Search Results - "Chulsoon Chang"
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A 16-Gb T-Coil-Based GDDR6 DRAM With Merged-MUX TX, Optimized WCK Operation, and Alternative-Data-Bus Achieving 27-Gb/s/Pin in NRZ
Published in IEEE journal of solid-state circuits (01-01-2023)“…This article introduces a 16-Gb T-coil-based graphics double-data-rate 6 (GDDR6) dynamic random access memory (DRAM) with merged-multiplexer (MUX) transmitter…”
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Journal Article -
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A 16Gb 27Gb/s/pin T-coil based GDDR6 DRAM with Merged-MUX TX, Optimized WCK Operation, and Alternative-Data-Bus
Published in 2022 IEEE International Solid- State Circuits Conference (ISSCC) (20-02-2022)“…Graphic DRAMs have been developed to increase maximum I/O interface speeds to satisfy the demand of high-performance graphic applications [1]-[5]. Recently,…”
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Conference Proceeding -
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65nm high performance SRAM technology with 25F2 0.16/spl mu/m/sup 2/ S/sup 3/ (stacked single-crystal Si) SRAM cell, and stacked peripheral SSTFT for ultra high density and high speed applications
Published in Proceedings of 35th European Solid-State Device Research Conference, 2005. ESSDERC 2005 (2005)“…For the first time, the 65nm high performance transistor technology and the highly compacted double stacked S/sup 3/ SRAM cell with a size of 25F/sup 2/, and…”
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Conference Proceeding -
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Highly cost effective and high performance 65nm S/sup 3/ (stacked single-crystal Si) SRAM technology with 25F/sup 2/, 0.16um/sup 2/ cell and doubly stacked SSTFT cell transistors for ultra high density and high speed applications
Published in Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005 (2005)“…In order to meet the great demands for higher density SRAM in all area of SRAM applications, the 25F/sup 2/S/sup 3/ (stacked single-crystal Si ) SRAM cell,…”
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Conference Proceeding -
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A novel 0.79 /spl mu/m/sup 2/ SRAM cell by KrF lithography and high performance 90 nm CMOS technology for ultra high speed SRAM
Published in Digest. International Electron Devices Meeting (2002)“…The smallest SRAM cell, 0.79 /spl mu/m/sup 2/, was realized by a revolutionary cell layout, fine tuned OPC technique to overcome the 248 nm KrF lithography…”
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Conference Proceeding -
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A novel 0.79μm2 SRAM cell by KrF lithography and high performance 90nm CMOS technology for ultra high speed SRAM
Published 2002Get full text
Conference Proceeding