Search Results - "Constantinou, Procopios C"
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Atomic-Scale Patterning of Arsenic in Silicon by Scanning Tunneling Microscopy
Published in ACS nano (24-03-2020)“…Over the past two decades, prototype devices for future classical and quantum computing technologies have been fabricated by using scanning tunneling…”
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Journal Article -
2
Non‐Destructive X‐Ray Imaging of Patterned Delta‐Layer Devices in Silicon
Published in Advanced electronic materials (01-05-2023)“…The progress of miniaturization in integrated electronics has led to atomic and nanometer‐sized dopant devices in silicon. Such structures can be fabricated…”
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3
Spatially resolved random telegraph fluctuations of a single trap at the Si/SiO 2 interface
Published in Proceedings of the National Academy of Sciences - PNAS (29-10-2024)“…We use electrostatic force microscopy to spatially resolve random telegraph noise at the Si/SiO interface. Our measurements demonstrate that two-state…”
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Journal Article -
4
Spatially resolved random telegraph fluctuations of a single trap at the Si/SiO2 interface
Published in Proceedings of the National Academy of Sciences - PNAS (29-10-2024)“…We use electrostatic force microscopy to spatially resolve random telegraph noise at the Si/SiO2 interface. Our measurements demonstrate that two-state…”
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Journal Article -
5
Single‐Atom Control of Arsenic Incorporation in Silicon for High‐Yield Artificial Lattice Fabrication
Published in Advanced materials (Weinheim) (01-06-2024)“…Artificial lattices constructed from individual dopant atoms within a semiconductor crystal hold promise to provide novel materials with tailored electronic,…”
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6
Resistless EUV lithography: Photon-induced oxide patterning on silicon
Published in Science advances (21-04-2023)“…In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated silicon (100) surface in the absence of a photoresist. EUV…”
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7
Spatially Resolved Dielectric Loss at the Si / SiO 2 Interface
Published in Physical review letters (17-06-2024)Get full text
Journal Article -
8
On the sensitivity of convergent beam low energy electron diffraction patterns to small atomic displacements
Published in Applied surface science (30-09-2019)“…Multiple scattering simulations are developed and applied to assess the potential of convergent beam low-energy electron diffraction (CBLEED) to distinguish…”
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Journal Article -
9
Spatially Resolved Dielectric Loss at the Si/SiO_{2} Interface
Published in Physical review letters (21-06-2024)“…The Si/SiO_{2} interface is populated by isolated trap states that modify its electronic properties. These traps are of critical interest for the development…”
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10
Fabrication and Characterization of Metallic, Two-Dimensional Dopant δ-Layers in Silicon
Published 01-01-2021“…With the recent advances of deterministic atomic-scale patterning of phosphorous and arsenic on silicon, proposed architectures for silicon-based quantum…”
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Dissertation -
11
Spatially resolved random telegraph fluctuations of a single trap at the Si/SiO2 interface
Published 11-03-2024“…We use electrostatic force microscopy to spatially resolve random telegraph noise at the Si/SiO$_2$ interface. Our measurements demonstrate that two-state…”
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Journal Article -
12
Spatially resolved dielectric loss at the Si/SiO$_2$ interface
Published 23-06-2023“…The Si/SiO$_2$ interface is populated by isolated trap states which modify its electronic properties. These traps are of critical interest for the development…”
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Journal Article -
13
Single-Atom Control of Arsenic Incorporation in Silicon for High-Yield Artificial Lattice Fabrication
Published 09-11-2023“…Artificial lattices constructed from individual dopant atoms within a semiconductor crystal hold promise to provide novel materials with tailored electronic,…”
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Journal Article -
14
Element-specific, non-destructive profiling of layered heterostructures
Published 30-09-2024“…Fabrication of semiconductor heterostructures is now so precise that metrology has become a key challenge for progress in science and applications. It is now…”
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Journal Article -
15
Resistless EUV lithography: photon-induced oxide patterning on silicon
Published 02-10-2023“…L.-T. Tseng, Science Advances, Vol 9, eadf5997 (2023) In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100)…”
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Journal Article -
16
Non-destructive X-ray imaging of patterned delta-layer devices in silicon
Published 14-04-2023“…Adv. Electron. Mater. 2023, 2201212 The progress of miniaturisation in integrated electronics has led to atomic and nanometre-sized dopant devices in silicon…”
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Journal Article -
17
Atomic-Scale Patterning of Arsenic in Silicon by Scanning Tunneling Microscopy
Published 15-10-2019“…Over the last two decades, prototype devices for future classical and quantum computing technologies have been fabricated, by using scanning tunneling…”
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Journal Article