Search Results - "Chou, H.M."
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Density affects gametophyte growth and sexual expression of Osmunda cinnamomea (Osmundaceae: Pteridophyta)
Published in Annals of botany (01-08-2004)“…Background and aims To understand how gametophyte densities affect the sexual expression and sizes of Osmunda cinnamomea and to provide information on the…”
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Laboratory evaluation of amalgam separators
Published in The Journal of the American Dental Association (1939) (01-05-2002)“…Amalgam in dental wastewater is receiving increasing scrutiny from regulators because of national, state and local initiatives to reduce or virtually eliminate…”
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Priority of light/dark entrainment over temperature in setting the circadian rhythms of the prokaryote Synechococcus RF-1
Published in Planta (12-08-1999)“…Light/dark (L/D) and temperature are two major factors in the entrainment of circadian rhythms. The input pathways of these two environmental factors for the…”
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A robust shallow trench isolation (STI) with SiN pull-back process for advanced DRAM technology
Published in 13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259) (2002)“…In this paper, the effect of SiN pull-back process for shallow trench isolation (STI) is investigated by measuring DRAM array's refresh time (Tref) and yield…”
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Conference Proceeding -
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Defect Reduction Using Yield Management Test Structures
Published in International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM (1994)“…Design and applications of Yield Management test patterns on memory products have been reviewed. Evaluations are made for Y.M. patterns and conventional T.K…”
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All-optical compare-and-exchange switches
Published in IEEE journal on selected areas in communications (01-08-1988)“…All-optical compare and exchange is experimentally demonstrated using ZnS bistable optical devices. The demonstration utilizes polarization multiplexing and…”
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A manufacturable shallow trench isolation process for sub-0.2 um DRAM technologies
Published in 13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259) (2002)“…A highly manufacturable and defect-free shallow trench isolation (STI) process is demonstrated by using 64M DRAM as a sensitive monitor. In the STI flow, a…”
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Conference Proceeding -
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Enhanced high performance reliable AlSi/TiW metallization for 1.0 mu m CMOS process
Published in Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference (1989)“…Summary form only given. A reported AlSi/TiW metal system is developed with enhanced performance which is anticipated to upgrade the AlSi/TiW metallization…”
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Conference Proceeding -
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Enhanced high performance reliable AlSi/TiW metallization for 1.0 mu m CMOS process
Published in Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference (1989)“…Summary form only given. An AlSi/TiW metal system with enhanced performance, which is expected to upgrade AlSi/TiW metallization, has been developed. The…”
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Conference Proceeding -
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High temperature alloy and contact annealing with RTA on AlSi/TiW metallization
Published in International Symposium on VLSI Technology, Systems and Applications (1989)“…New processes for AlSi/TiW metallization are described, involving simple modifications of the conventional process. An important change is the use of rapid…”
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Conference Proceeding