Search Results - "Chung, Chulwon"

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  1. 1

    Endogenous PI3K/Akt and NMDAR act independently in the regulation of CREB activity in lumbosacral spinal cord in cystitis by Kay, Jarren C., Xia, Chun-Mei, Liu, Miao, Shen, Shanwei, Yu, Sharon J., Chung, Chulwon, Qiao, Li-Ya

    Published in Experimental neurology (01-12-2013)
    “…The integral interaction of signaling components in the regulation of visceral inflammation-induced central sensitization in the spinal cord has not been well…”
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  2. 2

    Structural, optical and chemical analysis of zinc sulfide thin film deposited by RF-mganetron sputtering and post deposition annealing by Yoo, Dongjun, Choi, Moon Suk, Heo, Seung Chan, Chung, Chulwon, Kim, Dohyung, Choi, Changhwan

    Published in Metals and materials international (01-11-2013)
    “…Zinc sulfide (ZnS) thin films were deposited by radio-frequency (RF) magnetron sputtering. The effects of the process parameters such as deposition time and…”
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  3. 3

    Improvement of synaptic property of GeSe based CBRAM by engineering the deposition condition of switching matrix by Chung, Chulwon, Choi, Changhwan

    “…A study of effect of deposition condition of germanium selenide (GeSe) switching layer to Conductive bridging random access memory (CBRAM) device property was…”
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  4. 4

    Influence of Different Annealing Ambients on the Properties of Zinc Sulfide Prepared by Atomic Layer Deposition by Yoo, Dongjun, Heo, Seung Chan, Choi, Moon Suk, Kim, Dohyung, Chung, Chulwon, Choi, Hag Young, Jeon, Hyeongtag, Choi, Changhwan

    Published in Japanese Journal of Applied Physics (01-10-2013)
    “…The effects of different post annealing ambients (vacuum, O 2 , and H 2 S gases) on the chemical, structural, and optical properties of zinc sulfide (ZnS) thin…”
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  5. 5

    Analog Synaptic Transistor with Al-Doped HfO2 Ferroelectric Thin Film by Kim, Duho, Jeon, Yu-Rim, Ku, Boncheol, Chung, Chulwon, Kim, Tae Heun, Yang, Sanghyeok, Won, Uiyeon, Jeong, Taeho, Choi, Changhwan

    Published in ACS applied materials & interfaces (10-11-2021)
    “…Neuromorphic computing has garnered significant attention because it can overcome the limitations of the current von-Neumann computing system. Analog synaptic…”
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  6. 6

    Synaptic Characteristics of Atomic Layer-Deposited Ferroelectric Lanthanum-Doped HfO2 (La:HfO2) and TaN-Based Artificial Synapses by Jeon, Yu-Rim, Kim, Duho, Ku, Boncheol, Chung, Chulwon, Choi, Changhwan

    Published in ACS applied materials & interfaces (02-12-2023)
    “…Analog synaptic devices have made significant advances based on various electronic materials that can realize the biological synapse properties of neuromorphic…”
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  7. 7
  8. 8

    Effects of post cooling on the remnant polarization and coercive field characteristics of atomic layer deposited Al-doped HfO2 thin films by Ku, Boncheol, Jeon, Yu-Rim, Choi, Moonsuk, Chung, Chulwon, Choi, Changhwan

    Published in Applied surface science (01-11-2022)
    “…[Display omitted] •Ferroelectricity is significantly affected by post cooling rate.•Rapid quenching enhances remnant polarization of Al-doped HfO2 thin…”
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  9. 9
  10. 10

    RF-magnetron sputtered kesterite Cu2ZnSnS4 thin film using single quaternary sputtering target prepared by sintering process by Yoo, Dongjun, Choi, Moonsuk, Heo, Seung Chan, Kim, Dohyung, Chung, Chulwon, Choi, Changhwan

    Published in Journal of nanoscience and nanotechnology (01-11-2013)
    “…Cu2ZnSnS4 (CZTS) thin film applicable to an absorber material in compound thin film solar cells was deposited by a single quaternary sputtering target…”
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  11. 11

    A Study of Sputtered TiN Gate Electrode Etching with Various Wet Chemicals and Post Etch Annealing for Complementary Metal--Oxide--Semiconductor Device Integration Applications by Heo, Seung Chan, Yoo, Dongjun, Choi, Moon Suk, Kim, Dohyung, Chung, Chulwon, Choi, Changhwan

    Published in Japanese Journal of Applied Physics (01-10-2012)
    “…Wet chemicals for etching sputtered TiN metal gate and post etch annealing on HfO 2 and HfSiON gate dielectrics were studied with metal--oxide--semiconductor…”
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