Search Results - "Conde, J.C."
-
1
Experimental determination of La2O3 thermal conductivity and its application to the thermal analysis of a-Ge/La2O3/c-Si laser annealing
Published in Thin solid films (01-09-2008)Get full text
Journal Article -
2
193 nm Excimer laser processing of Si/Ge/Si(100) micropatterns
Published in Applied surface science (30-01-2016)Get full text
Journal Article -
3
Field-testing solutions for drinking water quality monitoring in low- and middle-income regions and case studies from Latin American, African and Asian countries
Published in Journal of environmental chemical engineering (01-12-2023)“…This work highlights the need for a global approach to drinking water monitoring that involves facing several critical issues. Field tests that perform to very…”
Get full text
Journal Article -
4
193nm Excimer laser processing of Si/Ge/Si(100) micropatterns
Published in Applied surface science (30-01-2016)“…•Crystalline SiGe circular microstructures were grown by laser assisted techniques.•Laser annealing enhances the microstructures aspect ratio.•Ultrafast…”
Get full text
Journal Article -
5
Theoretical and experimental analysis of high power diode laser (HPDL) hardening of AISI 1045 steel
Published in Applied surface science (15-12-2007)“…Laser surface hardening makes use of the rapid and cooling cycles produced on metals surfaces exposed to a scanning laser beam without affecting the bulk of…”
Get full text
Journal Article -
6
Study on excimer laser irradiation for controlled dehydrogenation and crystallization of boron doped hydrogenated amorphous/nanocrystalline silicon multilayers
Published in Thin solid films (01-06-2013)“…We report on the excimer laser annealing (ELA) induced temperature gradients, allowing controlled crystallization and dehydrogenation of boron-doped…”
Get full text
Journal Article -
7
Laser assisted formation of binary and ternary Ge/Si/Sn alloys
Published in Thin solid films (01-02-2012)“…Binary and ternary Si/Ge/Sn alloys were epitaxially grown on virtual Germanium buffer layers using pulsed laser induced epitaxy with a 193nm Excimer laser…”
Get full text
Journal Article Conference Proceeding -
8
FEM numerical analysis of excimer laser induced modification in alternating multi-layers of amorphous and nano-crystalline silicon films
Published in Applied surface science (15-09-2012)“…► nc-Si:H is a material with growing importance for a large-area of nano-electronic, photovoltaic or biomedical devices. ► UV-ELA technique causes a rapid…”
Get full text
Journal Article Conference Proceeding -
9
Experimental determination of La 2O 3 thermal conductivity and its application to the thermal analysis of a-Ge/La 2O 3/c-Si laser annealing
Published in Thin solid films (2008)“…Rare earth oxides are emerging candidates for gate oxide films as they have high dielectric constants as well as promising crystal and electronic structures…”
Get full text
Journal Article -
10
Numerical analysis of temperature profile and thermal-stress during excimer laser induced heteroepitaxial growth of patterned amorphous silicon and germanium bi-layers deposited on Si(100)
Published in Thin solid films (26-02-2010)“…A Finite Element Method (FEM) study of the coupled thermal-stress during the heteroepitaxial growth induced by excimer laser radiation of patterned amorphous…”
Get full text
Journal Article Conference Proceeding -
11
Numerical studies of temperature profile and hydrodynamic phenomena during excimer laser assisted heteroepitaxial growth of patterned silicon and germanium bi-layers
Published in Thin solid films (2010)“…In this manuscript, a 3-D axisymmetric model for the heteroepitaxial growth induced by irradiating thin patterned amorphous hydrogenated silicon (a-Si:H) and…”
Get full text
Journal Article Conference Proceeding -
12
Numerical simulation of the UV-excimer laser assisted modification of amorphous hydrogenated Si/Ge bilayers to graded epitaxial heterostructures
Published in Thin solid films (03-11-2008)“…This manuscript presents a numerical analysis of the Excimer Laser Annealing and Crystallization induced in a set of amorphous hydrogenated silicon (a-Si:H)…”
Get full text
Journal Article Conference Proceeding -
13
Numerical analysis of Excimer laser assisted processing of multi-layers for the tailored dehydrogenation of amorphous and nano-crystalline silicon films
Published in Applied surface science (15-12-2007)“…The application of the striking electrical and optical properties of amorphous and nano-crystalline silicon in photovoltaic, photonic and nano-electronic…”
Get full text
Journal Article -
14
Analysis of excimer laser annealing of amorphous SiGe on La 2O 3//Si structures
Published in Applied surface science (2007)“…The reduction of complementary metal oxide semiconductor dimensions through transistor scaling is in part limited by the SiO 2 dielectric layer thickness…”
Get full text
Journal Article -
15
Analysis of excimer laser annealing of amorphous SiGe on La2O3//Si structures
Published in Applied surface science (31-07-2007)“…The reduction of complementary metal oxide semiconductor dimensions through transistor scaling is in part limited by the SiO2 dielectric layer thickness. Among…”
Get full text
Conference Proceeding Journal Article -
16
Analytical and numerical calculations of the temperature distribution in Si and Ge targets irradiated by excimer lasers
Published in Applied surface science (30-07-2005)“…The calculations of the temperature distribution induced by excimer lasers in silicon and germanium by using different mathematical approaches are presented…”
Get full text
Journal Article Conference Proceeding -
17
Finite elements analysis of heteroepitaxial SiGe layers grown by excimer laser
Published in Applied surface science (30-07-2005)“…In this work, the finite elements analysis using ANSYS ® (8.0) of the heteroepitaxial SiGe alloy formation induced by excimer lasers is presented. The…”
Get full text
Journal Article Conference Proceeding -
18
Analysis of plume deflection in the silicon laser ablation process
Published in Applied physics. A, Materials science & processing (01-09-2007)“…Changes in target surface morphology and ablation plume direction have been experimentally observed during the initial stages of the silicon laser ablation…”
Get full text
Journal Article -
19
Finite element analysis of the initial stages of the laser ablation process
Published in Thin solid films (01-04-2004)“…The growth of thin films by pulsed-laser deposition involves extremely complex physical processes. The study of different aspects of the basic mechanisms of…”
Get full text
Journal Article -
20
Laser ablation of silicon and copper targets. Experimental and finite elements studies
Published in Applied physics. A, Materials science & processing (01-09-2004)“…The ablation process induced by excimer lasers is a collective phenomenon that basically involves two phenomena: the laser radiation--matter interaction and…”
Get full text
Conference Proceeding Journal Article