Search Results - "Chouaib, Houssam"
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Modeling the time-dependence of the photoreflectance spectroscopy on ultra-shallow As+ ion implanted silicon
Published in Results in optics (01-08-2022)“…•The rapid photoreflectance spectroscopy acquired from semiconductors reveals its time-dependence.•The slow variation of the built-in electric field is…”
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Journal Article -
2
Nanoscale optical critical dimension measurement of a contact hole using deep ultraviolet spectroscopic ellipsometry
Published in Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures (01-01-2013)“…Highly sensitive optical metrology techniques based on spectroscopic ellipsometry (SE) arerequired for three dimensional monitoring of line-profiles and…”
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Journal Article -
3
Scatterometry Critical Dimension Solution for Gate All Around Sheet-Specific Metrology: Topic/category: Advanced Metrology
Published in 2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (13-05-2024)“…The complex vertically stacked gate-all-around (GAA) manufacturing process drives the demand for more challenging inline metrology requirements. GAA technology…”
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Conference Proceeding -
4
Microphotoreflectance spectroscopy of heterojunction bipolar transistors under biasing voltage: Measurement of the net doping concentration
Published in Applied physics letters (25-06-2007)“…The authors present a microphotoreflectance (micro-PR) spectroscopic study of a biased In Ga Al As ∕ Ga As Sb ∕ In P heterojunction bipolar transistor. Franz…”
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Journal Article -
5
Surface Fermi level in GaAsSb structures grown by molecular beam epitaxy on InP substrates
Published in Applied physics letters (28-07-2008)“…Photoreflectance (PR) spectroscopy is performed to investigate the Fermi level pinning at the surface of GaAsSb, in a series of epitaxial structures with…”
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Journal Article -
6
UV photoreflectance spectroscopy in strained silicon on insulator structures
Published in Physica status solidi. A, Applications and materials science (01-05-2009)“…The optical modulation technique of photoreflectance (PR) is applied on tensely‐strained silicon on insulator (sSOI) substrates in order to determine the…”
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Journal Article Conference Proceeding -
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Photoreflectance spectroscopy for the study of GaAsSb/InP heterojunction bipolar transistors
Published in Thin solid films (22-02-2004)“…This work is devoted to a photoreflectance (PR) study of single GaAsSb layers grown pseudomorphically on InP. Such antimonide alloys included in the base of…”
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Journal Article Conference Proceeding -
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Photoreflectance spectroscopy for the qualification of GaAsSb alloys introduced in ultrafast heterojunction bipolar transistors on InP
Published in Physica status solidi. A, Applications and materials science (01-05-2009)“…GaAsSb is an important III–V semiconductor ternary alloy which is currently used as the thin base layer in high speed InP Heterojunction Bipolar Transistors…”
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Journal Article Conference Proceeding -
9
Surface Fermi level in GaAsSb alloys grown by MBE on Inp substrates
Published in 2008 20th International Conference on Indium Phosphide and Related Materials (01-05-2008)“…We use photoreflectance spectroscopy to investigate the Fermi level pinning at the surface of GaAsSb. The measurements have been performed on five GaAsSb/Inp…”
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Conference Proceeding