSC) for controlling foam and liquid hold-up is demonstrated in pilot scale equipment for a currently…”
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Atomic layer etching of SiO2 with Ar and CHF 3 plasmas: A self‐limiting process for aspect ratio independent etching by Dallorto, Stefano, Goodyear, Andy, Cooke, Mike, Szornel, Julia E., Ward, Craig, Kastl, Christoph, Schwartzberg, Adam, Rangelow, Ivo W., Cabrini, Stefano

“…With ever increasing demands on device patterning to achieve smaller critical dimensions, the need for precise, controllable atomic layer etching (ALE) is…”
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Atomic layer etching of SiO2 with Ar and CHF3 plasmas: A self‐limiting process for aspect ratio independent etching by Dallorto, Stefano, Goodyear, Andy, Cooke, Mike, Szornel, Julia E, Ward, Craig, Kastl, Christoph, Schwartzberg, Adam, Rangelow, Ivo W, Cabrini, Stefano

“…With ever increasing demands on device patterning to achieve smaller critical dimensions, the need for precise, controllable atomic layer etching (ALE) is…”
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Specific features of power characteristics of in-line rotor–stator mixers by Jasińska, Magdalena, Bałdyga, Jerzy, Cooke, Mike, Kowalski, Adam J.

“…•High-shear rotor–stator mixers generate locally very high shear stresses due to focused delivery of energy.•Only energy dissipated in high shear regions is…”
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The effect of scale and interfacial tension on liquid–liquid dispersion in in-line Silverson rotor–stator mixers by Hall, Steven, Pacek, Andrzej W., Kowalski, Adam J., Cooke, Mike, Rothman, David

“…•Three scales of in-line Silverson rotor–stator mixer have been investigated.•Power draw and emulsion drop size distributions were measured…”
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Social media and market research: we are becoming a listening economy and, while the future of market research is bright, it will be different by Cooke, Mike

“…The WARC Online Conference held in London in early March was dominated by the rise of social media and the impact it is having on market research. It was clear…”
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Atomic layer etching of SiO 2 with Ar and CHF 3 plasmas: A self‐limiting process for aspect ratio independent etching by Dallorto, Stefano, Goodyear, Andy, Cooke, Mike, Szornel, Julia E., Ward, Craig, Kastl, Christoph, Schwartzberg, Adam, Rangelow, Ivo W., Cabrini, Stefano

“…With ever increasing demands on device patterning to achieve smaller critical dimensions, the need for precise, controllable atomic layer etching (ALE) is…”
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Guest Editorial - The New World of Web 2.0 Research by Cooke, Mike

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Towards closed loop control of a plasma tool using OES by Goodyear, Andrew, Cooke, Mike

“…Potential candidate methods for closed loop control using OES have been evaluated for SF 6 etching of Si and for fluorocarbon etching of SiO 2. In the case of…”
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Sustainable strategies for managing Brassica napus (oilseed rape) resistance to Leptosphaeria maculans (phoma stem canker) by FITT, Bruce D. L, EVANS, Neal, HOWLETT, Barbara J, COOKE, B. Mike

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Viewpoint - The Importance of Blogging by Cooke, Mike

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Nanoparticle and nanosphere mask for etching of ITO nanostructures and their reflection properties by Xu, Cigang, Deng, Ligang, Holder, Adam, Bailey, Louise R., Leendertz, Caspar, Bergmann, Joachim, Proudfoot, Gary, Thomas, Owain, Gunn, Robert, Cooke, Mike

“…Au nanoparticles and polystyrene nanospheres were used as mask for plasma etching of indium tin oxide (ITO) layer. By reactive ion etching (RIE) processes, the…”
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